Patent Assignment
Reel/Frame 047995/0490
Assignment of Assignor's Interest
Recorded: 2018-12-31
Pages: 18
Assignor
HITACHI KOKUSAI ELECTRIC INC.
Executed: 2018-12-05
Assignee
KOKUSAI ELECTRIC CORPORATION
3-4, KANDAKAJI-CHO, CHIYODA-KU, TOKYO, 101-0045, JAPAN
Covered Properties
(241)
Method of Forming an Insulation Film Having Low Impurity Concentrations
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, and Substrate Processing Apparatus
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Displaying Error of Substrate Processing Apparatus and Transfer Control Method
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Heat Treatment Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Method of Cleaning Processing Vessel
Heater Supporting Device
Method of Manufacturing a Semiconductor Device, Method of Cleaning a Process Vessel, and Substrate Processing Apparatus
Substrate Processing Apparatus
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, and Substrate Processing Apparatus
Statistical Analysis Method and Substrate Process System
Substrate Processing Apparatus and Heating Equipment
Method of Manufacturing a Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus Capable of Switching Control Mode of Heater
Substrate Processing System, Substrate Processing Apparatus and Display Method of Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Method of Processing Substrate
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing a Semiconductor Device
Substrate Processing Apparatus and Method of Manufacturing a Semiconductor Device
Semiconductor Device Manufacturing Method, Substrate Processing Apparatus and Semiconductor Device
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Semiconductor Device
Method of Manufacturing Semiconductor Device, Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Baffle Structure of the Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Forming Metal-Containing Film
Method of Manufacturing Semiconductor Device and Method of Processing Substrate and Substrate Processing Apparatus
Substrate Supporting Table, Substrate Processing Apparatus, and Manufacture Method for Semiconductor Device
Substrate Processing Apparatus and a Method of Manufacturing a Semiconductor Device
Apparatus, Method, and Computer-Readable Medium for Managing Abnormality Data Measured in the Substrate Manufacturing Process
Substrate Processing Apparatus, Program for Controlling the Same, and Method for Fabricating Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Manufacturing Substrate and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Cleaning Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Recording Medium
Method of Manufacturing Semiconductor Device and Substrate Processing Apparataus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Semiconductor Device Manufacturing Method, Substrate Processing Apparatus, and Non-Transitory Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Method of Generating Recipe
Method of Manufacturing a Siocn Film, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Cleaning, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate and Substrate Processing Apparatus
Substrate Processing Apparatus, Purging Apparatus, Method of Manufacturing Semiconductor Device, and Recording Medium
Method of Manufacturing Semiconductor Device and Method of Processing Substrate and Substrate Processing Apparatus
Method of Controlling Substrate Processing Apparatus, Maintenance Method of Substrate Processing Apparatus and Transfer Method Performed in Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device and Method of Cleaning Processing Vessel
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Cleaning Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Recording Medium
Film Forming Method and Recording Medium for Performing the Method
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Cleaning Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Insulation Structure and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Patent:
8,986,450 →
Application:
14/229,151 →
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Patent:
8,925,562 →
Application:
14/229,284 →
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Cleaning Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Semiconductor Device Manufacturing Method
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Patent:
9,018,689 →
Application:
14/230,513 →
Method of Manufacturing Semiconductor Device, Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing a Thin Film Having a High Tolerance to Etching and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Substrate Processing System, Substrate Processing Apparatus and Method for Accumulating Data for Substrate Processing Apparatus
Substrate Processing Apparatus for Managing Transfer State of Substrate Gas Storage Container Based on Supply Flow Rate
Substrate Processing Apparatus
Substrate Processing System, Management Device, and Display Method for Facilitating Trouble Analysis
Method for Manufacturing Semiconductor Device, Method for Processing Substrate, Substrate Processing Device and Recording Medium
Semiconductor Device Manufacturing Method and Substrate Processing Method Including a Cleaning Method
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus, and Program
Substrate Processing Apparatus, Method of Processing Substrate, and Method of Manufacturing Semiconductor Device
Substrate processing apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Semiconductor Device Manufacturing Method, Substrate Processing Method, and Recording Medium
Atomic Layer Deposition Processing Apparatus to Reduce Heat Energy Conduction
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Method of Processing Substrate
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Patent:
9,028,648 →
Application:
14/493,828 →
Substrate Processing Apparatus, Non-Transitory Computer-Readable Recording Medium Thereof and Semiconductor Manufacturing Method by Employing Thereof
Method of Manufacturing Semiconductor Device by Alternatively Increasing and Decreasing Pressure of Process Chamber
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer Readable Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device
Film Forming Method and Recording Medium for Performing the Method
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Including Film Having Uniform Thickness
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Cleaning Method, Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Semiconductor Device Having Electrode Made of High Work Function Material and Method of Manufacturing the Same
Semiconductor Device Having Electrode Made of High Work Function Material, Method and Apparatus for Manufacturing the Same
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, and Recording Medium
Substrate Processing Apparatus
Reaction Tube, Substrate Processing Apparatus, and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Method for Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Using Hydrocarbon and Halogen-Based Precursors, Substrate Processing Apparatus for Processing Same, and Recording Medium Comprising Hydrocarbon and Halogen-Based Precursors
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Forming Metal-Containing Film
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing a Siocn Film, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Cleaning Method, Manufacturing Method of Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Recording Medium and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device Including Forming a Film Containing a First Element, a Second Element and Carbon, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device, and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus
Method of Manufacturing a Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Method of Processing Substrate, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus and Substrate Processing System
Patent:
9,431,220 →
Application:
14/861,051 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Maintenance Method of Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Storage Medium Capable of Reading Maintenance Program of Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, Gas Supply System, and Recording Medium
Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Substrate Processing Apparatus and a Method of Manufacturing a Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Substrate Processing Apparatus, Method for Manufacturing Semiconductor Device, and Non-Transitory Computer-Readable Recording Medium
Substrate Processing Apparatus and Heating Unit
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device
Method of Manufacturing a Semiconductor Device and Recording Medium
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, Substrate Processing System and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus and Recording Medium
Substrate Processing Apparatus, Non-Transitory Computer-Readable Recording Medium Thereof and Semiconductor Manufacturing Method by Employing Thereof
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus, Apparatus for Manufacturing Semiconductor Device, and Gas Supply System
Method of Manufacturing Semiconductor Device, Method of Processing Substrate, Substrate Processing Apparatus and Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device
Patent:
9,559,022 →
Application:
15/195,086 →
Method of Manufacturing a Siocn Film, Substrate Processing Apparatus and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Gas Supply Nozzle, Substrate Processing Apparatus, and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Patent:
9,698,050 →
Application:
15/223,020 →
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Semiconductor Device Having Electrode Made of High Work Function Material, Method and Apparatus for Manufacturing the Same
Substrate Processing Apparatus
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium
Method of Manufacturing Semiconductor Device, Method of Cleaning Interior of Process Chamber, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing a Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Substrate Processing Apparatus
Cleaning Method and Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device by Forming and Modifying Film on Substrate
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device Having Air Gap Between Wirings for Low Dielectric Constant
Method of Manufacturing Semiconductor Device by Determining and Selecting Cooling Recipe Based on Temperature
Patent:
9,870,964 →
Application:
15/460,752 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Method of Forming Silicon Layer in Manufacturing Semiconductor Device and Recording Medium
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device by Forming a Film on a Substrate, Substrate Processing Apparatus, and Recording Medium
Method of Manufacturing Semiconductor Device
Patent:
9,966,261 →
Application:
15/632,806 →
Cleaning Method, Method of Manufacturing Semiconductor Device and Substrate Processing Apparatus
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device, Substrate Processing Apparatus Comprising Exhaust Port and Multiple Nozzles, and Recording Medium
Method of Manufacturing Semiconductor Device
Patent:
10,134,587 →
Application:
15/703,631 →
Method of Manufacturing Semiconductor Device
Method of Manufacturing Semiconductor Device
Patent:
10,032,630 →
Application:
15/710,414 →
Method of Manufacturing Semiconductor Device
Patent:
10,121,650 →
Application:
15/940,618 →
Boat of Wafer Processing Apparatus
Patent:
655,682 →
Application:
29/378,011 →
Boat of Wafer Processing Apparatus
Patent:
655,255 →
Application:
29/378,016 →
Related Assignments
(19)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Jan 5, 2010
From: AKAE, NAONORI; HIROSE, YOSHIRO; TAKASAWA, YUSHIN; OTA, YOSUKE
To: HITACHI KOKUSAI ELECTRIC, INC.
Reel/Frame 023732/0773 →
Assignment of Assignor's Interest
Feb 1, 2011
From: SASAJIMA, RYOTA; HIROSE, YOSHIRO; OTA, YOSUKE; AKAE, NAONORI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025728/0146 →
Assignment of Assignor's Interest
Feb 1, 2011
From: OTA, YOSUKE; AKAE, NAONORI; TAKASAWA, YUSHIN; HIROSE, YOSHIRO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025768/0246 →
Assignment of Assignor's Interest
Feb 8, 2011
From: HARADA, KAZUHIRO; ITATANI, HIDEHARU; HORII, SADAYOSHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025769/0376 →
Assignment of Assignor's Interest
Feb 8, 2011
From: ABURATANI, YUKINORI; SHIMADA, MASAKAZU; MORITA, OSAMU
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025770/0296 →
Assignment of Assignor's Interest
Feb 15, 2011
From: NABETA, KAZUYA; UKAE, NAOKI; TAKESHITA, MITSUNORI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025810/0964 →
Assignment of Assignor's Interest
Feb 24, 2011
From: YAMAZAKI, KEISHIN; HAYASHIDA, AKIRA; UENO, MASAAKI; IZUMI, MANABU
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025858/0876 →
Assignment of Assignor's Interest
Mar 4, 2011
From: MORITA, OSAMU
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025904/0397 →
Assignment of Assignor's Interest
Mar 16, 2011
From: NOMURA, MAKOTO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025967/0472 →
Assignment of Assignor's Interest
Mar 21, 2011
From: KAGA, YUKINAO; SAITO, TATSUYUKI; SAKAI, MASANORI; YOKOGAWA, TAKASHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 025991/0570 →
Assignment of Assignor's Interest
Apr 4, 2011
From: SAITO, TATSUYUKI; SAKAI, MASANORI; KAGA, YUKINAO; YOKOGAWA, TAKASHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 026068/0554 →
Assignment of Assignor's Interest
May 23, 2011
From: TAKASAWA, YUSHIN; HIROSE, YOSHIRO; KAMAKURA, TSUKASA; KAGA, YUKINAO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 026324/0332 →
Assignment of Assignor's Interest
Jun 29, 2011
From: SONOBE, JUN; TADAKI, YUDAI
To: HITACHI KOKUSAI ELECTRIC INC.; L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
Reel/Frame 026523/0546 →
Assignment of Assignor's Interest
Jun 29, 2011
From: HIROSE, YOSHIRO; TAKASAWA, YUSHIN; KAMAKURA, TSUKASA; NAKAMURA, YOSHINOBU
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 026522/0957 →
Assignment of Assignor's Interest
Jun 29, 2011
From: KAMEDA, KENJI
To: HITACHI KOKUSAI ELECTRIC INC.; L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
Reel/Frame 026523/0375 →
Assignment of Assignor's Interest
Jul 15, 2011
From: KOSUGI, TETSUYA; MURATA, HITOSHI; SUGIURA, SHINOBU; UENO, MASAAKI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 026599/0280 →
Assignment of Assignor's Interest
Sep 12, 2011
From: AKAE, NAONORI; HIROSE, YOSHIRO; MURAKAMI, KOTARO
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 026887/0229 →
Assignment of Assignor's Interest
Mar 10, 2016
From: TAKANO, SATOSHI
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 037945/0923 →
Assignment of Assignor's Interest
Aug 10, 2016
From: L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE
To: HITACHI KOKUSAI ELECTRIC INC.
Reel/Frame 039397/0578 →