Stage device and charged particle beam apparatus using the stage device
View Patent ↗To attain the above object, in the present invention, proposed are a stage apparatus including a sample stage that mounts a sample, a first position detection device that detects a position of the sample stage, a second position detection device that detects a position of the sample stage when the sample stage is positioned in a part of a stage movement range that the first position detection device is capable of detecting, and a control device that adjusts an offset amount of the first position detection device on the basis of a position detection result obtained by the second position detection device, and a charged particle beam apparatus using the stage apparatus.
1. A stage apparatus comprising:
a sample stage that mounts a sample;
a first position detection device that detects a position of the sample stage;
a second position detection device that detects a position of the sample stage when the sample stage is positioned in a part of a stage movement range that the first position detection device is capable of detecting; and
a control device that adjusts an Abbe error offset amount of the first position detection device on a basis of a position detection result obtained by the second position detection device.
2. The stage apparatus according to claim 1 , wherein
the second position detection device is an absolute position detection device that measures an absolute amount of a distance between the sample stage and a base on which the sample stage is arranged.
3. The stage apparatus according to claim 2 , wherein
the absolute position detection device is arranged on the sample stage.
4. The stage apparatus according to claim 2 , wherein
the first position detection device includes a reflecting mirror that is installed on the sample stage and a laser interferometer that detects a position of the sample stage by irradiating laser light on the reflecting mirror.
5. A charged particle beam apparatus comprising the stage apparatus according to claim 1 .
6. A stage apparatus comprising:
a base;
a sample stage that is capable of being moved to the base;
a reflecting mirror that is provided on the sample stage;
a laser interferometer that measures a position of the sample stage by irradiating laser light on the reflecting mirror;
a control device that controls a position of the sample stage;
an absolute position detection device that measures an absolute amount of a distance between the base and the sample stage; and
a third position detection device that is different from the laser interferometer and the absolute position detection device and that measures a position along the same axis as the laser interferometer and the absolute position detection device, wherein
the control device positions the sample stage in a position that the laser interferometer and the absolute position detection device are capable of detecting and changes an Abbe error offset amount of the laser interferometer by position information measured by the absolute position detection device.
7. The stage apparatus according to claim 6 , wherein
the sample stage is configured so as to be moved up to a position in which the laser light is not irradiated on the reflecting mirror, and
when the sample stage is positioned in a position in which the laser light is not irradiated on the reflecting mirror, the control device controls a position of the sample stage by the third position detection device.
8. The stage apparatus according to claim 7 , wherein
the third position detection device is configured so as to detect a position in an entire movable range of the sample stage.
9. The stage apparatus according to claim 6 , wherein
the absolute position detection device is arranged so that a measuring direction thereof is generally matched with an optical axis of the laser light.
10. The stage apparatus according to claim 9 , wherein
the absolute position detection device is arranged on a plane different from that of the reflecting mirror on the sample stage.
11. The stage apparatus according to claim 6 , wherein
when the sample stage is moved, the control device determines whether to perform a change in the offset amount.
12. The stage apparatus according to claim 11 , wherein
when coordinates of the sample stage before movement are out of a measurement range of the laser interferometer, and target coordinates after the movement are within the measurement range of the laser interferometer and irradiation of charged particle beams is performed after the movement, the control device performs a change in the offset amount.
13. The stage apparatus according to claim 11 , wherein
when an elapsed time is stored after a change in the offset amount is performed, the sample stage is within the measurement range of the laser interferometer, and the elapsed time is more than a threshold, the control device performs a change in the offset amount.
14. The stage apparatus according to claim 11 , wherein
the control device includes a thermometer that measures a temperature of the sample stage, and
when the sample stage is within the measurement range of the laser interferometer and a temperature of the sample stage is more than the threshold, the control device performs a change in the offset amount.
15. The stage apparatus according to claim 6 , wherein
in the absolute position detection device, an absolute-value output-type linear scale is used.
16. The stage apparatus according to claim 6 , wherein
in the absolute position detection device, an electrostatic capacity displacement meter is used.
17. The stage apparatus according to claim 6 , wherein
in the absolute position detection device, image information obtained by an optical microscope is used.
18. The stage apparatus according to claim 6 , wherein
in the absolute position detection device, image information obtained by charged particle beams is used.
19. A charged particle beam apparatus comprising the stage apparatus according to claim 6 .
20. A stage apparatus comprising:
a base;
a sample stage that is capable of being moved to the base;
a reflecting mirror that is provided on the sample stage;
a laser interferometer that measures a position of the sample stage by irradiating laser light on the reflecting mirror;
a control device that controls a position of the sample stage;
a second position detection means that is different from the laser interferometer that specifies a position of the sample stage; and
an absolute position restriction means that restricts an absolute amount of a distance between the base and the sample stage, wherein
the control device controls the sample stage so that the sample stage is restricted by a position of the laser interferometer and the absolute position restriction means and changes an Abbe error offset amount of the laser interferometer by position information of the second position detection means in a state in which the sample stage is restricted by the absolute position restriction means wherein the sample stage is configured so as to be moved out of the stage movement range that the first position detection device is capable of detecting, and the control device adjusts the offset amount after the sample stage is moved out of the stage movement range that the first position detection device is capable of detecting.
21. The stage apparatus according to claim 20 , wherein
the sample stage includes a pressing member, the base includes a pressed member, and the absolute position restriction device performs restriction by pressing the pressing member against the pressed member.
22. A charged particle beam apparatus comprising the stage apparatus according to claim 20 .