Method of manufacturing a semiconductor device by forming a film on a substrate
Provided is a technique of forming a film on a substrate by performing a cycle a predetermined number of times. The cycle includes: forming a first layer by supplying a gas containing a first element to the substrate, wherein the first layer is a discontinuous layer, a continuous layer, or a layer in which at least one of the discontinuous layer or the continuous layer is overlapped; forming a second layer including the first layer and a discontinuous layer including a second element stacked on the first layer; and forming a third layer by supplying a gas containing a third element to the substrate to modify the second layer under a condition where a modifying reaction of the second layer by the gas containing the third element is not saturated.
1. A method of manufacturing a semiconductor device, comprising:
forming a film on a substrate, the film including a first element, a second element different from the first element, and a third element different from the first element and the second element, by performing a cycle a predetermined number of times, the cycle including:
(a) forming a first layer that includes the first element by supplying a first gas that includes the first element to the substrate, wherein the first layer includes at least one of: a first discontinuous layer, a continuous layer, or a layer in which at least one of the first discontinuous layer or the continuous layer is overlapped,
(b) forming a second layer that includes the first layer and a second discontinuous layer that includes the second element stacked on the first layer, wherein the second discontinuous layer is formed by supplying a second gas that includes the second element to the substrate, and
(c) forming a third layer that includes the first element, the second element and the third element by supplying a third gas that includes the third element to the substrate to modify the second layer under a condition that a modifying reaction of the second layer by the third gas is not saturated.
2. The method of claim 1 , wherein (b) includes forming the second layer exposing a portion of the first layer at a surface of the second layer.
3. The method of claim 1 , wherein a material decomposed from the second gas is chemically adsorbed on the first layer in a non-saturated manner in (b).
4. The method of claim 1 , wherein a material decomposed from the second gas is chemically adsorbed on the first layer to form a discontinuous chemical adsorption layer of the material on the first layer in (b).
5. The method of claim 1 , wherein a surface layer of the second layer is modified in (c).
6. The method of claim 1 , wherein only a surface layer of the second layer is modified in (c).
7. The method of claim 1 , wherein a portion of a surface layer of the second layer is modified in (c).
8. The method of claim 1 , wherein only a portion of a surface layer of the second layer is modified in (c).
9. The method of claim 1 ,
wherein the first element includes at least one of a semiconductor element or a metal element,
wherein the second element includes at least one of nitrogen, boron, carbon, oxygen, a semiconductor element or a metal element, and
wherein the third element includes at least one of nitrogen or oxygen.
10. The method of claim 1 ,
wherein the first element includes at least one of silicon, boron, aluminum or titanium,
wherein the second element includes at least one of nitrogen, boron, carbon, oxygen, aluminum or titanium, and
wherein the third element includes at least one of nitrogen or oxygen.
11. The method of claim 1 ,
wherein the first element includes at least one of silicon, aluminum or titanium,
wherein the second element includes at least one of boron, carbon, aluminum or titanium, and
wherein the third element includes at least one of nitrogen or oxygen.
12. The method of claim 1 , wherein at least one of the second gas or the third gas is plasma-excited or thermally-excited and supplied to the substrate.
13. A substrate processing method, comprising:
forming a film on a substrate, the film including a first element, a second element different from the first element, and a third element different from the first element and the second element, by performing a cycle a predetermined number of times, the cycle including:
(a) forming a first layer that includes the first element by supplying a first gas that includes the first element to the substrate, wherein the first layer includes at least one of: a first discontinuous layer, a continuous layer, or a layer in which at least one of the first discontinuous layer or the continuous layer is overlapped,
(b) forming a second layer that includes the first layer and a second discontinuous layer that includes the second element stacked on the first layer, wherein the second discontinuous layer is formed by supplying a second gas that includes the second element to the substrate, and
(c) forming a third layer that includes the first element, the second element and the third element by supplying a third gas that includes the third element to the substrate to modify the second layer under a condition that a modifying reaction of the second layer by the third gas is not saturated.