Phase separation observation method, phase separation observation apparatus, annealing apparatus, and producing method for substrate

1. A phase separation observation method comprising:

determining a progress degree of phase separation of a self-assembly material layer based on a birefringence amount of an observation object including a substrate, and the self-assembly material layer formed on the substrate; and

calculating the birefringence amount of the self-assembly material layer based on a birefringence amount of the observation object and a birefringence amount of the substrate, wherein

the determination of the progress degree of phase separation of the self-assembly material layer is performed based on the birefringence amount of the self-assembly material layer.

2. The method according to claim 1 , wherein the self-assembly material layer contains a block copolymer having a birefringence property.

3. The method according to claim 2 , wherein the measurement of the birefringence amount is performed using an optical heterodyne interferometry.

4. The method according to claim 1 , wherein the determination of the progress degree of phase separation of the self-assembly material layer is performed during or after a phase separation process of the observation object.

5. The method according to claim 1 , further comprising determining a size of a guide pattern formed on the substrate, based on a pitch of a phase separation pattern of a self-assembly material that forms the self-assembly material layer, and the birefringence amount of the observation object.

6. The method according to claim 1 , wherein the birefringence amount is a main axis azimuth, a retardation, or a birefringence index.