IP Library Granted Patent US 9,245,713
Granted Patent B2
US 9,245,713 · App. 14/470,135 · Granted Jan 26, 2016

Charged particle beam apparatus

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Quick Facts
Patent No.
US 9,245,713
App. No.
14/470,135
Granted
Jan 26, 2016
Kind
B2
Abstract

A charged particle beam apparatus for processing a tip end portion of a sample into a needle shape, includes an ion beam irradiation unit that irradiates the tip end portion with ion beams, an electron beam irradiation unit that irradiates the tip end portion with electron beams, a secondary electron detection unit that detects secondary electrons generated at the tip end portion by the irradiation with the electron beams, and an EBSD detection unit that detects diffracted electrons generated at the tip end portion by the irradiation with the electron beams.

Claims (21)

1. A charged particle beam apparatus for processing a tip end portion of a sample into a needle shape, the charged particle beam apparatus comprising:

an ion beam irradiation unit configured to irradiate the tip end portion with ion beams;

an electron beam irradiation unit configured to irradiate the tip end portion with electron beams;

a secondary electron detection unit configured to detect secondary electrons generated at the tip end portion by the irradiation with the electron beams; and

an EBSD detection unit configured to detect backscattered diffracted electrons generated at the tip end portion by the irradiation with the electron beams.

2. The charged particle beam apparatus according to claim 1 , wherein the ion beam irradiation unit and the electron beam irradiation unit are disposed such that the ion beams and the electron beams are perpendicular to each other.

3. The charged particle beam apparatus according to claim 2 ,

wherein the EBSD detection unit has a detection surface for detecting the diffracted electrons, the detection surface being directed toward the tip end portion, and

wherein the detection surface is disposed in a direction perpendicular to both of the ion beams and the electron beams when viewed from the tip end portion.

4. The charged particle beam apparatus according to claim 1 , further comprising:

an EDS detection unit configured to detect X rays generated at the tip end portion.

5. The charged particle beam apparatus according to claim 1 , further comprising:

a STEM detection unit disposed along an irradiation direction of the electron beams and configured to detect transmitted electrons which are transmitted through the tip end portion.

6. The charged particle beam apparatus according to claim 1 , wherein the sample is used for atom probe analysis.

7. The charged particle beam apparatus according to claim 1 , further comprising:

a sample holding unit configured to fix a position of the sample such that the tip end portion is disposed at an intersection between the ion beams and the electron beams.

8. The charged particle beam apparatus according to claim 1 , further comprising:

a display unit configured to display at least a detection result from the secondary electron detection unit and a detection result from the EBSD detection unit.

9. The charged particle beam apparatus according to claim 1 ,

wherein the EBSD detection unit has a detection surface for detecting the diffracted electrons, the detection surface being directed toward the tip end portion, and

wherein the detection surface is disposed to detect diffracted electrons traveling in a direction perpendicular to an irradiation direction of the electron beams.

Assignments (3)
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0636 →
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072909/0223 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 27, 2014
From: MAN, XIN; ASAHATA, TATSUYA; UEMOTO, ATSUSHI
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 033622/0173 →