Method of manufacturing semiconductor device
A method of manufacturing a semiconductor device includes: processing a substrate by operating a processing apparatus included in a substrate processing apparatus, based on a first process setting; acquiring apparatus data of the processing apparatus when processing the substrate; generating first evaluation data of the processing apparatus based on an evaluation factor corresponding to the first process setting and the apparatus data; determining one or more recipe items executable in the processing apparatus based on the first evaluation data; and notifying the one or more recipe items.
1. A method of manufacturing a semiconductor device, comprising:
processing a substrate by operating a plurality of processing apparatuses included in a substrate processing system, based on a first process setting;
acquiring, by a controller, one or more measurement values of each of the plurality of processing apparatuses after processing the substrate, the one or more measurement values including at least one of a process chamber pressure, a high-frequency power, or a travelling wave power;
generating, by the controller, first evaluation data of each of the plurality of processing apparatuses corresponding to the first process setting based on one or more evaluation factors and the measurement values, the evaluation factors for the measurement values, which correspond to the first process setting, being read from at least one of a storage unit and a network;
determining one or more process recipes executable in each of the plurality of processing apparatuses based on a score value calculated from the first evaluation data of each of the plurality of processing apparatuses; and
notifying one or more of the plurality of processing apparatuses of the one or more process recipes;
further processing a new substrate by operating the plurality of processing apparatuses according to the determined one or more process recipes.
2. The method of claim 1 , further comprising:
displaying, on a display of each of the plurality of processing apparatuses, the one or more process recipes executable in the each of the plurality of processing apparatuses.
3. The method of claim 2 , wherein the substrate processing system includes a plurality of process modules each of which includes at least two of the plurality of processing apparatuses, and further comprising:
notifying the at least two of the plurality of processing apparatuses a common process recipe, as a process recipe common to the at least two of the plurality of processing apparatuses, among the one or more process recipes.
4. The method of claim 1 , wherein in the act of generating the first evaluation data, the evaluation factor is inputted from a host device to the substrate processing system.
5. The method of claim 2 , wherein in the act of generating the first evaluation data, the evaluation factor is inputted from a host device to the substrate processing system.
6. The method of claim 3 , wherein in the act of generating the first evaluation data, the evaluation factor is inputted from a host device to the substrate processing system.
7. The method of claim 1 , wherein in the act of generating the first evaluation data, the evaluation factor is changed based on second evaluation data inputted from a host device to the substrate processing system and the first evaluation data.
8. The method of claim 2 , wherein in the act of generating the first evaluation data, the evaluation factor is changed based on second evaluation data inputted from a host device to the substrate processing system and the first evaluation data.
9. The method of claim 3 , wherein in the act of generating the first evaluation data, the evaluation factor is changed based on second evaluation data inputted from a host device to the substrate processing system and the first evaluation data.
10. The method of claim 4 , wherein in the act of generating the first evaluation data, the evaluation factor is changed based on second evaluation data inputted from a host device to the substrate processing system and the first evaluation data.
11. The method of claim 7 , further comprising:
repeating the act of processing the substrate, the act of acquiring the apparatus data and the act of generating the first evaluation data.
12. The method of claim 2 , further comprising:
repeating the act of processing the substrate, the act of acquiring the apparatus data and the act of generating the first evaluation data.
13. The method of claim 3 , further comprising:
repeating the act of processing the substrate, the act of acquiring the apparatus data and the act of generating the first evaluation data.
14. The method of claim 4 , further comprising:
repeating the act of processing the substrate, the act of acquiring the apparatus data and the act of generating the first evaluation data.
15. The method of claim 10 , further comprising:
repeating the act of processing the substrate, the act of acquiring the apparatus data and the act of generating the first evaluation data.
16. The method of claim 11 , further comprising:
changing the evaluation factor based on evaluation data having a largest difference from the second evaluation data, among a plurality of first evaluation data generated in the act of repeating.
17. The method of claim 11 , further comprising:
changing the evaluation factor based on evaluation data having a smallest difference from the second evaluation data, among a plurality of first evaluation data generated in the act of repeating.
18. The method of claim 1 , wherein the substrate processing system includes a plurality of process modules each of which includes at least two of the plurality of processing apparatuses, and further comprising:
notifying the at least two of the plurality of processing apparatuses a common process recipe, as a process recipe common to the at least two of the plurality of processing apparatuses, among the one or more process recipes.