Substrate processing apparatus, non-transitory computer-readable recording medium thereof and semiconductor manufacturing method by employing thereof
Embodiments of the invention relate to a substrate processing apparatus. In one embodiment, a substrate processing apparatus includes a plurality of process units. The process unit includes a process chamber for processing a substrate, an exhaust conduit connected to the process chamber and an exhaust pump arranged in the path of the exhaust conduit. The substrate processing apparatus further includes a connecting conduit connected to the exhaust conduits of the process units in the upstream of the exhaust pump and a switching unit which switches an exhaust path of the process chamber to the other exhaust pump in the other process unit via the connecting conduit.
1. A substrate processing apparatus comprising:
a plurality of process units, each process unit including:
a process chamber for processing a substrate,
an exhaust conduit connected to the process chamber and
an exhaust pump arranged in a path of the exhaust conduit;
a connecting conduit connected to the exhaust conduits of the process units upstream of the exhaust pumps of the process units;
a switching unit which switches an exhaust path of the process chamber to another exhaust pump in another process unit via the connecting conduit;
a controller controlling the operation of the switching unit; and
a detector for detecting an abnormality of the exhaust pump,
wherein the controller controls the switching unit so that the process chamber in the process unit that includes the exhaust pump having the detected abnormality is connected to the exhaust pump in the process chamber that is in an idle state.
2. The substrate processing apparatus according to claim 1 , further comprising:
an operation unit which inputs an indication from a user, wherein the controller further controls the switching unit based on the indication input from the operation unit.
3. The substrate processing apparatus according to claim 1 , wherein the process unit including the exhaust pump having the detected abnormality is bearing a higher load and is located in a nearby or neighboring position of the process unit including the exhaust pump in the idle state bearing a lower load.
4. The substrate processing apparatus according to claim 1 , wherein the detector detects at least one of parameters including number of revolutions, watt consumption, temperature of the exhaust pump or pressure of the exhaust conduit.
5. The substrate processing apparatus according to claim 1 , wherein the idle state is the state except for the state of forming a film.
6. The substrate processing apparatus according to claim 1 , wherein the idle state is the state except for the state of cleaning chamber.
7. The substrate processing apparatus according to claim 1 , wherein the idle state includes the state of transferring a substrate.