IP Library Granted Patent US 9,658,175
Granted Patent B2
US 9,658,175 · App. 14/662,906 · Granted May 23, 2017

X-ray analyzer

Inventor: Ryusuke Hirose (Tokyo, JP)
Assignee: HITACHI HIGH-TECH SCIENCE CORPORATION
G01N23/223G01N2223/076G01N2223/323
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Quick Facts
Patent No.
US 9,658,175
App. No.
14/662,906
Granted
May 23, 2017
Kind
B2
Abstract

An X-ray analyzer is provided with: a sample stage on which a sample is disposed; an X-ray source configured to irradiate the sample with a primary X-ray at a first angle; a detector configured to detect a secondary X-ray generated from the sample; a position adjustment mechanism configured to adjust a relative position between the sample stage and the primary X-ray; a first light source configured to emit a first light beam at a second angle toward a focal position of the primary X-ray or toward a predetermined position; and a second light source configured to emit a second light beam at a third angle toward the focal position or toward the predetermined position, wherein the first light beam and the second light beam are configured to have visibility sufficient for enabling visual distinction.

Claims (28)

1. An X-ray analyzer comprising:

a sample stage on which a sample is disposed;

an X-ray source configured to irradiate the sample with a primary X-ray at a first angle;

a detector configured to detect a secondary X-ray generated from the sample by being irradiated with the primary X-ray;

a position adjustment mechanism configured to adjust a relative position between the sample stage and the primary X-ray;

a first light source configured to emit a first light beam at a second angle toward a focal position of the primary X-ray or toward a predetermined position which is apart from the focal position at a predetermined distance and at the same height as the focal position in a horizontal direction; and

a second light source configured to emit a second light beam at a third angle toward the focal position or toward the predetermined position, the third angle being different from the first angle and the second angle,

wherein the first light beam and the second light beam are configured to have visibility sufficient for enabling visual distinction between the first light beam and the second light beam on the sample stage or on the sample disposed on the sample stage when the first light beam and the second light beam are irradiated on the sample stage or on the sample disposed on the sample stage.

2. The X-ray analyzer according to claim 1 ,

wherein the first light beam is configured to have a first color, and

wherein the second light beam is configured to have a second color that is different from the first color.

3. The X-ray analyzer according to claim 1 ,

wherein the first light beam is configured to have a first diameter of a beam spot on the sample stage, and

wherein the second light beam is configured to have a second diameter of a beam spot on the sample stage, the second diameter being different from the first diameter.

4. The X-ray analyzer according to claim 1 ,

wherein the first light beam is configured to have a first beam shape, and

wherein the second light beam is configured to have a second beam shape that is different from the first beam shape.

5. The X-ray analyzer according to claim 1 ,

wherein one of the first light beam and the second light beam is configured to blink.

6. The X-ray analyzer according to claim 1 ,

wherein an irradiation direction of the first light beam is configured to be in parallel with an optical axis of the primary X-ray.

7. The X-ray analyzer according to claim 1 further comprising:

an observation mechanism comprising an optical system that is configured to enable observation of the sample stage,

wherein an irradiation direction of the first light beam is configured to coincide with an optical axis of the optical system to the sample stage.

8. The X-ray analyzer according to claim 1 further comprising:

an observation mechanism configured to obtain a sample observation image as image data, the sample observation image including an image of the first light beam and the second light beam irradiated on the sample stage or on the sample on the sample stage; and

a controller configured to control the position adjustment mechanism,

wherein the controller controls the position adjustment mechanism to cause a position of the sample, an irradiation position of the first light beam, and an irradiation position of the second light beam to coincide with each other, based on the image data.

Assignments (3)
CHANGE OF ADDRESS Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 072903/0555 →
CHANGE OF NAME Recorded Sep 17, 2025
From: HITACHI HIGH-TECH SCIENCE CORPORATION
To: HITACHI HIGH-TECH ANALYSIS CORPORATION
Reel/Frame 072903/0648 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 15, 2016
From: HIROSE, RYUSUKE
To: HITACHI HIGH-TECH SCIENCE CORPORATION
Reel/Frame 038923/0271 →
Priority Claims (1)
JP 2014-058390 · Mar 20, 2014 · national
Continuity (1)
Related Publication 20150268180A1 · Sep 24, 2015