Antenna cover and plasma generating device using same
View Patent ↗An antenna cover that protects a surface of an antenna provided in a plasma chamber and exciting an electric field with a high frequency to an inner portion of the plasma chamber is provided. In the antenna cover, the thickness of the antenna cover in at least one direction among directions orthogonal to the surface of the antenna is different according to a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover decreases. In the antenna cover, the thickness of at least one direction may be changed along an extension direction of the antenna.
1. An antenna cover for covering a surface of an antenna provided in a plasma chamber and exciting an electric field with a high frequency to an inner portion of the plasma chamber,
wherein the thickness of the antenna cover in at least one direction orthogonal to the surface of the antenna is dependent on a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover decreases, the thickness of the antenna cover being a dimension between an internal surface of the antenna cover facing to the surface of the antenna and the external surface of the antenna cover.
2. The antenna cover according to claim 1 ,
wherein the thickness in the at least one direction is changed along an extension direction of the antenna.
3. The antenna cover according to claim 1 ,
wherein the antenna includes a first terminal and a second terminal provided in both ends of the antenna and connected to a high frequency power supply through a matcher; and
the thickness in the at least one direction at the first terminal side is larger than the thickness in the at least one direction at the second terminal side.
4. The antenna cover according to claim 3 ,
wherein the matcher includes a first capacitor connected to the first terminal and a second capacitor connected to the second terminal; and
the first capacitor has a first capacitance smaller than a second capacitance of the second capacitor.
5. The antenna cover according to claim 3 ,
wherein the antenna has a U shape that is configured by a first straight line portion having the first terminal, a second straight line portion having the second terminal, and a curved line portion connecting the first straight line portion and the second straight line portion;
the antenna cover includes a first straight line protecting portion configured to protect a surface of the first straight line portion, a second straight line protecting portion configured to protect a surface of the second straight line portion, and a curved line protecting portion configured to protect a surface of the curved line portion; and
the thickness in the at least one direction in the first straight line protecting portion is larger than the thickness in the at least one direction in the second straight line protecting portion.
6. The antenna cover according to claim 5 ,
wherein the thickness in the at least one direction in the curved line protecting portion is smaller than the thickness in the at least one direction in the first straight line protecting portion.
7. The antenna cover according to claim 5 ,
wherein the thickness in the at least one direction in the curved line protecting portion is larger than the thickness in the at least one direction in the second straight line protecting portion.
8. The antenna cover according to claim 5 ,
wherein at least an upper half or a lower half of the surface of the antenna is covered when a direction crossing a plane formed by the U shape of the antenna is set to a vertical direction.
9. The antenna cover according to claim 8 , further comprising:
a dividing portion that partitions the inner portion of the plasma chamber into two parts in the vertical direction.
10. The antenna cover according to claim 1 ,
wherein the antenna cover is made of quartz (SiO 2 ).
11. A plasma generating device comprising:
a plasma chamber;
a magnet that applies a magnetic field to an inner portion of the plasma chamber;
an antenna that is provided in the plasma chamber and excites an electric field with a high frequency to the inner portion of the plasma chamber; and
an antenna cover that covers a surface of the antenna,
wherein the thickness of the antenna cover in at least one direction orthogonal to the surface of the antenna is dependent on a position on the surface, such that space dependency of an electric potential on an external surface of the antenna cover decreases, the thickness of the antenna cover being a dimension between an internal surface of the antenna cover facing to the surface of the antenna and the external surface of the antenna cover.
12. The antenna cover according to claim 1 ,
wherein an end of the antenna is connected to a high frequency power supply.