Imaging apparatus and imaging method
According to one embodiment, an imaging apparatus includes a light source for illumination, a stage on which an imaging object illuminated by illumination light from the light source is to be placed, a critical illumination optical system configured to supply the illumination light to the imaging object placed on the stage, and to have a greater magnification in a first axis direction than in a second axis direction, an imaging optical system configured to form an image of the imaging object placed on the stage and illuminated using the critical illumination optical system, and a detector configured to detect the image of the imaging object formed by the imaging optical system, and to have a detection area longer in the first axis direction than in the second axis direction.
1. An imaging apparatus comprising:
a light source for illumination;
a stage on which an imaging object illuminated by illumination light from the light source is to be placed;
a critical illumination optical system configured to supply the illumination light from the light source to the imaging object placed on the stage, and to have a greater magnification in a first axis direction than in a second axis direction perpendicular to the first axis direction;
an imaging optical system configured to form an image of the imaging object placed on the stage and illuminated using the critical illumination optical system;
an elliptical arc shape mirror and a linear mirror, the elliptical arc shape mirror being arranged closer to the light source along the first axis direction than the second axis direction; and
a detector configured to detect the image of the imaging object formed by the imaging optical system, the detector having a detection area longer in the first axis direction than in the second axis direction, and including a plurality of pixels arrayed in the first axis direction.
2. The apparatus of claim 1 , wherein a ratio of the magnification in the first axis direction to the magnification in the second axis direction in the critical illumination optical system corresponds to a ratio of a length of the detection area in the first axis direction to a length of the detection area in the second axis direction.
3. The apparatus of claim 1 , wherein the detector includes a plurality of one-dimensionally arrayed pixels.
4. The apparatus of claim 1 , wherein the imaging object is an exposure mask.
5. The apparatus of claim 1 , wherein the elliptical arc shape mirror and the linear mirror are cylindrical mirrors.
6. An imaging method comprising:
supplying illumination light from a light source to an imaging object placed on a stage using a critical illumination optical system configured to have a greater magnification in a first axis direction than in a second axis direction perpendicular to the first axis direction, the optical system having an elliptical arc shape mirror and a linear mirror, the elliptical arc shape mirror being arranged closer to the light source along the first axis direction than the second axis direction; and
detecting an image of the imaging object formed by an imaging optical system by a detector, the detector having a detection area longer in the first axis direction than in the second axis direction and including a plurality of pixels arrayed in the first axis direction.
7. The method of claim 6 , wherein a ratio of the magnification in the first axis direction to the magnification in the second axis direction in the critical illumination optical system corresponds to a ratio of a length of the detection area in the first axis direction to a length of the detection area in the second axis direction.
8. The method of claim 6 , wherein the detector includes a plurality of one-dimensionally arrayed pixels.
9. The method of claim 6 , wherein the imaging object is an exposure mask.
10. The method of claim 6 , wherein the elliptical arc shape mirror and the linear mirror are cylindrical mirrors.