Substrate processing apparatus, method of manufacturing semiconductor device, and method of generating recipe
Provided is a method of automatically setting, in a recipe, a process parameter (PP) according to the number of substrates to be processed. The method includes (a) displaying a process parameter of a process recipe on a display unit; (b) displaying a parameter name in a process parameter file on the display unit; (c) generating a first recipe by substituting the process parameter with the parameter name; (d) downloading the first recipe and one of a plurality of condition tables corresponding to the selected number of substrates when the number of substrates to be processed in a processing chamber is selected; and (e) generating a second recipe by substituting the process parameter of the downloaded one of the condition tables for the parameter name in the downloaded first recipe.
1. A control method performed by a substrate processing apparatus comprising:
a processing chamber configured to process a substrate;
a hard disk comprising:
a recipe storage storing a process recipe including an item field and a value field for processing the substrate, wherein the value field includes a numeric value which represents a time required for a step of the process recipe; and
a process parameter file storage storing a process parameter file including a process parameter name and a plurality of condition tables, wherein each condition table includes a process parameter corresponding to a number of substrates to be processed in the processing chamber;
a controller configured to execute the process recipe; and
a display configured to display at least the process parameter and the process parameter name, the control method comprising:
(a) displaying the item field and the value field of the process recipe stored in the process recipe storage unit on the display;
(b) associating the process recipe with the process parameter file;
(c) displaying the parameter name of the process parameter file associated with the process recipe on the display;
(d) substituting the numeric value in the value field of the process recipe with the process parameter name of the process parameter file associated with the process recipe;
(e) acquiring the number of substrates to be processed;
(f) extracting one of the plurality of condition tables corresponding to the acquired number of substrates to be processed;
(g) creating a new process recipe by substituting the parameter name in the value field with the process parameter in the extracted one of the plurality of condition tables; and
(h) controlling a parameter of the processing chamber based on the process parameter in the new process recipe when processing the substrate.
2. The method according to claim 1 , wherein one of a variable parameter and a condition parameter is selected after an item of the process parameter is selected.
3. The method according to claim 1 , wherein the plurality of condition tables comprise number of product substrates or number of substrates including dummy substrates and the product substrates.