IP Library Granted Patent US 9,793,111
Granted Patent B2
US 9,793,111 · App. 15/066,815 · Granted Oct 17, 2017

Spin coating method and manufacturing method of electronic component

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Quick Facts
Patent No.
US 9,793,111
App. No.
15/066,815
Granted
Oct 17, 2017
Kind
B2
Abstract

A spin coating method according to an embodiment includes forming a first material film on an underlying material. The underlying material is rotated while a solution of a second material film is supplied onto an upper surface of the first material film to make the solution stay on the upper surface of the first material film. Rotating of the underlying material is stopped or a rotational speed of the underlying material is reduced to 10 rpm or less. The underlying material is rotated after a first period elapses after the stopping of the rotating of the underlying material, or the rotational speed of the underlying material is increased after the first period elapses after the reducing of the rotational speed of the underlying material to spin off the solution from the upper surface of the first material film.

Claims (30)

1. A spin coating method comprising:

forming a first material film on an underlying material;

rotating the underlying material while a solution of a second material film is supplied onto an upper surface of the first material film, to make the solution stay on the upper surface of the first material film;

stopping the rotating of the underlying material or reducing a rotational speed of the underlying material to 10 rpm or less; and

spinning off the solution from the upper surface of the first material film by rotating the underlying material after a first period elapses after the stopping of the rotating of the underlying material, or by increasing the rotational speed of the underlying material after the first period elapses after the reducing of the rotational speed of the underlying material,

wherein when the solution is spun off, the solution is supplied onto the upper surface of the first material film, the supplying of the solution is stopped and rotation is then performed for a certain period of time, and thereafter the solution is spun off.

2. The method of claim 1 , wherein

before the solution is made to stay, the solution is supplied onto the upper surface of the first material film while the underlying material is rotated at a first rotational speed, to make an entire upper surface of the first material film wet with the solution, and

when the solution is made to stay, the underlying material is rotated at a second rotational speed slower than the first rotational speed while the solution is supplied onto the upper surface of the first material film, to make the solution stay on the entire upper surface of the first material film.

3. The method of claim 2 , wherein the underlying material is rotated at a third rotational speed that is faster than the second rotational speed, when the solution is spun off.

4. The method of claim 2 , wherein a cleaning liquid for dissolving the solution is supplied to an end portion and a back surface of the underlying material, when the solution is spun off.

5. The method of claim 2 , wherein the first material film is formed of a fine particle material or a porous material that allows penetration of the solution thereinto.

6. The method of claim 1 , further comprising heating after the solution on the upper surface of the first material film is spun off, to harden the solution that has penetrated an inside of the first material film.

7. The method of claim 1 , wherein a cleaning liquid for dissolving the solution is supplied to an end portion and a back surface of the underlying material, when the solution is spun off.

8. The method of claim 1 , wherein the first material film is formed of a fine particle material or a porous material that allows penetration of the solution thereinto.

9. A manufacturing method of an electronic component, comprising:

forming a first material film on an underlying material;

rotating the underlying material while a solution of a second material film is supplied onto an upper surface of the first material film, to make the solution stay on the upper surface of the first material film;

stopping the rotating of the underlying material or reducing a rotational speed of the underlying material to 10 rpm or less; and

spinning off the solution on the upper surface of the first material film by rotating the underlying material or increasing the rotational speed of the underlying material after a first period elapses after the stopping of the rotating of the underlying material, or after the first period elapses after the reducing of the rotational speed of the underlying material,

wherein when the solution is spun off, the solution is supplied onto the upper surface of the first material film, the supplying of the solution is stopped and rotation is then performed for a certain period of time, and thereafter the solution is spun off.

10. The method of claim 9 , wherein

before the solution is made to stay, the solution is supplied onto the upper surface of the first material film while the underlying material is rotated at a first rotational speed, to make an entire upper surface of the first material film wet with the solution, and

when the solution is made to stay, the underlying material is rotated at a second rotational speed slower than the first rotational speed while the solution is supplied onto the upper surface of the first material film, to make the solution stay on the entire upper surface of the first material film.

11. The method of claim 10 , wherein the underlying material is rotated at a third rotational speed that is faster than the second rotational speed, when the solution is spun off.

12. The method of claim 10 , wherein the underlying material is rotated at the second rotational speed that is slower than the first rotational speed, when the solution is spun off.

13. The method of claim 10 , wherein a cleaning liquid for dissolving the solution is supplied to an end portion and a back surface of the underlying material, when the solution is spun off.

14. The method of claim 10 , wherein the first material film is formed of a fine particle material or a porous material that allows penetration of the solution thereinto.

15. The method of claim 9 , wherein a cleaning liquid for dissolving the solution is supplied to an end portion and a back surface of the underlying material, when the solution is spun off.

16. The method of claim 9 , wherein the first material film is formed of a fine particle material or a porous material that allows penetration of the solution thereinto.

Assignments (6)
MERGER Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: K.K. PANGEA
Reel/Frame 055659/0471 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: TOSHIBA MEMORY CORPORATION
To: KIOXIA CORPORATION
Reel/Frame 055669/0001 →
CHANGE OF NAME AND ADDRESS Recorded Jan 22, 2021
From: K.K. PANGEA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 055669/0401 →
CORRECTIVE ASSIGNMENT TO CORRECT THE ASSIGNEE POSTAL CODE PREVIOUSLY RECORDED ON REEL 043027 FRAME 0072. ASSIGNOR(S) HEREBY CONFIRMS THE ASSIGNMENT. Recorded Sep 1, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043747/0273 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 28, 2017
From: KABUSHIKI KAISHA TOSHIBA
To: TOSHIBA MEMORY CORPORATION
Reel/Frame 043027/0072 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 16, 2016
From: NAKAZAWA, KEISUKE
To: KABUSHIKI KAISHA TOSHIBA
Reel/Frame 037995/0743 →