UV irradiation device for clocked operation
An irradiation device including at least one radiation source, which emits both UV-radiation and W-radiation, i.e. visible light and/or IR radiation. The device includes a transport device for delivering substrates to be irradiated. At least one wavelength-selective filter reflects UV-radiation at an angle of 45° and transmits W-radiation. Means for the absorption of IR radiation are arranged downstream of the optical filter in the propagation direction in the beam path of the W-radiation not deflected by the wavelength-selective filter. The means for the absorption of IR radiation are also designed to absorb visible light and UV rays, and the irradiation device includes movement means in order to guide the wavelength-selective filter into and out of the beam path of the radiation source.
1. Irradiation apparatus with
at least one radiation source, which emits UV-radiation as well as W-radiation, i.e. visible light and/or IR-radiation and,
a transport arrangement for feeding substrates to be irradiated, and
at least one wave-length selective filter, which reflects the UV-radiation and transmits W-radiation about an angle of 45°,
means for absorbing of IR-radiation, located downstream of the optical filter, as considered in direction of propagation, in the ray-path of the W-radiation, not deflected by the wave-length selective filter,
characterized by that the means for absorbing of IR-radiation are also tailored as means absorbing visible light and a predominant part of UV-radiation, and that the irradiation apparatus comprises moving means for moving the wave-length selective filter into and completely out of the ray-path of the radiation source.
2. Irradiation apparatus according to claim 1 , characterized by that the moving means allow for a rotation of the filter about an axis, which is located outside the ray-path.
3. Irradiation apparatus according to claim 1 , characterized by that the wave-length selective filter is tailored as an interference filter.
4. Irradiation apparatus according to claim 1 , characterized by that only on one side of the filter substrate a UV reflecting layer system is provided.
5. Irradiation apparatus according to claim 4 , characterized by that there is applied on the other side of the filter substrate an anti-reflex layer for the W-radiation.
6. A method for irradiating substrates by UV-radiation, comprising the steps of:
providing a radiation source, which emits UV-radiation and W-radiation,
separation of the UV-radiation from the W-radiation by means of transmission of the W-radiation through a wave-length selective filter and reflection of UV-radiation at the wave-length selective filter,
providing absorption means, which absorb radiation not deflected by the wave-length selective filter,
feeding the substrates into the area provided for the UV-irradiation,
removal of the substrates having been irradiated by the UV-radiation,
characterized by that, before the feeding and/or the removal of the substrates, the wave-length selective filter is changed with respect to its local orientation and/or position in a manner that during the feeding and/or the removal of the substrates, the UV-radiation is not reflected by the wave-length selective filter and thus impinges on the absorption means and is absorbed by these means.
7. The method according to claim 6 , characterized by that the filter is substantially moved out of the ray-path during the feeding and/or the removal of the substrates.
8. The method of claim 7 , characterized by that the filter is moved out of the ray-path by a rotation about an axis located outside the ray-path.
9. The method according to claim 6 , characterized by that the method is operated more than once and in a clocked manner.