Silicon germanium thickness and composition determination using combined XPS and XRF technologies
View Patent ↗Systems and approaches for silicon germanium thickness and composition determination using combined XPS and XRF technologies are described. In an example, a method for characterizing a silicon germanium film includes generating an X-ray beam. A sample is positioned in a pathway of said X-ray beam. An X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam is collected. An X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam is also collected. Thickness or composition, or both, of the silicon germanium film is determined from the XRF signal or the XPS signal, or both.
1. A method for characterizing a silicon germanium film, said method comprising:
generating an X-ray beam;
positioning a sample in a pathway of said X-ray beam;
collecting an X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam;
collecting an X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam;
determining a thickness of the silicon germanium film from the XRF signal and the XPS signal; and
determining a composition of the silicon germanium film from the XRF signal and the XPS signal, wherein determining the composition of the silicon germanium film comprises comparing the XRF signal and the XPS signal to a realistic material layer mixing model that scales the predicted intensity of an XPS Ge signal and an XRF Ge signal relative to a pure germanium film, constraining the remaining fraction of the silicon germanium film to Si.
2. The method of claim 1 , wherein collecting the XPS signal and collecting the XRF signal is performed simultaneously.
3. The method of claim 1 , wherein collecting the XPS signal and collecting the XRF signal comprises collecting within an approximately 50 μm 2 metrology box of the sample.
4. The method of claim 1 , wherein determining the thickness of the silicon germanium film comprises determining the thickness of a silicon germanium channel layer of a semiconductor device.
5. The method of claim 1 , wherein determining the thickness of the silicon germanium film comprises determining the thickness of a silicon germanium source or drain region of a semiconductor device.
6. A method for characterizing a silicon germanium film, said method comprising:
generating an X-ray beam;
positioning a sample in a pathway of said X-ray beam;
collecting an X-ray photoelectron spectroscopy (XPS) signal generated by bombarding said sample with said X-ray beam;
collecting an X-ray fluorescence (XRF) signal generated by bombarding said sample with said X-ray beam; and
determining a composition of the silicon germanium film from the XRF signal and the XPS signal, wherein determining the composition of the silicon germanium film comprises comparing the XRF signal and the XPS signal to a realistic material layer mixing model that scales the predicted intensity of an XPS Ge signal and an XRF Ge signal relative to a pure germanium film, constraining the remaining fraction of the silicon germanium film to Si.
7. The method of claim 6 , wherein collecting the XPS signal and collecting the XRF signal is performed simultaneously.
8. The method of claim 6 , wherein collecting the XPS signal and collecting the XRF signal comprises collecting within an approximately 50 μm 2 metrology box of the sample.
9. The method of claim 6 , wherein determining the composition of the silicon germanium film comprises determining the composition of a silicon germanium channel layer of a semiconductor device.
10. The method of claim 6 , wherein determining the composition of the silicon germanium film comprises determining the composition of a silicon germanium source or drain region of a semiconductor device.