IP Library Granted Patent US 9,236,217
Granted Patent B2
US 9,236,217 · App. 14/562,260 · Granted Jan 12, 2016

Inspection or observation apparatus and sample inspection or observation method

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Quick Facts
Patent No.
US 9,236,217
App. No.
14/562,260
Granted
Jan 12, 2016
Kind
B2
Abstract

A sample observation method uses a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample. The method includes maintaining a pressure of the sample chamber higher than that of the vacuum chamber by a thin film which permits the charged particle beam to be transmitted, determining a relation between a height of a lower surface of the thin film and a height of a lower end of a lens barrel of an optical microscope, measuring a distance between the sample and the lens barrel, and setting a distance between the sample and thin film based on the relation and the distance.

Claims (9)

1. A sample observation method by using a charged particle beam apparatus comprising a charged particle optical column irradiating a charged particle beam, a vacuum chamber, and a sample chamber being capable of storing a sample, the method comprising:

maintaining a pressure of the sample chamber higher than that of the vacuum chamber by a thin film which permits the charged particle beam to be transmitted;

determining a relation between a height of a lower surface of the thin film and a height of a lower end of a lens barrel of an optical microscope;

measuring a distance between the sample and the lens barrel; and

setting a distance between the sample and thin film based on the relation and the distance.

2. The sample observation method according to claim 1 , further comprising moving a sample mount section mounting the sample between a first position where the charged particle beam is irradiated to the sample and a second position where the sample is observed by the optical microscope.

3. The sample observation method according to claim 1 ,

wherein the charged particle beam apparatus comprises a sample mount section mounting the sample, and

wherein the sample mounted on the sample mount section is observed by both of the charged particle beam apparatus and the optical microscope.

Assignments (1)
CHANGE OF NAME AND ADDRESS Recorded Mar 30, 2020
From: HITACHI HIGH-TECHNOLOGIES CORPORATION
To: HITACHI HIGH-TECH CORPORATION
Reel/Frame 052259/0227 →