Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium
A method of manufacturing a semiconductor device is provided. The method includes treating a surface of an insulating film formed on a substrate by supplying a first gas containing a halogen group to the substrate, and forming a thin film containing a predetermined element on the treated surface of the insulating film by performing a cycle a predetermined number of times. The cycle includes supplying a second gas containing the predetermined element and a halogen group to the substrate, and supplying a third gas to the substrate.
1. A method of manufacturing a semiconductor device, comprising:
treating a surface of an insulating film formed on a substrate by supplying a first gas containing a halogen group to the substrate; and
forming a thin film containing a predetermined element on the treated surface of the insulating film by performing a cycle a predetermined number of times, the cycle comprising: supplying a second gas containing the predetermined element and a halogen group to the substrate; and supplying a third gas to the substrate,
wherein in the act of treating the surface of the insulating film, the surface of the insulating film is terminated by the halogen group.
2. The method of claim 1 , wherein a temperature of the substrate when treating the surface of the insulating film is set higher than a temperature of the substrate when forming the thin film.
3. The method of claim 1 , wherein the first gas and the second gas comprise the same substance.
4. The method of claim 1 , wherein the first gas comprises at least one selected from a group consisting of a hydrogen chloride gas and a chlorine gas.
5. The method of claim 1 , wherein the first gas further contains the predetermined element.
6. The method of claim 1 , wherein the third gas contains the predetermined element and an amino group.
7. The method of claim 1 , wherein the thin film is composed of the predetermined element.
8. The method of claim 1 , wherein the third gas contains one amino group in one molecule.
9. The method of claim 1 , wherein the third gas comprises at least one selected from a group consisting of a nitrogen-containing gas, an oxygen-containing gas, a hydrogen-containing gas, a carbon-containing gas, a carbon- and nitrogen-containing gas, and a boron-containing gas.
10. The method of claim 1 , wherein the halogen group comprises a chloro group or a fluoro group.
11. The method of claim 1 , wherein the insulating film comprises at least one selected from a group consisting of an oxide film, a nitride film, and an oxynitride film.
12. A method of manufacturing a semiconductor device, comprising:
treating a surface of an insulating film formed on a substrate by supplying a first gas containing a halogen group to the substrate; and
forming a thin film containing a predetermined element on the treated surface of the insulating film by performing a cycle a predetermined number of times, the cycle comprising: supplying a second gas containing the predetermined element and a halogen group to the substrate; and supplying a third gas to the substrate,
wherein in the act of treating the surface of the insulating film, a seed layer containing the halogen group is formed on the surface of the insulating film, and
wherein a thickness of the seed layer is 0.5 to 2 Å.
13. A method of manufacturing a semiconductor device, comprising:
treating a surface of an insulating film formed on a substrate by supplying a first gas containing a halogen group to the substrate; and
forming a thin film containing a predetermined element on the treated surface of the insulating film by performing a cycle a predetermined number of times, the cycle comprising:
supplying a second gas containing the predetermined element and a halogen group to the substrate; and
supplying a third gas to the substrate,
wherein the first gas and the second gas comprise different substances.
14. A non-transitory computer-readable recording medium storing a program that causes a computer to perform a process of:
treating a surface of an insulating film formed on a substrate by supplying a first gas containing a halogen group to the substrate; and
forming a thin film containing a predetermined element on the treated surface of the insulating film by performing a cycle a predetermined number of times, the cycle comprising: supplying a second gas containing the predetermined element and a halogen group to the substrate; and supplying a third gas to the substrate,
wherein in the process of treating the surface of the insulating film, the surface of the insulating film is terminated by the halogen group.