Focused ion beam apparatus
A focused ion beam apparatus includes: a focused ion beam tube configured to irradiate a focused ion beam onto a sample; a detector configured to detect secondary particles generated from the sample due to the irradiation and to output detection information regarding detected secondary particles; an image forming unit configured to form an observation image of the sample based on the detection information; a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.
1. A focused ion beam apparatus comprising:
a focused ion beam tube configured to irradiate a focused ion beam onto a sample;
a detector configured to detect secondary particles generated from the sample due to the irradiation with the focused ion beam and to output detection information regarding detected secondary particles;
an image forming unit configured to form an observation image of the sample based on the detection information;
a storage unit configured to store positional relation between a first processing area set on an observation image of a first sample and a cross-section surface of the first sample; and
a processing area setting unit configured to automatically set a second processing area on an observation image of a second sample based on the positional relation stored in the storage unit and a position of a cross-section surface of the second sample on the observation image of the second sample.
2. The focused ion beam apparatus according to claim 1 further comprising:
an image processing unit configured to perform an edge enhancement process or a deconvolution process on the observation image of the cross-section surface of the second sample.
3. The focused ion beam apparatus according to claim 1 ,
wherein the image forming unit is configured to form the observation image of the second sample under an observation condition of the observation image of the first sample.
4. The focused ion beam apparatus according to claim 1 ,
wherein the cross-section surface is one of cross-section surfaces of a thin sample.
5. The focused ion beam apparatus according to claim 4 ,
wherein the focused ion beam tube is configured to irradiate the focused ion beam to form the observation image of the second sample with a beam diameter that is larger than a thickness of the thin sample.
6. The focused ion beam apparatus according to claim 4 ,
wherein the storage unit is configured to store the positional relation corresponding to each of the one of the cross-section surfaces of the thin sample and another one of the cross-section surfaces facing the one of the cross-section surfaces.