IP Library Granted Patent US 9,524,883
Granted Patent B2
US 9,524,883 · App. 14/535,159 · Granted Dec 20, 2016

Holding of interposers and other microelectronic workpieces in position during assembly and other processing

Inventors: Charles G. Woychik (San Jose, CA); Eric S. Tosaya (Fremont, CA); Rajesh Katkar (San Jose, CA)
Assignee: Invensas Corporation
H01L21/4853H01L21/6831H01L21/6838H01L23/13H01L23/49811H01L23/49816H01L23/49827H01L25/00H01L25/065H01L25/0655H01L25/50H01L2224/16225H01L2224/32225H01L2224/73204H01L2924/15174H01L2924/15192H01L2924/15311H01L2924/16152H01L2924/16195
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Quick Facts
Patent No.
US 9,524,883
App. No.
14/535,159
Granted
Dec 20, 2016
Kind
B2
Abstract

A workpiece ( 120 ) has protruding conductive features ( 140 ) at least on a first side. The second side is processed while the workpiece is held from the first side by a holder ( 220 H). To prevent damage to the protruding features and flatten the workpiece (which could be otherwise warped), a spacer ( 210 ) is inserted between the workpiece and the holder. The spacer has holes ( 250 ) receiving the protruding features. The workpiece can be held by forces generated by the holder such as vacuum or an electrostatic force, without an adhesive. Other features and advantages are provided.

Claims (64)

1. A manufacturing method comprising:

obtaining a microelectronic workpiece comprising a first side and a second side opposite to the first side, the workpiece comprising first circuitry comprising a plurality of first conductive features each of which forms a protrusion on the first side;

obtaining a first structure comprising a first plurality of holes;

placing the first structure between the workpiece's first side and a holding stage of a holder so that each of said protrusions enters a respective one of the holes and at least two protrusions enter respective different holes, with the first structure being in a first position relative to the workpiece without being bonded to the first structure;

operating the holder to create an attraction force that holds the workpiece on the first structure in the first position without separately bonding the workpiece to the first structure;

with the workpiece being in the first position, processing the second side of the workpiece;

after processing the second side of the workpiece, operating the holder to diminish the attraction force; and then

separating the workpiece from the first structure.

2. The method of claim 1 wherein the attraction force attracts the workpiece to the holding stage and causes the workpiece to press the first structure against the holding stage.

3. The method of claim 1 wherein diminishing the attraction force comprises eliminating the attraction force.

4. The method of claim 1 wherein the workpiece's first side comprises one or more first surface areas between the protrusions; and

when the workpiece presses the first structure to the holding stage, the workpiece exerts pressure on the first structure at each first surface area.

5. The method of claim 1 wherein:

the first plurality of holes comprises one or more through-holes;

the holder comprises a vacuum mechanism; and

the attraction force is provided by the vacuum mechanism reducing pressure in the one or more through-holes and thus creating a negative pressure difference between the one or more through-holes and the workpiece's second side.

6. The method of claim 1 wherein placing the first structure between the workpiece's first side and the holding stage comprises:

placing the first structure on the holding stage; and then

placing the workpiece on the first structure.

7. The method of claim 6 wherein the holder comprises a holding mechanism holding the first structure on the holding stage at least before placing the workpiece on the first structure.

8. The method of claim 6 wherein before placing the workpiece on the first structure, the first structure is held on the holding stage by vacuum without any additional, separately activated mechanism to hold the first structure on the holding stage.

9. The method of claim 1 wherein separating the workpiece from the first structure is performed while the first structure remains on the holding stage.

10. The method of claim 9 further comprising, after separating the workpiece from the first structure, removing the first structure from the holding stage.

11. A manufacturing method comprising:

obtaining a microelectronic workpiece comprising a first side and a second side opposite to the first side, the workpiece comprising first circuitry comprising a plurality of first conductive features each of which forms a protrusion on the first side;

obtaining a first structure comprising a first plurality of holes;

placing the first structure between the workpiece's first side and a holding stage of a holder so that each of said protrusions enters a respective one of the holes and at least two protrusions enter respective different holes, with the first structure being in a first position relative to the workpiece;

operating the holder to create an attraction force that holds the workpiece on the first structure in the first position;

with the workpiece being in the first position, processing the second side of the workpiece;

after processing the second side of the workpiece, operating the holder to diminish the attraction force; and then

separating the workpiece from the first structure;

wherein:

the first circuitry comprises one or more conductive second features on the workpiece's second side; and

processing the second side of the workpiece comprises:

obtaining one or more second structures comprising second circuitry; and

electrically coupling the second circuitry to the workpiece's second side thereby connecting the second circuitry to the first circuitry.

12. The method of claim 11 wherein processing the second side of the workpiece further comprises attaching the one or more second structures to the workpiece's second side.

13. The method of claim 11 wherein the workpiece comprises an interposer, and the one or more second structures comprise a semiconductor integrated circuit attached to the interposer in the processing of the second side.

14. The method of claim 11 wherein the workpiece comprises an interposer, and the workpiece's first side is a side of the interposer.

15. The method of claim 11 wherein the attraction force provides a required force in order to hold the workpiece in the first position while attaching at least part of the one or more second structures to the workpiece's second side.

16. A manufacturing method comprising:

obtaining a microelectronic workpiece comprising a first side and a second side opposite to the first side, the workpiece comprising first circuitry comprising a plurality of first conductive features each of which forms a protrusion on the first side;

obtaining a first structure comprising a first plurality of holes;

placing the first structure between the workpiece's first side and a holding stage of a holder so that each of said protrusions enters a respective one of the holes and at least two protrusions enter respective different holes, with the first structure being in a first position relative to the workpiece;

operating the holder to create an attraction force that holds the workpiece on the first structure in the first position;

with the workpiece being in the first position, processing the second side of the workpiece;

after processing the second side of the workpiece, operating the holder to diminish the attraction force; and then

separating the workpiece from the first structure;

wherein a plurality of said protrusions enter one of the holes in the first position.

17. A manufacturing method comprising:

obtaining a microelectronic workpiece comprising a first side and a second side opposite to the first side, the workpiece comprising first circuitry comprising a plurality of first conductive features each of which forms a protrusion on the first side;

obtaining a first structure comprising a first plurality of holes;

placing the first structure between the workpiece's first side and a holding stage of a holder so that each of said protrusions enters a respective one of the holes and at least two protrusions enter respective different holes, with the first structure being in a first position relative to the workpiece;

operating the holder to create an attraction force that holds the workpiece on the first structure in the first position;

with the workpiece being in the first position, processing the second side of the workpiece;

after processing the second side of the workpiece, operating the holder to diminish the attraction force; and then

separating the workpiece from the first structure;

wherein:

the first plurality of holes comprises one or more through-holes;

the holder comprises a vacuum mechanism; and

the attraction force is provided by the vacuum mechanism reducing pressure in the one or more through-holes and thus creating a negative pressure difference between the one or more through-holes and the workpiece's second side;

wherein the first plurality of holes further comprises one or more holes that are not through-holes.

18. The method of claim 17 wherein a plurality of said protrusions enter one of the one or more through-holes in the first position.

19. The method of claim 18 wherein there are more protrusions entering the one of the one or more through-holes than there are protrusions entering at least one said hole which is not a through-hole.

Assignments (7)
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS LLC
To: ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
Reel/Frame 073508/0751 →
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS CORPORATION
To: INVENSAS LLC
Reel/Frame 073508/0668 →
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 14, 2015
From: WOYCHIK, CHARLES G.; TOSAYA, ERIC S.; KATKAR, RAJESH
To: INVENSAS CORPORATION
Reel/Frame 035404/0126 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jan 5, 2015
From: WOYCHIK, CHARLES G.; TOSAYA, ERIC S.; KATKAR, RAJESH
To: INVENSAS CORPORATION
Reel/Frame 034635/0906 →
Continuity (2)
Provisional Application 61992653 · May 13, 2014
Related Publication 20150333049A1 · Nov 19, 2015