Template substrate and manufacturing method thereof
A template substrate according to an embodiment includes a first face and a second face on an opposite side to the first face. A first region is located on the first face to be protruded from a peripheral portion thereof. A second region is located at least at an end portion of the first region, and is a region in which an alignment mark used at a time of transfer of a pattern is intended to be formed. The second region contains a first impurity and a second impurity.
1. A template substrate comprising:
a first face;
a second face on an opposite side to the first face;
a first region located on the first face to be protruded from a peripheral portion thereof; and
a second region located at least at an end portion of the first region, the second region in which an alignment mark used at a time of transfer of a pattern is intended to be formed, and the second region containing a first impurity and a second impurity,
wherein
an ionization tendency of an element as the second impurity is smaller than that of an element as the first impurity, and
an atomic weight of the element as the first impurity is smaller than that of the element as the second impurity.
2. The template substrate of claim 1 , wherein a depth at which a concentration of the first impurity has a maximum value and a depth at which a concentration of the second impurity has a maximum value are substantially same.
3. The template substrate of claim 1 , further comprising a glass film provided on the first face.
4. The template substrate of claim 2 , further comprising a glass film provided on the first face.
5. The template substrate of claim 1 , wherein
the first impurity is at least one element among magnesium, titanium, aluminum, zirconium, and manganese, and
the second impurity is at least one element among chromium, molybdenum, zinc, cobalt, nickel, tin, lead, antimony, copper, silver, gold, and platinum.
6. The template substrate of claim 1 , wherein the first impurity and the second impurity are implanted to have maximum concentration values at a position closer to a front surface of the first region than a position being a bottom surface of the alignment mark.
7. A template substrate comprising:
a first face;
a second face on an opposite side to the first face;
a first region located on the first face to be protruded from a peripheral portion thereof; and
a second region located at least at an end portion of the first region, and containing a first impurity and a second impurity, the first impurity comprising at least one element among magnesium, titanium, aluminum, zirconium, and manganese and the second impurity comprising at least one element among chromium, molybdenum, zinc, cobalt, nickel, tin, lead, antimony, copper, silver, gold, and platinum.
8. The template substrate of claim 7 , wherein a depth at which a concentration of the first impurity has a maximum value and a depth at which a concentration of the second impurity has a maximum value are substantially same.