Light stability of nanowire-based transparent conductors
Disclosed herein are photo-stable optical stacks including a transparent conductive film formed by silver nanostructures or silver mesh. In particular, one or more light stabilizers (such as transition metal salts) are incorporated into one or more constituent layers of the optical stack.
1. An optical stack comprising:
a first substrate;
a nanowire layer overlying the first substrate and including a plurality of silver nanowires;
an optically clear adhesive layer overlying the nanowire layer;
a second glass substrate overlying the optically clear adhesive layer, wherein the nanowire layer is located between the first substrate and the second glass substrate; and
a light stabilizer acting as a catalyst to accelerate a reaction of oxygen with organic materials present in the optical stack, wherein:
the light stabilizer comprises FeSO 4 ,
the light stabilizer is incorporated in the nanowire layer,
the nanowire layer comprises acetic acid, and
a material of the light stabilizer is selected to at least one of:
thermally degrade such that at least a portion of the optical stack has a first resistance prior to exposure to heat and has a second resistance after exposure to the heat, or
degrade upon exposure to UV light such that at least a portion of the optical stack has a first resistance prior to exposure to the UV light and has a second resistance after exposure to the UV light.
2. The optical stack of claim 1 , wherein the light stabilizer is further incorporated in the first substrate or the second glass substrate.
3. The optical stack of claim 1 , wherein the light stabilizer is further incorporated in the optically clear adhesive layer.
4. The optical stack of claim 1 , further comprising an overcoat interposed between the nanowire layer and the optically clear adhesive layer, the overcoat contacting the plurality of silver nanowires, and incorporating the light stabilizer, wherein the light stabilizer is at about 0.14%-30% by weight of a polymeric material of the overcoat.
5. The optical stack of claim 4 , wherein the light stabilizer is at about 0.3%-8%, 0.5%-10%, 0.7%-15%, 1%-10%, 2-8%, or 5-15% by weight of the polymeric material of the overcoat.
6. The optical stack of claim 1 , further comprising bipyridine, phenanthroline, or N,N′-bis(salicylidene)ethylenediamine.
7. The optical stack of claim 1 , wherein the optical stack is soaked in a solution of the light stabilizer to allow the light stabilizer to diffuse into the optical stack.
8. The optical stack of claim 1 , wherein the light stabilizer is applied to the first substrate as a conductive film and heat is applied to the conductive film during a lamination process to change a resistance of the conductive film from the first resistance to the second resistance.
9. The optical stack of claim 8 , wherein, during the lamination process, a pressure of 70-90 MPa is applied to the conductive film.