Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device includes receiving film thickness distribution data of a polished first insulating film of a substrate; calculating processing data for reducing a difference between a film thickness at a center side of the substrate and a film thickness at a periphery side of the substrate, based on the film thickness distribution data; loading the substrate into a process chamber; supplying a process gas to the substrate; and correcting a film thickness of the first insulating film based on the processing data by activating the process gas so that a concentration of active species of the process gas generated at the center side of the substrate differs from a concentration of active species of the process gas generated at the periphery side of the substrate.
1. A method of manufacturing a semiconductor device, comprising:
receiving film thickness distribution data indicative of a film thickness distribution of a polished first insulating film of a substrate;
calculating processing data for reducing a difference between a film thickness at a center side of the substrate and a film thickness at a periphery side of the substrate, based on the film thickness distribution data;
loading the substrate into a process chamber;
supplying a process gas to the substrate; and
correcting the film thickness distribution of the first insulating film by activating the process gas, based on the processing data, to form a second insulating film on the first insulating film, a concentration of active species of the activated process gas generated at the center side of the substrate differing from a concentration of active species of the activated process gas generated at the periphery side of the substrate.
2. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed in a state in which a magnetic force generated from a lateral side of the substrate is made larger than a magnetic force generated from an upper side of the substrate.
3. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed by activating the process gas while making high-frequency power supplied from a lateral side of the substrate higher than high-frequency power supplied from an upper side of the substrate.
4. The method of claim 2 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed by activating the process gas while making high-frequency power supplied from the lateral side of the substrate higher than high-frequency power supplied from the upper side of the substrate.
5. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the periphery side of the substrate lower than an electric potential at the center side of the substrate.
6. The method of claim 2 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the periphery side of the substrate lower than an electric potential at the center side of the substrate.
7. The method of claim 3 , wherein if the film thickness distribution data are such that the film thickness at the periphery side of the substrate is smaller than the film thickness at the center side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the periphery side of the substrate lower than an electric potential at the center side of the substrate.
8. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed in a state in which a magnetic force generated from an upper side of the substrate is made larger than a magnetic force generated from a lateral side of the substrate.
9. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed by activating the process gas while making high-frequency power supplied from an upper side of the substrate higher than high-frequency power supplied from a lateral side of the substrate.
10. The method of claim 8 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed by activating the process gas while making high-frequency power supplied from an upper side of the substrate higher than high-frequency power supplied from a lateral side of the substrate.
11. The method of claim 1 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the center side of the substrate lower than an electric potential at the periphery side of the substrate.
12. The method of claim 8 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the center side of the substrate lower than an electric potential at the periphery side of the substrate.
13. The method of claim 9 , wherein if the film thickness distribution data are such that the film thickness at the center side of the substrate is smaller than the film thickness at the periphery side of the substrate, the act of correcting the film thickness distribution is performed by making an electric potential at the center side of the substrate lower than an electric potential at the periphery side of the substrate.
14. The method of claim 1 , wherein the first insulating film includes a first element and the second insulating film includes the first element.
15. The method of claim 14 , wherein after the act of correcting the film thickness distribution, patterning the first insulating film and the second insulating film is performed.
16. The method of claim 1 , wherein before the act of correcting the film thickness distribution, the film thickness of the first insulating film is measured.