Patent Assignment
Reel/Frame 043027/0072
Assignment of Assignor's Interest
Recorded: 2017-06-28
Pages: 5
Assignor
KABUSHIKI KAISHA TOSHIBA
Executed: 2017-06-20
Assignee
TOSHIBA MEMORY CORPORATION
1-1, SHIBAURA 1-CHOME, MINATO-KU, TOKYO, 105-8001, JAPAN
Covered Properties
(57)
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method for Manufacturing the Same
Supercritical Drying Method for Semiconductor Substrate
Semiconductor Device and Method for Manufacturing the Same
Semiconductor Device and Method for Manufacturing the Same
Guide Pattern Data Correcting Method, Pattern Forming Method, and Computer Readable Record Medium
Spin Coating Apparatus and Method
Supercritical Drying Method for Semiconductor Substrate
Application:
14/193,044 →
Publication:
US 2014/0174482
Semiconductor Manufacturing Equipment and Manufacturing Method of Semiconductor Device
Application:
14/465,247 →
Publication:
US 2015/0255317
Semiconductor Manufacturing Apparatus and Method of Manufacturing Semiconductor Device
Particle Supply Device and Particle Supply Method
Method of Manufacturing Semiconductor Device
Manufacturing Method of Semiconductor Device and Semiconductor Manufacturing Apparatus
Process Flow Checking System, Recording Medium, and Process Flow Checking Method
Phase Separation Observation Method, Phase Separation Observation Apparatus, Annealing Apparatus, and Producing Method for Substrate
Patterning Method, and Template for Nanoimprint and Producing Method Thereof
Semiconductor Manufacturing Apparatus and Semiconductor Manufacturing Method
Substrate Storage Container and Substrate Storage Container Mounting Table
Storage Medium Storing Simulation Program, Simulation Device, and Simulation Method
Application:
14/657,644 →
Publication:
US 2016/0063138
Surface Treatment Apparatus and Method for Semiconductor Substrate
Manufacturing Method of Semiconductor Device and Semiconductor Manufacturing Apparatus
Abrasive cloth and polishing method
Substrate Cleaning Apparatus and Substrate Cleaning Method
Application:
14/847,839 →
Publication:
US 2016/0276181
Pattern Inspection Apparatus and Pattern Inspection Method
Apparatus and Method of Treating Surface of Semiconductor Substrate
Substrate Treatment Method and Substrate Treatment Apparatus
Manufacturing Method of Semiconductor Device
Spin Coating Apparatus and Method
Substrate Treatment Apparatus and Substrate Treatment Method
Semiconductor Device and Method for Manufacturing the Same
Particle Detecting Apparatus
Semiconductor Manufacturing Method
Chemical Liquid Tank
Analysis Pretreatment Device
Manufacturing Method of Semiconductor Device and Semiconductor Device Manufacturing Apparatus
Template Producing Method, Template Producing Apparatus and Template Inspecting Apparatus
Application:
15/066,461 →
Publication:
US 2017/0072622
Particle Measuring Apparatus and Particle Measuring Method
Imprinting Template Substrate, Method for Manufacturing the Same, Imprinting Template Substrate Manufacturing Apparatus, and Method for Manufacturing Semiconductor Apparatus
Method for Processing Substrate Including Forming a Film on a Silicon-Containing Surface of the Substrate to Prevent Resist from Extruding from the Substrate During an Imprinting Process
Mass Spectrometer Performing Mass Spectrometry for Sample with Laser Irradiation
Method for Manufacturing Imprinting Template Substrate, Imprinting Template Substrate, Imprinting Template, and Method for Manufacturing Semiconductor Apparatus
Spin Coating Method and Manufacturing Method of Electronic Component
Measuring Method of Scanning Probe Microscopy Using Penetrative Pressing Force
Manufacturing Method of Semiconductor Device and Slurry for Chemical Mechanical Polishing
Application:
15/228,369 →
Publication:
US 2017/0133238
Substrate Processing Method
Template Substrate and Manufacturing Method Thereof
Template Defect Inspection Method
Memory Control Circuit and Storage Device Including First Memory, Second Memory, and Buffer
Application:
15/266,495 →
Publication:
US 2017/0004095
Guide Pattern Data Correcting Method, Pattern Forming Method, and Computer Readable Record Medium
Semiconductor Storage Device
Memory System Having Multiple Different Type Memories with Various Data Granularities
Memory Control Circuitry, Memory System and Processor System
Controlling Write Pulse Width to Non-Volatile Memory Based on Free Space of a Storage
Memory System with Plural Non-Volatile Memories Having Different Access Sizes, Different Speeds Using Address Conversion Information to Access One Memory by Converting an Address to Access Another Memory
Semiconductor Device, Manufacturing Method and Controlling Method of Semiconductor Device
Manufacturing Method of a Semiconductor Device
Resist Material and Pattern Forming Method Using Same
Related Assignments
(17)
Other recorded transfers of the patents in this record — the chain of ownership.
Assignment of Assignor's Interest
Aug 5, 2013
From: YONEMITSU, HIROKI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 030938/0396 →
Assignment of Assignor's Interest
Sep 5, 2013
From: NAKAZAWA, KEISUKE
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 031143/0510 →
Assignment of Assignor's Interest
Mar 3, 2015
From: HIRANO, MASAKI; KURODA, YUICHI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035074/0330 →
Assignment of Assignor's Interest
Mar 11, 2015
From: OJIMA, TOMOKO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035136/0391 →
Assignment of Assignor's Interest
Apr 17, 2015
From: MIURA, KAZUYUKI; TAKAHASHI, KENSUKE
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035436/0314 →
Assignment of Assignor's Interest
Apr 23, 2015
From: MOTOKAWA, TAKEHARU
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035481/0899 →
Assignment of Assignor's Interest
May 19, 2015
From: MATSUI, YUKITERU; SUGURO, KYOICHI; GAWASE, AKIFUMI; KAWASAKI, TAKAHIKO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035670/0888 →
Assignment of Assignor's Interest
May 20, 2015
From: SAKURAI, HIDEAKI; SUENAGA, MACHIKO; MOTOKAWA, TAKEHARU; TERAYAMA, MASATOSHI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035682/0038 →
Assignment of Assignor's Interest
May 20, 2015
From: HOSOKAWA, YASUHIRO
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 035678/0470 →
Assignment of Assignor's Interest
Mar 14, 2016
From: WU, JIAHONG; MIZUNO, AYAKO; YAMADA, YUJI
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 037967/0142 →
Corrective Assignment to Correct the Assignee Postal Code Previously Recorded on Reel 043027 Frame 0072. Assignor(S) Hereby Confirms the Assignment.
Sep 1, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043747/0273 →
Merger
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
Change of Name and Address
Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
Change of Name and Address
Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
Change of Name and Address
Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 058905/0582 →
Merger
Jan 31, 2022
From: TOSHIBA MEMORY CORPORATION
To: K.K PANGEA
Reel/Frame 058946/0675 →
Change of Name and Address
Feb 4, 2022
From: K.K PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 058957/0124 →