Stable amorphous metal oxide semiconductor
A thin film semiconductor device has a semiconductor layer including a mixture of an amorphous semiconductor ionic metal oxide and an amorphous insulating covalent metal oxide. A pair of terminals is positioned in communication with the semiconductor layer and define a conductive channel, and a gate terminal is positioned in communication with the conductive channel and further positioned to control conduction of the channel. The invention further includes a method of depositing the mixture including using nitrogen during the deposition process to control the carrier concentration in the resulting semiconductor layer.
1. A thin film semiconductor device comprising:
a semiconductor layer;
source/drain electrodes positioned in communication with the semiconductor layer and defining a conductive channel in the semiconductor layer;
a gate electrode in communication with the conductive channel and positioned to control conduction of the channel;
the semiconductor layer including an amorphous insulating covalent metal oxide material and an amorphous semiconductor ionic metal oxide material;
the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being mixed in a predetermined ratio that forms a continuous network of the amorphous semiconductor ionic metal oxide material and prevents the amorphous semiconductor ionic metal oxide material from becoming poly crystalline at processing temperatures;
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being deposited in an orientation supported by a substrate in one of a top gate bottom source/drain electrodes; top gate top source/drain electrodes; bottom gate bottom source drain electrodes; and bottom gate top source drain configuration electrodes; and
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material having a carrier concentration determined by one of oxygen and nitrogen being included during the deposition.
2. The thin film semiconductor device as claimed in claim 1 wherein the device is the top gate, bottom source/drain electrodes orientation comprising:
the substrate;
the source/drain electrodes positioned on the upper surface of the substrate in a spaced apart orientation;
the semiconductor layer positioned in partial overlying relationship to both the source/drain electrodes and the space there-between;
a gate dielectric layer positioned over the semiconductor layer; and
the gate electrode positioned on the gate dielectric layer in overlying relationship to the space between the source/drain electrodes.
3. The thin film semiconductor device as claimed in claim 1 wherein the device is the top gate, top source/drain electrodes orientation comprising:
the substrate;
the semiconductor layer positioned on the substrate;
the source/drain electrodes positioned in overlying relationship on the upper surface of the semiconductor layer and spaced apart;
a gate dielectric layer in overlying relationship to portions of the source/drain electrodes and to the semiconductor layer in between; and
the gate electrode positioned on the gate dielectric layer in overlying relationship to the space between the source/drain electrodes.
4. The thin film semiconductor device as claimed in claim 1 wherein the device is the bottom gate, bottom source/drain electrodes orientation comprising:
the substrate;
the gate electrode positioned on the substrate;
a gate dielectric layer positioned in overlying relationship to the gate electrode and the surrounding areas of the substrate;
the source/drain electrodes positioned on the upper surface of the gate dielectric layer with a space in between and overlying the gate electrode;
the semiconductor layer positioned over and in partial overlying relationship to both the source/drain electrodes and the space there-between; and
a passivation layer positioned over the semiconductor layer.
5. The thin film semiconductor device as claimed in claim 1 wherein the device is the bottom gate, top source/drain electrodes orientation comprising:
the substrate;
the gate electrode positioned on the substrate;
a gate dielectric layer in overlying relationship to the gate electrode and surrounding areas of the substrate;
the semiconductor layer positioned on top of the gate dielectric layer and in overlaying relationship with the gate electrode;
the source/drain electrodes positioned in a spaced apart relationship on the upper surface of the semiconductor layer, and the space being in overlying relationship with the gate electrode; and
passivation material positioned at least partially over the source/drain electrodes and over the semiconductor layer there-between.
6. The thin film semiconductor device as claimed in claim 1 wherein the substrate is a glass or plastic sheet.
7. The thin film semiconductor device as claimed in claim 1 wherein the substrate is one of rigid or flexible.
8. The thin film semiconductor device as claimed in claim 1 wherein the amorphous semiconductor ionic metal oxide material has a grain size equal to or smaller than 100 nm.
9. The thin film semiconductor device as claimed in claim 1 wherein the device is incorporated into thin film circuit applications including display and sensor active matrices.
10. The thin film semiconductor device as claimed in claim 1 wherein the device is incorporated into an active matrix organic light emitting display.
11. The thin film semiconductor device as claimed in claim 1 wherein the amorphous semiconductor ionic metal oxide in the mixture is in an amount much greater than the amorphous insulating covalent metal oxide.
12. The thin film semiconductor device as claimed in claim 11 wherein the amount of amorphous semiconductor ionic metal oxide in the mixture is greater than approximately 17% of the mixture.
13. The thin film semiconductor device as claimed in claim 1 wherein the amount of amorphous insulating covalent metal oxide is sufficient to prevent the amorphous semiconductor ionic metal oxide from becoming poly crystalline at processing temperatures in a range of approximately 250° C. to approximately 700° C.
14. The thin film semiconductor device as claimed in claim 1 wherein the amorphous insulating covalent metal oxide in the mixture is greater than approximately 5% of the mixture.
15. The thin film semiconductor device as claimed in claim 1 wherein the amorphous semiconductor ionic metal oxide includes one of zinc oxide, indium oxide, tin oxide, gallium oxide, cadmium oxide, or combinations thereof.
16. The thin film semiconductor device as claimed in claim 1 wherein the amorphous insulating covalent metal oxide includes one of aluminum oxide, silicon oxide, magnesium oxide, beryllium oxide, boron oxide, or combinations thereof.
17. The thin film semiconductor device as claimed in claim 1 wherein the mixture is represented by the formula XO a YO b , where YO is an amorphous insulating covalent metal oxide and XO is an amorphous semiconductor ionic metal oxide and where ‘a’ is the amount of amorphous semiconductor ionic metal oxide in the composite mixture and ‘b’ is the amount of amorphous insulating covalent metal oxide in the composite mixture and where ‘a’ and ‘b’ are >0.
18. The thin film semiconductor device as claimed in claim 1 wherein the mixture comprises metal oxide bonds in the form of X—O—Y, wherein the oxygen atom is bonded with a metal atom Y which is originated from the amorphous insulating covalent metal oxide YO as well as bonded with a metal atom X which is originated from the semiconductor ionic metal oxide XO.
19. The thin film semiconductor device as claimed in claim 1 wherein the amorphous semiconductor ionic metal oxide is characterized by an energy gap less than approximately 4 ev and the amorphous insulating covalent metal oxide is characterized by an energy gap greater than approximately 6 ev.
20. A thin film semiconductor device comprising:
a semiconductor layer;
a pair of electrodes positioned in communication with the semiconductor layer and defining a conductive channel in the semiconductor layer;
a gate electrode in communication with the conductive channel and positioned to control conduction of the channel;
the semiconductor layer including an amorphous insulating covalent metal oxide material and an amorphous semiconductor ionic metal oxide material, the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being mixed in a predetermined ratio that forms a continuous network of the amorphous semiconductor ionic metal oxide material and prevents the amorphous semiconductor ionic metal oxide material from becoming poly crystalline at processing temperatures;
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being deposited on a supporting structure; and
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material having a carrier concentration determined by one of oxygen and nitrogen being included during the deposition.
21. The thin film semiconductor device as claimed in claim 20 wherein the mixture is deposited in an orientation supported by a substrate in one of a top gate bottom pair of electrodes; top gate top pair of electrodes; bottom gate bottom pair of electrodes; and bottom gate top pair of electrodes configuration.
22. The thin film semiconductor device as claimed in claim 20 wherein the amorphous semiconductor ionic metal oxide is characterized by an energy gap less than approximately 4 ev and the amorphous insulating covalent metal oxide is characterized by an energy gap greater than approximately 6 ev.
23. A thin film semiconductor device comprising:
a semiconductor layer;
a pair of electrodes positioned in communication with the semiconductor layer and defining a conductive channel in the semiconductor layer;
a gate electrode in communication with the conductive channel and positioned to control conduction of the channel;
the semiconductor layer including an amorphous insulating covalent metal oxide material including one of aluminum oxide, silicon oxide, magnesium oxide, beryllium oxide, boron oxide, or combinations thereof and an amorphous semiconductor ionic metal oxide material including one of zinc oxide, indium oxide, tin oxide, gallium oxide, cadmium oxide, or combinations thereof, the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being mixed in a predetermined ratio that forms a continuous network of the amorphous semiconductor ionic metal oxide material and prevents the amorphous semiconductor ionic metal oxide material from becoming poly crystalline at processing temperatures;
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material being deposited on a supporting structure; and
the mixture of the amorphous insulating covalent metal oxide material and the amorphous semiconductor ionic metal oxide material having a carrier concentration determined by one of oxygen and nitrogen being included during the deposition.
24. The thin film semiconductor device as claimed in claim 23 wherein the mixture is deposited in an orientation supported by a substrate in one of a top gate bottom pair of electrodes; top gate top pair of electrodes; bottom gate bottom pair of electrodes; and bottom gate top pair of electrodes configuration.
25. The thin film semiconductor device as claimed in claim 23 wherein the amorphous semiconductor ionic metal oxide is characterized by an energy gap less than approximately 4 ev and the amorphous insulating covalent metal oxide is characterized by an energy gap greater than approximately 6 ev.