IP Library Granted Patent US 9,219,227
Granted Patent B2
US 9,219,227 · App. 14/549,254 · Granted Dec 22, 2015

Magnetoresistive element and magnetic memory

Inventors: Tadaomi Daibou (Yokohama, JP); Junichi Ito (Yokohama, JP); Tadashi Kai (Tokyo, JP); Minoru Amano (Sagamihara, JP); Hiroaki Yoda (Sagamihara, JP); Terunobu Miyazaki (Sendai, JP); Shigemi Mizukami (Sendai, JP); Koji Ando (Tsukuba, JP); Kay Yakushiji (Tsukuba, JP); Shinji Yuasa (Tsukuba, JP); Hitoshi Kubota (Tsukuba, JP); Akio Fukushima (Tsukuba, JP); Taro Nagahama (Tsukuba, JP); Takahide Kubota (Sendai, JP)
Assignees: KABUSHIKI KAISHA TOSHIBA; WPI-AIMR, Tohoku University
H01L43/10H01L23/528H01L27/222H01L27/226H01L43/02H01L43/08
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Quick Facts
Patent No.
US 9,219,227
App. No.
14/549,254
Granted
Dec 22, 2015
Kind
B2
Abstract

A magnetoresistive element according to an embodiment includes: a base layer; a first magnetic layer formed on the base layer, and including a first magnetic film having an axis of easy magnetization in a direction perpendicular to a film plane, the first magnetic film including Mn x Ga 100-x (45≦x<64 atomic %); a first nonmagnetic layer formed on the first magnetic layer; and a second magnetic layer formed on the first nonmagnetic layer, and including a second magnetic film having an axis of easy magnetization in a direction perpendicular to a film plane, the second magnetic film including Mn y Ga 100-y (45≦y<64 atomic %). The first and second magnetic layers include different Mn composition rates from each other, a magnetization direction of the first magnetic layer is changeable by a current flowing between the first magnetic layer and the second magnetic layer via the first nonmagnetic layer.

Claims (54)

1. A magnetoresistive element comprising:

a first magnetic layer including Mn x Ga 100-x (45≦x<64 atomic %);

a second magnetic layer including Mn y Ga 100-y (45≦y<64 atomic %);

a first nonmagnetic layer provided between the first magnetic layer and the second magnetic layer; and

an interfacial layer provided between the first magnetic layer and the first nonmagnetic layer, and/or between the second magnetic layer and the first nonmagnetic layer, the interfacial layer comprising a Heusler alloy including Mn,

the first and second magnetic layers comprising different Mn composition rates from each other, the first magnetic layer having a smaller Mn concentration than the second magnetic layer, a magnetization direction of the first magnetic layer being changeable and a magnetization direction of the second magnetic layer being unchangeable.

2. The magnetoresistive element according to claim 1 , wherein the interfacial layer includes one of Co 2 MnSi, and Co 2 MnGe.

3. The magnetoresistive element according to claim 1 , wherein the first nonmagnetic layer is an oxide that contains one element selected from the group consisting of Mg, Ca, Al, Sr, and Ti.

4. The magnetoresistive element according to claim 1 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a nitride layer having a (001) oriented NaCl structure, the nitride layer containing at least one element selected from the group consisting of Ti, Zr, Nb, V, Hf, Ta, Mo, W, B, Al, and Ce.

5. The magnetoresistive element according to claim 1 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a (001) oriented perovskite oxide being made of ABO 3 , the A-site containing at least one element selected from the group consisting of Sr, Ce, Dy, La, K, Ca, Na, Pb, and Ba, the B-site containing at least one element selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Ga, Nb, Mo, Ru, Ir, Ta, Ce, and Pb.

6. The magnetoresistive element according to claim 1 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes an oxide layer having a (001) oriented NaCl structure, the oxide layer containing at least one element selected from the group consisting of Mg, Al, and Ce.

7. The magnetoresistive element according to claim 1 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer, comprises one of a tetragonal structure and a cubic structure, is (001) oriented, and contains at least one element selected from the group consisting of Al, Cr, Fe, Co, Rh, Pd, Ag, Ir, Pt, and Au.

8. The magnetoresistive element according to claim 1 , further comprising

a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a first layer and a second layer provided on the first layer,

the first layer includes at least one of:

a nitride layer that has a (001) oriented NaCl structure, and contains at least one element selected from the group consisting of Ti, Zr, Nb, V, Hf, Ta, Mo, W, B, Al, and Ce;

a (001) oriented perovskite oxide layer that is made of ABO 3 , the A-site containing at least one element selected from the group consisting of Sr, Ce, Dy, La, K, Ca, Na, Pb, and Ba, the B-site containing at least one element selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Ga, Nb, Mo, Ru, Ir, Ta, Ce, and Pb; and

an oxide layer that has a (001) oriented NaCl structure, and contains at least one element selected from the group consisting of Mg, Al, and Ce, and

the second layer has one of a tetragonal structure and a cubic structure, is (001) oriented, and contains at least one element selected from the group consisting of Al, Cr, Fe, Co, Rh, Pd, Ag, Ir, Pt, and Au.

9. The magnetoresistive element according to claim 1 , wherein

the second magnetic layer has a fixed magnetization direction,

the magnetoresistive element further comprises: a third magnetic layer provided on the opposite side of the second magnetic layer from the first nonmagnetic layer, each of the second and third magnetic layers having an axis of easy magnetization in a direction perpendicular to a film plane, the third magnetic layer having a magnetization direction antiparallel to the magnetization direction of the second magnetic layer; and a second nonmagnetic layer provided between the second ferromagnetic layer and the third ferromagnetic layer,

wherein M S2 represents a saturation magnetization of the second magnetic layer, t 2 represents a film thickness of the second magnetic layer, M S3 represents a saturation magnetization of the third magnetic layer, and t 3 represents a film thickness of the third magnetic layer, and the following relationship is satisfied

M S2 ×t 2 <M S3 ×t 3 .

10. A magnetic memory comprising:

the magnetoresistive element according to claim 1 ;

a first interconnect that is electrically connected to the first magnetic layer of the magnetoresistive element; and

a second interconnect that is electrically connected to the second magnetic layer of the magnetoresistive element.

11. A magnetoresistive element comprising:

a stacked structure including: a first magnetic layer including Mn x Ga 100-x (45≦x<64 atomic %); a second magnetic layer; a first nonmagnetic layer provided between the first magnetic layer and the second magnetic layer, and containing at least one element selected from the group consisting of Mg, Ca, Ba, Al, Ag, Cu, Be, Sr, Zn, and Ti; and a first interfacial layer provided between the first magnetic layer and the first nonmagnetic layer, the first interfacial layer comprising a Heusler alloy including Mn,

a magnetization direction of the first magnetic layer being changeable.

12. The magnetoresistive element according to claim 11 , wherein the first interfacial layer includes one of Co 2 MnSi, and Co 2 MnGe.

13. The magnetoresistive element according to claim 11 , further comprising:

a second interfacial layer provided between the second magnetic layer and the first nonmagnetic layer, the second interfacial layer including a Heusler alloy.

14. The magnetoresistive element according to claim 11 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a nitride layer having a (001) oriented NaCl structure, the nitride layer containing at least one element selected from the group consisting of Ti, Zr, Nb, V, Hf, Ta, Mo, W, B, Al, and Ce.

15. The magnetoresistive element according to claim 11 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a (001) oriented perovskite oxide being made of ABO 3 , the A-site containing at least one element selected from the group consisting of Sr, Ce, Dy, La, K, Ca, Na, Pb, and Ba, the B-site containing at least one element selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Ga, Nb, Mo, Ru, Ir, Ta, Ce, and Pb.

16. The magnetoresistive element according to claim 11 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes an oxide layer having a (001) oriented NaCl structure, the oxide layer containing at least one element selected from the group consisting of Mg, Al, and Ce.

17. The magnetoresistive element according to claim 11 , further comprising a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer, comprises one of a tetragonal structure and a cubic structure, is (001) oriented, and contains at least one element selected from the group consisting of Al, Cr, Fe, Co, Rh, Pd, Ag, Ir, Pt, and Au.

18. The magnetoresistive element according to claim 11 , further comprising

a layer which is provided on the first magnetic layer on a side opposite from a side of the first nonmagnetic layer and includes a first layer and a second layer provided on the first layer,

the first layer includes at least one of:

a nitride layer that has a (001) oriented NaCl structure, and contains at least one element selected from the group consisting of Ti, Zr, Nb, V, Hf, Ta, Mo, W, B, Al, and Ce;

a (001) oriented perovskite oxide layer that is made of ABO 3 , the A-site containing at least one element selected from the group consisting of Sr, Ce, Dy, La, K, Ca, Na, Pb, and Ba, the B-site containing at least one element selected from the group consisting of Ti, V, Cr, Mn, Fe, Co, Ni, Ga, Nb, Mo, Ru, Ir, Ta, Ce, and Pb; and

an oxide layer that has a (001) oriented NaCl structure, and contains at least one element selected from the group consisting of Mg, Al, and Ce, and

the second layer has one of a tetragonal structure and a cubic structure, is (001) oriented, and contains at least one element selected from the group consisting of Al, Cr, Fe, Co, Rh, Pd, Ag, Ir, Pt, and Au.

19. The magnetoresistive element according to claim 11 , wherein

the second magnetic layer has a fixed magnetization direction,

the magnetoresistive element further comprises: a third magnetic layer provided on the opposite side of the second magnetic layer from the first nonmagnetic layer, each of the second and third magnetic layers having an axis of easy magnetization in a direction perpendicular to a film plane, the third magnetic layer having a magnetization direction antiparallel to the magnetization direction of the second magnetic layer; and a second nonmagnetic layer provided between the second ferromagnetic layer and the third ferromagnetic layer,

wherein M S2 represents a saturation magnetization of the second magnetic layer, t 2 represents a film thickness of the second magnetic layer, M S3 represents a saturation magnetization of the third magnetic layer, and t 3 represents a film thickness of the third magnetic layer, and the following relationship is satisfied

M S2 ×t 2 <M S3 ×t 3 .

20. A magnetic memory comprising:

the magnetoresistive element according to claim 11 ;

a first interconnect that is electrically connected to the first magnetic layer of the magnetoresistive element; and

a second interconnect that is electrically connected to the second magnetic layer of the magnetoresistive element.

Assignments (3)
MERGER AND CHANGE OF NAME Recorded Feb 10, 2022
From: TOSHIBA MEMORY CORPORATION; K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 059003/0256 →
CHANGE OF NAME Recorded Feb 10, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 059003/0389 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 29, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043438/0591 →
Priority Claims (1)
JP 2011-068868 · Mar 25, 2011 · national
Continuity (3)
Division 14183122 · Feb 18, 2014
Division 13310154 · Dec 2, 2011
Related Publication 20150076635A1 · Mar 19, 2015