Method for forming pattern and method for manufacturing semiconductor device
In one embodiment, a method for forming pattern includes forming a guide layer on a substrate, forming a copolymer layer of a high-molecular block copolymer on the guide layer; and forming a phase-separation structure with a phase-separation cycle d by self-assembling the copolymer layer. The high-molecular block copolymer includes a first and a second polymer. The guide layer includes a first and a second region disposed on the substrate. Widths of the first and second region respectively are approximately (d/2)×n and (d/2)×m. Both of the first and second region are to be pinned with none of the first and second polymer. Surface energies of the first and second region are different from one another. Integers n and m are odd numbers. Value d is a phase-separation cycle of the high-molecular block copolymer.
1. A method for forming a pattern using a high-molecular block copolymer including a first polymer and a second polymer, the method comprising:
forming a guide layer on a substrate, the guide layer including a first region and a second region disposed on the substrate, widths of the first and second regions respectively being approximately (d/2)×n and (d/2)×m, both of the first and second regions to be pinned with none of the first and second polymer, and surface energies of the first and second regions being different from one another, where n, m: odd number, and d: a phase-separation cycle of the high-molecular block copolymer;
forming a copolymer layer of the high-molecular block copolymer on the guide layer; and
forming a phase-separation structure with the phase-separation cycle d by self-assembling the copolymer layer.
2. The method for forming a pattern of claim 1 ,
wherein integers n and m are three or more.
3. The method for forming a pattern of claim 1 ,
wherein the phase-separation structure is a lamellar phase-separation structure.
4. The method for forming a pattern of claim 1 ,
wherein the first and second polymers respectively have surface energies Ea, Eb different from one another,
the surface energy of the first region is approximately (Ea×(n−1)/(2n)+Eb×(n+1)/(2n)), and
the surface energy of the second region is approximately (Ea×(m+1)/(2m)+Eb×(m−1)/(2m)).
5. The method for forming a pattern of claim 1 ,
wherein the first and second polymers respectively have surface energies Ea, Eb different from one another,
the surface energy of the first region is approximately (Ea×(n+1)/(2n)+Eb×(n−1)/(2n)), and
the surface energy of the second region is approximately (Ea×(m−1)(2m)+Eb×(m+1)/(2m)).
6. The method for forming a pattern of claim 1 ,
wherein the guide layer is a random polymer of the first and second polymers.
7. The method for forming a pattern of claim 6 ,
wherein composition ratios of the first and second polymers at the first and second regions are different from one another.
8. The method for forming a pattern of claim 7 ,
wherein the composition ratio of the first and second polymers at the first region is approximately (n−1):(n+1), and
the composition ratio of the first and second polymers at the second region is approximately (m+1):(m−1).
9. The method for forming a pattern of claim 7 ,
wherein the composition ratio of the first and second polymers at the first region is approximately (n+1):(n−1), and
the composition ratio of the first and second polymers at the second region is approximately (m−1):(m+1).
10. The method for forming a pattern of claim 1 ,
wherein the guide layer includes a plurality of the first regions and a plurality of the second regions alternately disposed on the substrate.
11. A method for manufacturing a semiconductor device using a high-molecular block copolymer including a first polymer and a second polymer, the method comprising:
forming a guide layer on a substrate, the guide layer including a first region and a second region disposed on the substrate, widths of the first and second regions respectively being approximately (d/2)×n and (d/2)×m, both of the first and second regions to be pinned with none of the first and second polymers, and surface energies of the first and second regions being different from one another, where n, m: odd number, and d: a phase-separation cycle of the high-molecular block copolymer;
forming a copolymer layer of the high-molecular block copolymer on the guide layer;
forming a phase-separation structure with the phase-separation cycle d by self-assembling the copolymer layer;
etching one of the first and second polymers of the self-assembled copolymer layer; and
etching the substrate using the etched copolymer layer as a mask.
12. The method for manufacturing the semiconductor device of claim 11 ,
wherein integers n and m are three or more.
13. The method for manufacturing the semiconductor device of claim 11 ,
wherein the phase-separation structure is a lamellar phase-separation structure.
14. The method for manufacturing the semiconductor device of claim 11 ,
wherein the first and second polymers respectively have surface energies Ea, Eb different from one another,
the surface energy of the first region is approximately (Ea×(n−1)/(2n)+Eb×(n+1)/(2n)), and
the surface energy of the second region is approximately (Ea×(m+1)/(2m)+Eb×(m−1)/(2m)).
15. The method for manufacturing the semiconductor device of claim 11 ,
wherein the first and second polymers respectively have surface energies Ea, Eb different from one another,
the surface energy of the first region is approximately (Ea×(n+1)/(2n)+Eb×(n−1)/(2n)), and
the surface energy of the second region is approximately (Ea×(m−1)/(2m)+Eb×(m+1)/(2m)).
16. The method for manufacturing the semiconductor device of claim 11 ,
wherein the guide layer is a random polymer of the first and second polymers.
17. The method for manufacturing the semiconductor device of claim 16 ,
wherein composition ratios of the first and second polymers at the first and second regions are different from one another.
18. The method for manufacturing the semiconductor device of claim 17 ,
wherein the composition ratio of the first and second polymers at the first region is approximately (n−1):(n+1), and
the composition ratio of the first and second polymers at the second region is approximately (m+1):(m−1).
19. The method for manufacturing the semiconductor device of claim 17 ,
wherein the composition ratio of the first and second polymers at the first region is approximately (n+1):(n−1), and
the composition ratio of the first and second polymers at the second region of the guide layer is approximately (m−1):(m+1).
20. The method for manufacturing the semiconductor device of claim 11 ,
wherein the guide layer includes a plurality of the first regions and a plurality of the second regions alternately disposed on the substrate.