IP Library Granted Patent US 9,000,370
Granted Patent B2
US 9,000,370 · App. 14/512,672 · Granted Apr 7, 2015

System and method for controlling charge-up in an electron beam apparatus

Inventors: Weiming Ren (San Jose, CA); Zhongwei Chen (San Jose, CA)
Assignee: Hermes Microvision Inc.
H01J37/026H01J37/28H01J2237/0262
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Quick Facts
Patent No.
US 9,000,370
App. No.
14/512,672
Granted
Apr 7, 2015
Kind
B2
Abstract

The present invention provides means and corresponding embodiments to control charge-up in an electron beam apparatus, which can eliminate the positive charges soon after being generated on the sample surface within a frame cycle of imaging scanning. The means are to let some or all of secondary electrons emitted from the sample surface return back to neutralize positive charges built up thereon so as to reach a charge balance within a limited time period. The embodiments use control electrodes to generate retarding fields to reflect some of secondary electrons with low kinetic energies back to the sample surface.

Claims (9)

1. A method for eliminating positive charges on a surface of a sample in a scanning electron microscope, comprising:

providing an electrostatic extraction field on said surface during a period of line-scanning;

providing an electrostatic reflection field above said surface during a period of beam-retracing immediately next to said period of line-scanning;

providing a primary electron beam of said scanning electron microscope to said surface during said period of beam-retracing,

wherein, on said surface, a path of said primary electron beam during said period of beam-retracing covers a path of said primary electron beam during said period of line-scanning,

wherein said electrostatic reflection field reflects a desired amount of secondary electrons emitted from said surface back to said surface to neutralize positive charges on said surface to reach a charge balance thereon.

2. A method for eliminating positive charges on a surface of a sample in a scanning electron microscope, comprising:

providing an electrostatic extraction field on said surface and an electrostatic reflection field above said surface simultaneously,

wherein said electrostatic reflection field reflects a desired amount of secondary electrons emitted from said surface back to said surface to neutralize positive charges on said surface to reach a charge balance thereon.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION, INC.
To: HERMES MICROVISION INCORPORATED B.V.
Reel/Frame 054866/0742 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Dec 29, 2020
From: HERMES MICROVISION INCORPORATED B.V.
To: ASML NETHERLANDS B.V.
Reel/Frame 054870/0156 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 13, 2014
From: REN, WEIMING; CHEN, ZHONGWEI
To: HERMES MICROVISION INC.
Reel/Frame 033937/0257 →
Continuity (3)
Division 14081465 · Nov 15, 2013
Provisional Application 61727806 · Nov 19, 2012
Related Publication 20150060665A1 · Mar 5, 2015