Plasma source
View Patent ↗A plasma generating device includes a plasma source having a plasma source hollow body ( 1 ) and an electron emission unit ( 5 ) for emitting free electrons into the plasma source hollow body. The plasma source hollow body ( 1 ) has a first gas inlet ( 7 a ) and a plasma source opening ( 10 ) which forms an opening to a vacuum chamber. An anode has an anode hollow body ( 2 ). The anode hollow body ( 2 ) has a second gas inlet ( 7 b ) and an anode opening ( 11 ) which forms an opening to the vacuum chamber, and a voltage source ( 8 ) the negative pole of which is connected to the electron emission unit ( 5 ) and the positive pole of which is connected to the anode hollow body ( 2 ). The positive pole of the voltage source ( 8 ) is electrically connected by a first shunt ( 6 a ) to the plasma source hollow body.
1. A plasma generating device, comprising:
a plurality of plasma sources, wherein each plasma source has a plasma source hollow body ( 1 ) and an electron emission unit ( 5 ) to emit free electrons into each plasma source hollow body ( 1 ), wherein each plasma source hollow body ( 1 ) comprises a first gas inlet ( 7 a ) and a plasma source opening ( 10 ) which forms an opening to a vacuum chamber ( 3 ),
a plurality of anodes, wherein each anode comprises an anode hollow body ( 2 ), wherein each anode hollow body ( 2 ) comprises a second gas inlet ( 7 b ) and an anode opening ( 11 ) which forms an opening to the vacuum chamber ( 3 ), and
a voltage source ( 8 ) the negative pole of which is connected to each electron emission unit ( 5 ) and the positive pole of which is connected to each anode hollow body ( 2 ),
wherein the plurality of anodes are externally mounted to the vacuum chamber ( 3 ) and the positive pole of the voltage source ( 8 ) is additionally electrically connected to each plasma source hollow body ( 1 ) by means of a first shunt ( 6 a ).
2. The plasma generating device according to claim 1 , wherein the positive pole of the voltage source ( 8 ) is electrically connected to the vacuum chamber by means of a second shunt ( 6 b ).
3. The plasma generating device according to claim 1 , wherein at least one plasma source opening ( 10 ) is provided with a screen ( 9 b ) which is adapted to close the at least one plasma source opening ( 10 ) as needed.
4. The plasma generating device according to claim 1 , wherein at least one anode opening ( 11 ) is provided with a screen ( 9 a ) which is adapted to close the at least one anode opening ( 11 ) as needed.
5. The plasma generating device according to claim 1 , wherein at least one plasma source opening and/or at least one anode opening are formed such that supersonic flow through the at least one plasma source opening is established during operation.
6. The plasma generating device according to claim 1 , wherein at least one anode hollow body ( 2 ) is flange-mounted to the vacuum chamber ( 3 ).
7. The plasma generating device according to claim 1 , wherein at least one anode hollow body ( 2 ) is flange-mounted to one of a sidewall, ceiling, or bottom of the vacuum chamber ( 3 ).
8. The plasma generating device according to claim 1 , wherein at least one anode hollow body ( 2 ) is mounted to the vacuum chamber ( 3 ) in an electrically insulated manner via insulators ( 4 ).
9. The plasma generating device according to claim 8 , wherein at least one anode hollow body ( 2 ) is flange mounted to the vacuum chamber ( 3 ).
10. The plasma generating device according to claim 1 , wherein the plurality of plasma sources comprise a first plasma source and a second plasma source and the plurality of anodes comprise a first anode and a second anode, and wherein a first flow of electrons extends between the first plasma source and the first anode and a second flow of electrons extends between the second plasma source and the second anode.
11. The plasma generating device according to claim 10 , wherein the first flow and the second flow are parallel.
12. The plasma generating device according to claim 11 , wherein the first flow is arranged substantially above the second flow.
13. The plasma generating device according to claim 10 , wherein the first flow and the second flow are perpendicular to each other.
14. The plasma generating device according to claim 1 , wherein each plasma source opening ( 10 ) is provided with a screen ( 9 b ) which is adapted to close each plasma source opening ( 10 ) as needed.
15. The plasma generating device according to claim 1 , wherein each anode opening ( 11 ) is provided with a screen ( 9 a ) which is adapted to close each anode opening ( 11 ) as needed.
16. The plasma generating device according to claim 1 , wherein each anode hollow body ( 2 ) is flange-mounted to the vacuum chamber ( 3 ).
17. The plasma generating device according to claim 1 , wherein each anode hollow body ( 2 ) is flange-mounted to one of a sidewall, ceiling, or bottom of the vacuum chamber ( 3 ).
18. The plasma generating device according to claim 1 , wherein each anode hollow body ( 2 ) is mounted to the vacuum chamber ( 3 ) in an electrically insulated manner via insulators ( 4 ).
19. The plasma generating device according to claim 8 , wherein each anode hollow body ( 2 ) is flange-mounted to the vacuum chamber ( 3 ).