IP Library Granted Patent US 9,318,298
Granted Patent B2
US 9,318,298 · App. 14/536,946 · Granted Apr 19, 2016

Ion generator and ion generating method

Inventor: Masateru Sato (Ehime, JP)
Assignee: Sumitomo Heavy Industries Ion Technology Co., Ltd.
H01J27/08H01J37/08H01J37/3171H01J2237/31705
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 9,318,298
App. No.
14/536,946
Granted
Apr 19, 2016
Kind
B2
Abstract

An ion generator is provided with: an arc chamber that is at least partially made up of a material containing carbon; a thermal electron emitter that emits thermal electrons into the arc chamber; and a gas introducer that introduces a source gas and a compound gas into the arc chamber. The source gas to be introduced into the arc chamber contains a halide gas, and the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms.

Claims (26)

1. An ion generator comprising:

an arc chamber that is at least partially made up of a material containing carbon;

a thermal electron emitter configured to emit thermal electrons into the arc chamber; and

a gas introducer configured to introduce a source gas and a compound gas into the arc chamber, wherein

the source gas to be introduced into the arc chamber contains a halide gas,

the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms, and

the compound gas is hydrocarbon.

2. The ion generator according to claim 1 , wherein the hydrocarbon is at least one sort of gases selected from the group consisting of CH 4 , C 2 H 6 , C 3 H 8 and C 4 H 10 .

3. The ion generator according to claim 1 , wherein the source gas contains a fluoride gas.

4. The ion generator according to claim 3 , wherein the fluoride gas is at least one sort of gases selected from the group consisting of BF 3 , GeF 4 and PF 3 .

5. The ion generator according to claim 1 , wherein the source gas is at least one sort of gases selected from the group consisting of a chloride gas, an iodide gas and a bromide gas.

6. The ion generator according to claim 1 , wherein an inner wall surface of the arc chamber, excluding a filament and a cathode, is made up of carbon.

7. An ion generating method comprising:

introducing a source gas and a compound gas into an arc chamber that is at least partially made up of a material containing carbon;

emitting thermal electrons into the arc chamber;

generating a plasma by collision between the source gas and the thermal electrons; and

extracting ions from the plasma to the outside, wherein

the source gas to be introduced into the arc chamber contains a halide gas,

the compound gas to be introduced into the arc chamber contains a compound having carbon atoms and hydrogen atoms, and

the compound gas is a hydrocarbon.

8. The ion generating method according to claim 7 , wherein a temperature in the arc chamber is not lower than 600° C. in the generation step.

9. The ion generating method according to claim 7 , wherein the hydrocarbon is at least one sort of gases selected from the group consisting of CH 4 , C 2 H 6 , C 3 H 8 and C 4 H 10 .

10. The ion generating method according to claim 7 , wherein the source gas contains a fluoride gas.

11. The ion generating method according to claim 10 , wherein the fluoride gas is at least one sort of gases selected from the group consisting of BF 3 , GeF 4 and PF 3 .

12. The ion generating method according to claim 7 , wherein the introduction step introduces a noble gas in addition to the source gas and the compound gas.

13. The ion generating method according to claim 7 , further comprising exhausting halogen element contained in the halide gas as a hydrogen halide.

Assignments (2)
CHANGE OF NAME Recorded Jul 15, 2015
From: SEN CORPORATION
To: SUMITOMO HEAVY INDUSTRIES ION TECHNOLOGY CO., LTD.
Reel/Frame 036106/0295 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 10, 2014
From: SATO, MASATERU
To: SEN CORPORATION
Reel/Frame 034136/0987 →
Priority Claims (1)
JP 2013-235312 · Nov 13, 2013 · national
Continuity (1)
Related Publication 20150129775A1 · May 14, 2015