Electron beam equipment

1. An electron beam equipment comprising:

an electron gun configured to emit primary electrons;

an energy filter configured to pass electrons with predetermined energy;

a stage configured to hold a sample; and

an objective lens configured to irradiate the sample held on the stage with the primary electrons that have passed through the energy filter,

wherein the energy filter includes a beam slit and a pair of a magnetic deflector and an electrostatic deflector that are superimposed with each other,

wherein an electron lens is provided between the beam slit and the pair of the magnetic deflector and the electrostatic deflector, the electron lens being a round lens configured to converge primary electron beams onto the beam slit and to form an image of a virtual light source of the electron gun on the beam slit, and being arranged such that application of a voltage of negative 1 kV to each said electrostatic deflector causes a 50% reduction in an energy distribution of said primary electron beams, and

wherein the pair of the magnetic deflector and the electrostatic deflector are configured for decelerating or moderating electrons.

2. The electron beam equipment according to claim 1 , wherein

the energy filter includes two pairs of magnetic and electrostatic deflectors, each pair having a magnetic deflector and an electrostatic deflector superimposed with each other, the two pairs being arranged with the beam slit interposed therebetween, and

an electron lens provided between the beam slit and at least one pair of the magnetic deflector and the electrostatic deflector.

3. The electron beam equipment according to claim 1 , wherein

the energy filter includes two pairs of magnetic and electrostatic deflectors, each pair having a magnetic deflector and an electrostatic deflector superimposed with each other, the two pairs being arranged with the beam slit interposed therebetween, and

electron lenses respectively provided between the beam slit and the two pairs of magnetic and electrostatic deflectors.

4. The electron beam equipment according to claim 1 , wherein the electron lens is one of a magnetic lens or an accelerating electrostatic lens.

5. The electron beam equipment according to claim 1 , wherein

the electron lens is a magnetic lens, and

each of the deflection directions of the magnetic deflector and the electrostatic deflector is set in a direction different from a beam restriction direction of the beam slit.

6. The electron beam equipment according to claim 5 , wherein the deflection direction of the magnetic deflector and the deflection direction of the electrostatic deflector is set based on an excitation of the magnetic lens.

7. The electron beam equipment according to claim 1 , wherein at least one of the paired magnetic deflector or electrostatic deflector is a two-stage deflector.

8. The electron beam equipment according to claim 7 , wherein alignment of a beam in the electron lens is performed using the two-stage deflector.

9. The electron beam equipment according to claim 1 , further comprising a slit movement mechanism that allows the beam slit to finely move in a shorter distance than a slit width.

10. The electron beam equipment according to claim 9 , wherein

at least one of the paired magnetic deflector or electrostatic deflector is a two-stage deflector, and

alignment of a beam in the electron lens is performed by the two-stage deflector, and alignment between the beam slit and the primary electrons is performed by the slit movement mechanism.

11. The electron beam equipment according to claim 3 , further comprising a deflector between the beam slit and the electron lens on a lower stage.