Pattern inspection apparatus and pattern inspection method
View Patent ↗A pattern inspection apparatus according to an embodiment includes an image capture and an output part. The image capture captures an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern. The output part outputs position information of the first or second pattern corresponding to divergent portions between a reference data generated from design data of the first pattern and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged.
1. A pattern inspection apparatus comprising:
an image capture capturing an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern; and
an output part outputting position information of the first or second pattern corresponding to divergent portions between a reference data generated from design data of the first pattern and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged,
wherein the prediction positions of the first defects are determined using an elastic deformation simulation or a plastic deformation simulation.
2. The apparatus of claim 1 , further comprising a storage part storing information of the prediction positions of the first defects.
3. The apparatus of claim 1 , wherein the prediction positions of the first defects are determined by adding a modification to a result obtained using the elastic deformation simulation or the plastic deformation simulation.
4. The apparatus of claim 1 , further comprising an input part inputting information of the prediction positions of the first defects from outside of the pattern inspection apparatus.
5. The apparatus of claim 1 , wherein the inspection target object is enlarged in one direction or in two directions orthogonal to each other in a plane including the first or the second pattern.
6. The apparatus of claim 1 , wherein the inspection target object is enlarged in all directions in a plane including the first or the second pattern.
7. A pattern inspection apparatus comprising:
an image capture capturing an image of a second pattern of an inspection target object obtained by enlarging the inspection target object having a first pattern;
a generator generating a second reference data by including data of first defects in a first reference data, the first defects being predicted to occur due to enlargement of the inspection target object, the first reference data being generated from design data of the first pattern; and
an output part outputting position information of the first or second pattern corresponding to divergent portions between the second reference data and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged.
8. The apparatus of claim 7 , wherein the output part removes the prediction positions of the first defects from the divergent portions comparing the captured data with the second reference data.
9. The apparatus of claim 7 , wherein the output part removes the prediction positions of the first defects from the divergent portions removing the first defects for comparison when comparing the captured data with the second reference data.
10. The apparatus of claim 7 , wherein the generator generates modification data with respect to types of the first defects, respectively, and generates the second reference data by modifying the first reference data using the modification data.
11. The apparatus of claim 10 , wherein the generator uses the modification data for portions of the first defects in the first reference data.
12. The apparatus of claim 7 , further comprising a storage part storing information of the prediction positions of the first defects.
13. The apparatus of claim 7 , wherein the prediction positions of the first defects are determined using an elastic deformation simulation or a plastic deformation simulation.
14. A pattern inspection method performed using a pattern inspection apparatus comprising an image capture capturing an image of an inspection target object having a first pattern, and an output part outputting position information of defects in the first pattern, the method comprising:
capturing an image of a second pattern of the inspection target object obtained by enlarging the inspection target object; and
outputting position information of the first or second pattern corresponding to divergent portions between a reference data generated from design data of the first pattern and a captured data generated by the image capture, other than prediction positions of first defects occurring when the inspection target object is enlarged, or
generating a second reference data by including data of the first defects in a first reference data generated from design data of the first pattern, and outputting position information of the first or second pattern corresponding to divergent portions between the second reference data and the captured data generated by the image capture.
15. The method of claim 14 , further comprising:
generating the prediction positions of the first defects using an elastic deformation simulation or a plastic deformation simulation; and
storing the prediction positions of the first defects.
16. The method of claim 14 , further comprising inputting the prediction positions of the first defects from outside of the pattern inspection apparatus.
17. The method of claim 14 , wherein the prediction positions of the first defects are determined by adding a modification to a result obtained using the elastic deformation simulation or the plastic deformation simulation.
18. The method of claim 14 , wherein the second reference data is generated by modifying the first reference data using modification data, the modification data being generated with respect to types of the first defects, respectively.
19. The method of claim 18 , wherein the second reference data is generated using the modification data for portions of the first defects in the first reference data.