Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
There is provided a method of manufacturing a semiconductor device, which includes: forming a seed layer doped with a dopant on a substrate by performing a cycle a predetermined number of times, the cycle including: supplying a halogen-based first process gas to the substrate, supplying a non-halogen-based second process gas to the substrate, and supplying a dopant gas to the substrate; and supplying a third process gas to the substrate to form a film on the seed layer.
1. A method of manufacturing a semiconductor device, comprising:
forming a seed layer doped with a dopant on a substrate by performing a cycle a predetermined number of times, the cycle including:
supplying a halogen-based first process gas to the substrate,
supplying a non-halogen-based second process gas to the substrate, and
supplying a dopant gas to the substrate; and
supplying a third process gas to the substrate to form a film on the seed layer,
wherein the act of forming the seed layer includes a period during which at least one of the act of supplying the first process gas and the act of supplying the second process gas, and the act of supplying the dopant gas are simultaneously performed, and
wherein a pressure of a space where the substrate is present in the act of supplying the first process gas is set to be greater than a pressure of a space where the substrate is present in each of the act of supplying the second process gas and the act of supplying the dopant gas, and a pressure of a space where the substrate is present in each of the act of supplying the second process gas and the act of supplying the dopant gas is set to be greater than a pressure of a space where the substrate is present in the act of forming the film.
2. The method of claim 1 , wherein the act of forming the seed layer includes:
forming a first seed layer not doped with a dopant on the substrate by performing a first set a predetermined number of times, the first set including:
the act of supplying the first process gas, and
the act of supplying the second process gas; and
forming a second seed layer doped with a dopant on the first seed layer by performing a second set a predetermined number of times, the second set including:
the act of supplying the first process gas,
the act of supplying the second process gas, and
the act of supplying the dopant gas.
3. The method of claim 1 , wherein the act of forming the film includes supplying a dopant gas to the substrate, and
the film is a film doped with a dopant.
4. The method of claim 3 , wherein a concentration of the dopant in the seed layer is set to be different from a concentration of the dopant in the film.
5. The method of claim 3 , wherein a concentration of the dopant in the seed layer is set to be smaller than a concentration of the dopant in the film.
6. The method of claim 3 , wherein a supply flow rate of the dopant gas in the act of forming the seed layer is set to be smaller than a supply flow rate of the dopant gas in the act of forming the film.
7. The method of claim 1 , wherein a pressure of a space where the substrate is present in the act of forming the seed layer is set to be greater than a pressure of a space where the substrate is present in the act of forming the film.
8. The method of claim 1 , wherein the dopant gas includes at least one selected from a group consisting of boron, aluminum, gallium, phosphorus, arsenic, and antimony.
9. The method of claim 1 , wherein each of the first process gas, the second process gas, and the third process gas contains the same element constituting the film.