Substrate processing apparatus
A substrate processing apparatus includes a substrate retaining mechanism; a detecting unit detecting a placed state of the substrate retained by the substrate retaining mechanism; a first determination unit comparing detection data of the substrate obtained by the detecting unit with master data that is a reference to determine if the detection data is within a first allowed value; a confirmation unit confirming substrate type; a second determination unit comparing the detection data of the substrate with the master data to determine if the detection data is within a second allowed value; and a transfer control unit controlling the substrate retaining mechanism depending on a determination result of the second determination unit when substrate type is confirmed as a predetermined type by the confirmation unit when it is determined that the detection data is not within the first allowed value as determined by the first determination unit.
1. A substrate processing apparatus comprising:
a substrate retaining mechanism retaining a substrate;
a detecting unit configured to detect a placed state of the substrate retained by the substrate retaining mechanism;
a first determination unit configured to compare detection data of the substrate obtained by the detecting unit with master data that is a reference and is obtained beforehand to determine whether or not the detection data of the substrate is within a first allowed value;
a confirmation unit configured to confirm a type of the substrate;
a second determination unit configured to compare the detection data of the substrate with the master data to determine whether or not the detection data is within a second allowed value; and
a transfer control unit configured to control the substrate retaining mechanism depending on a determination result of the second determination unit when it is confirmed that a type of the substrate is a predetermined type by the confirmation unit when it is determined that the detection data is not within the first allowed value as a determination result of the first determination unit, and
the transfer control unit makes a range of the second allowed value is being compared to the predetermined type.
2. The substrate processing apparatus according to claim 1 ,
wherein the substrate retaining mechanism is provided with a first predetermined number of retaining units each of which is configured to retain the substrate, and the transfer control unit is configured to repeatedly perform comparison by the first determination unit a first predetermined number of times, and repeatedly perform comparison by the second determination unit a second predetermined number of times.
3. The substrate processing apparatus according to claim 1 ,
wherein the transfer control unit is configured not to perform comparison by the second determination unit for each of the retaining units when a determination result of the first determination unit is that there is an abnormality, and a confirmation result by the confirmation unit is that the substrate is not of the predetermined type.
4. The substrate processing apparatus according to claim 1 ,
wherein, a range of the first allowed value is set narrower than that of the second allowed value in the comparison of the second determination unit when the confirmation result by the confirmation unit is that the substrate of the predetermined type is a dummy substrate.
5. The substrate processing apparatus according to claim 1 ,
wherein the transfer control unit is configured to set the range of the first allowed value to be same regardless of the type of the substrate.
6. The substrate processing apparatus according to claim 2 ,
wherein the transfer control unit confirms presence of substrate presence data and the detection data from the detecting unit for each of the retaining units, and sets the retaining unit in which there is not the substrate and there is the detection data, to abnormal slots.
7. The substrate processing apparatus according to claim 2 ,
wherein the substrate retaining mechanism is configured to wait until processing ends of removing an abnormality occurring in the retaining unit when the determination result of the second determination unit is that there is the abnormality.
8. The substrate processing apparatus according to claim 2 ,
wherein the transfer control unit is configured to set the range of the first allowed value to be same regardless of the type of the substrate.
9. The substrate processing apparatus according to claim 3 ,
wherein the transfer control unit is configured to set the range of the first allowed value to be same regardless of the type of the substrate.
10. The substrate processing apparatus according to claim 2 ,
wherein the first predetermined number is the number of all slots to which the substrate is transferred by the substrate retaining mechanism.
11. The substrate processing apparatus according to claim 1 ,
wherein, the range of the first allowed value is set wider than that of the second allowed value in the comparison of the second determination unit when the substrate of the predetermined type is a monitor substrate.
12. The substrate processing apparatus according to claim 2 ,
wherein the transfer control unit confirms presence of substrate presence data and the detection data from the detecting unit for each of the retaining units, and sets the retaining unit in which there is the substrate and there is not the detection data, to abnormal slots.
13. The substrate processing apparatus according to claim 1 wherein the predetermined type is a dummy substrate.
14. The substrate processing apparatus according to claim 1 wherein the predetermined type is a monitor substrate.