IP Library Granted Patent US 9,159,896
Granted Patent B2
US 9,159,896 · App. 14/607,839 · Granted Oct 13, 2015

Vertical solid-state transducers and high voltage solid-state transducers having buried contacts and associated systems and methods

Inventors: Vladimir Odnoblyudov (Eagle, ID); Martin F. Schubert (Boise, ID)
Assignee: Micron Technology, Inc.
H01L33/62H01L33/0025H01L33/06H01L33/32H01L33/405H01L33/64H01L2933/0016H01L2933/0033H01L2933/0066
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Quick Facts
Patent No.
US 9,159,896
App. No.
14/607,839
Granted
Oct 13, 2015
Kind
B2
Abstract

Solid-state transducers (“SSTs”) and vertical high voltage SSTs having buried contacts are disclosed herein. An SST die in accordance with a particular embodiment can include a transducer structure having a first semiconductor material at a first side of the transducer structure, and a second semiconductor material at a second side of the transducer structure. The SST can further include a plurality of first contacts at the first side and electrically coupled to the first semiconductor material, and a plurality of second contacts extending from the first side to the second semiconductor material and electrically coupled to the second semiconductor material. An interconnect can be formed between at least one first contact and one second contact. The interconnects can be covered with a plurality of package materials.

Claims (24)

1. A solid state transducer (SST) wafer, comprising:

a transducer structure having a first semiconductor material at a first side, a second semiconductor material at a second side opposite the first side, and a light-emitting active region between the first semiconductor material and the second semiconductor material; and

a plurality of features that separate the transducer structure into a plurality of individually addressable light-emitting diode (LED) dies, wherein each LED die includes—

a first electrical terminal coupled to the first semiconductor material at the first side;

a second electrical terminal coupled to the second semiconductor material at the first side;

a plurality of junctions coupled in series between the first electrical terminal and the second electrical terminal;

a plurality of internal first contacts;

a plurality of internal second contacts;

a plurality of interconnections between one or more internal first and second contacts; and

a thermal pad disposed on the first side.

2. The SST wafer of claim 1 , further comprising a third contact coupled to the interconnection, the third contact configured to cross-connect to another contact on a second die.

3. The SST wafer of claim 1 , further comprising a conductive material over the internal first contacts, the internal second contacts and the interconnections.

4. The SST wafer of claim 3 , further comprising a barrier material between the conductive material and the internal first contacts, the internal second contacts and the interconnections.

5. A solid state transducer (SST) die, comprising:

a first terminal on a first side of the SST die;

a second terminal on the first side of the SST die;

a plurality of SST junctions coupled in series between the first and second terminals;

a plurality of buried first contacts, wherein each individual SST junction includes at least one buried first contact;

a plurality of buried second contacts, wherein each individual SST junction includes at least one buried second contact;

a plurality of buried interconnects between each individual junction, wherein each buried interconnect couples at least one buried second contact to at least one buried first contact on an adjacent junction; and

a thermal pad on the first side of the SST die.

6. The SST die of claim 5 wherein the buried first and second contacts and the buried interconnects are buried under a barrier material and a conductive metal.

7. The SST die of claim 6 wherein the conductive metal is copper.

8. The SST die of claim 5 wherein the first terminal and the second terminal are electrically isolated by a plurality of dielectric paths.

Assignments (8)
RELEASE OF SECURITY INTEREST Recorded Nov 12, 2019
From: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
Reel/Frame 051028/0001 →
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
SECURITY INTEREST Recorded Jul 13, 2018
From: MICRON TECHNOLOGY, INC.; MICRON SEMICONDUCTOR PRODUCTS, INC.
To: JPMORGAN CHASE BANK, N.A., AS COLLATERAL AGENT
Reel/Frame 047540/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 20, 2017
From: ODNOBLYUDOV, VLADIMIR; SCHUBERT, MARTIN F.
To: MICRON TECHNOLOGY, INC.
Reel/Frame 042082/0443 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
Continuity (2)
Division 13708526 · Dec 7, 2012
Related Publication 20150162513A1 · Jun 11, 2015