Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
A method for Neutral Beam irradiation derived from gas cluster ion beams and articles produced thereby including optical elements.
1. A method of treating a surface of an optical element comprising the steps of:
providing a reduced pressure chamber;
forming a gas cluster ion beam comprising gas cluster ions within the reduced pressure chamber;
accelerating and focusing the gas cluster ions to form an accelerated and focused gas cluster ion beam along a beam path within the reduced pressure chamber;
promoting fragmentation and/or dissociation of the accelerated and focused gas cluster ions along the beam path while substantially retaining the focus of the gas cluster ion-beam;
removing charged particles from the beam path to form an accelerated and focused neutral beam along the beam path in the reduced pressure chamber;
holding the optical element in the beam path;
treating at least a portion of a surface of the optical element by irradiating it with the accelerated and focused neutral beam; and
wherein the promoting and removing steps occur prior to irradiating the surface.
2. The method of claim 1 , wherein the step of removing removes essentially all charged particles from the beam path.
3. The method of claim 1 , wherein the neutral beam is substantially free of intermediate sized clusters having a few hundred to a few thousand atoms or molecules.
4. The method of claim 1 , wherein the neutral beam consists essentially of gas from the gas cluster ion beam.
5. The method of claim 1 , wherein the step of promoting includes raising an acceleration voltage in the step of accelerating or improving ionization efficiency in the forming of the gas cluster ion beam.
6. The method of claim 1 , wherein the step of promoting includes increasing the range of velocities of ions in the accelerated gas cluster ion beam.
7. The method of claim 1 , wherein the step of promoting includes introducing one or more gaseous elements used in forming the gas cluster ion beam into the reduced pressure chamber to increase pressure along the beam path.
8. The method of claim 1 , wherein the step of promoting includes increasing the size of a skimmer aperture used in the step of forming the gas cluster ion beam.
9. The method of claim 1 , wherein the step of promoting includes irradiating the accelerated gas cluster ion beam or the neutral beam with radiant energy.
10. The method of claim 1 , wherein the neutral beam treating at least a portion of a surface of the workpiece consists substantially of monomers having an energy between 1 eV and several thousand eV.
11. The method of claim 1 , further comprising the step of repositioning the workpiece with a workpiece holder to treat plural portions of the surface.
12. The method of claim 1 , further comprising the step of scanning the workpiece with a workpiece holder to treat extended portions of the surface.
13. The method of claim 1 , where the holding step introduces the optical device that comprises any of:
an electrically insulating material;
a high electrical resistivity material;
a crystalline material;
an amorphous material;
a hygroscopic material;
a glass material;
a gem material;
quartz; or
a transparent material.
14. The method of claim 1 , wherein the treating step forms an optical coating on the optical element.
15. The method of claim 1 , wherein the treating step modifies an optical property of the optical element.
16. The method of claim 15 , wherein the optical property is a refractive index.
17. The method of claim 1 , wherein the optical element is a gem material.
18. The method of claim 17 , wherein the gem material is selected from the group consisting of diamond, sapphire, quartz, or a synthetic gem material.
19. The method of claim 1 , wherein the optical element comprises lithium triborate (LBO) and further wherein the treating step forms a surface barrier that reduces reactivity or susceptibility to moisture degradation at the surface of the LBO.
20. The method of claim 19 , wherein the forming step further comprises forming a gas cluster ion beam comprising gas cluster ions comprising methane.
21. The method of claim 19 , wherein the treating step smoothens the at least a portion of the surface of the LBO to an RMS roughness less than 0.3 nm.
22. The method of claim 1 , wherein the step of promoting fragmentation and/or dissociation of the accelerated and focused gas cluster ion beam does not deflect the accelerated and focused gas cluster ion beam.