Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
According to the present disclosure, a film containing carbon added at a high concentration is formed with high controllability. A method of manufacturing a semiconductor device includes forming a film containing silicon, carbon and a predetermined element on a substrate by performing a cycle a predetermined number of times. The predetermined element is one of nitrogen and oxygen. The cycle includes supplying a precursor gas containing at least two silicon atoms per one molecule, carbon and a halogen element and having an Si—C bonding to the substrate, and supplying a modifying gas containing the predetermined element to the substrate.
1. A method of manufacturing a semiconductor device, the method comprising forming a film containing silicon, carbon and a predetermined element on a substrate by performing a cycle a first predetermined number of times, the predetermined element being one of nitrogen and oxygen, the cycle comprising:
supplying a first precursor gas containing at least two silicon atoms per one molecule, carbon and a halogen element and having an Si—C bonding to the substrate; and
supplying a modifying gas containing the predetermined element to the substrate, the modifying gas being thermally activated,
wherein supplying the modifying gas is initiated before supplying the first precursor gas is initiated, and supplying the modifying gas is stopped after supplying the first precursor gas is stopped,
wherein the act of supplying the first precursor gas and the act of supplying the modifying gas are performed under a non-plasma atmosphere.
2. The method of claim 1 , wherein supplying the modifying gas includes supplying a first modifying gas containing one of nitrogen and oxygen to the substrate,
wherein the cycle further comprises supplying a second modifying gas containing one of nitrogen and oxygen that is not contained in the first modifying gas to the substrate, and
wherein the film contains silicon, carbon, nitrogen and oxygen.
3. The method of claim 2 , wherein, in the act of forming the film, the cycle comprising: supplying the first precursor gas; supplying the first modifying gas; and supplying the second modifying gas is performed the first predetermined number of times.
4. The method of claim 2 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas and supplying the first modifying gas; and
performing a second set a third predetermined number of times, the second set including supplying the first precursor gas and supplying the second modifying gas.
5. The method of claim 2 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas, supplying the first modifying gas, and supplying the second modifying gas; and
performing a second set a third predetermined number of times, the second set including supplying the first precursor gas and supplying the second modifying gas.
6. The method of claim 2 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas and supplying the first modifying gas; and
performing a second set a third predetermined number of times, the second set including supplying the first precursor gas, supplying the first modifying gas, and supplying the second modifying gas.
7. The method of claim 1 , wherein the cycle further comprises supplying a second precursor gas containing at least silicon and a halogen element to the substrate, the second precursor gas having a molecular structure different from a molecular structure of the first precursor gas.
8. The method of claim 1 , wherein the cycle further comprises supplying a second precursor gas containing at least two silicon atoms per one molecule, carbon and a halogen element and having an Si—C bonding to the substrate, the second precursor gas having a molecular structure different from a molecular structure of the first precursor gas.
9. The method of claim 7 , wherein the cycle further comprises:
performing a set a second predetermined number of times, the set including supplying the first precursor gas and supplying the second precursor gas; and
supplying the modifying gas.
10. The method of claim 7 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas and supplying the modifying gas; and
performing a second set a third predetermined number of times, the second set including supplying the second precursor gas and supplying the modifying gas.
11. The method of claim 7 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas and supplying a first modifying gas containing one of nitrogen and oxygen to the substrate; and
performing a second set a third predetermined number of times, the second set including supplying the second precursor gas and supplying a second modifying gas containing one of nitrogen and oxygen that is not contained in the first modifying gas to the substrate.
12. The method of claim 7 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas, supplying a first modifying gas containing one of nitrogen and oxygen to the substrate, and supplying a second modifying gas containing one of nitrogen and oxygen that is not contained in the first modifying gas to the substrate; and
performing a second set a third predetermined number of times, the second set including supplying the second precursor gas and supplying the second modifying gas.
13. The method of claim 7 , wherein the cycle further comprises:
performing a first set a second predetermined number of times, the first set including supplying the first precursor gas and supplying a first modifying gas containing one of nitrogen and oxygen to the substrate; and
performing a second set a third predetermined number of times, the second set including supplying the second precursor gas, supplying the first modifying gas, and supplying a second modifying gas containing one of nitrogen and oxygen that is not contained in the first modifying gas to the substrate.
14. The method of claim 1 , wherein supplying the first precursor gas is performed a second predetermined number of times in a period in which the modifying gas is supplied.
15. The method of claim 2 , wherein supplying the first precursor gas is performed a second predetermined number of times in a period in which the first modifying gas is supplied, and
wherein supplying the first precursor gas is performed a third predetermined number of times in a period in which the second modifying gas is supplied.
16. The method of claim 7 , wherein supplying the first precursor gas is performed a second predetermined number of times in a period in which the modifying gas is supplied, and
wherein supplying the second precursor gas is performed a third predetermined number of times in a period in which the modifying gas is supplied.