IP Library Granted Patent US 9,484,375
Granted Patent B2
US 9,484,375 · App. 14/466,258 · Granted Nov 1, 2016

Image sensor with 3D stack structure

Inventor: Kyung Su Byun (Cheongju-si, KR)
Assignee: SiliconFile Technologies Inc.
H01L27/14629H01L27/1469H01L27/14634H01L27/14647
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Quick Facts
Patent No.
US 9,484,375
App. No.
14/466,258
Granted
Nov 1, 2016
Kind
B2
Abstract

Disclosed is an image sensor with a 3D stack structure, in which pixels of a top plate are realized as image pixels and pixels of a bottom plate are realized as pixels for realizing a phase difference AF, so that the phase difference AF is realized without loss of resolution. In the image sensor with a 3D stack structure, a problem of the reduction of resolution, which is a disadvantage of an existing imaging surface phase difference AF device, is solved, so that a fast phase difference AF is realized while maintaining high resolution without a separate phase difference AF module.

Claims (16)

1. An image sensor with a 3D stack structure, comprising:

a first substrate including a first photodiode; and

a second substrate including a second photodiode and stacked at an upper portion of the first substrate,

wherein a part of light incident into the first photodiode is blocked to realize a phase difference AF function.

2. The image sensor with a 3D stack structure according to claim 1 , wherein a size of the first photodiode is smaller than a size of the second photodiode.

3. The image sensor with a 3D stack structure according to claim 1 , wherein a metal interconnection is formed at an upper portion of the first photodiode such that light is prevented from being incident into a part of the first photodiode.

4. The image sensor with a 3D stack structure according to claim 1 , wherein a blocking layer is formed on a bonding surface between the first substrate and the second substrate such that light is prevented from being incident into a part of the first photodiode.

5. The image sensor with a 3D stack structure according to claim 4 , wherein the blocking layer includes a black material.

6. The image sensor with a 3D stack structure according to claim 1 , wherein a light waveguide is formed at an upper portion of a part at which light is incident into the first photodiode.

7. The image sensor with a 3D stack structure according to claim 4 , wherein a light waveguide is formed at an upper portion of a part at which light is incident into the first photodiode.

8. The image sensor with a 3D stack structure according to claim 1 , wherein a Talbot effect induction filter is formed at an upper portion of the first photodiode.

9. The image sensor with a 3D stack structure according to claim 1 , wherein distance measurement between objects or three dimensional image capturing is possible.

10. The image sensor with a 3D stack structure according to claim 2 , wherein a blocking layer is formed on a bonding surface between the first substrate and the second substrate such that light is prevented from being incident into a part of the first photodiode.

11. The image sensor with a 3D stack structure according to claim 10 , wherein the blocking layer includes a black material.

12. The image sensor with a 3D stack structure according to claim 10 , wherein a light waveguide is formed at an upper portion of a part at which light is incident into the first photodiode.

13. The image sensor with a 3D stack structure according to claim 2 , wherein a light waveguide is formed at an upper portion of a part at which light is incident into the first photodiode.

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 20, 2017
From: SILICONFILE TECHNOLOGIES INC.
To: SK HYNIX INC.
Reel/Frame 041023/0058 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 22, 2014
From: BYUN, KYUNG SU
To: SILICONFILE TECHNOLOGIES INC.
Reel/Frame 033593/0560 →
Priority Claims (1)
KR 10-2013-0099670 · Aug 22, 2013 · national
Continuity (1)
Related Publication 20150053846A1 · Feb 26, 2015