IP Library Granted Patent US 10,177,365
Granted Patent B2
US 10,177,365 · App. 14/693,719 · Granted Jan 8, 2019

Metal fluoride passivation coatings prepared by atomic layer deposition for Li-ion batteries

Inventors: Anil U. Mane (Naperville, IL); Jeffrey W. Elam (Elmhurst, IL); Joong Sun Park (Woodridge, IL); Jason R. Croy (Plainfield, IL)
Assignee: UChicago Argonne, LLC
H01M4/0421C23C16/30C23C16/45531C23C16/45555H01M4/131H01M4/1391H01M4/366H01M4/505H01M4/628H01M10/0525
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 10,177,365
App. No.
14/693,719
Granted
Jan 8, 2019
Kind
B2
Abstract

The fabrication of robust interfaces between transition metal oxides and non-aqueous electrolytes is one of the great challenges of lithium ion batteries. Atomic layer deposition (ALD) of aluminum tungsten fluoride (AlW x F y ) improves the electrochemical stability of LiCoO 2 . AlW x F y thin films were deposited by combining trimethylaluminum and tungsten hexafluoride. in-situ quartz crystal microbalance and transmission electron microscopy studies show that the films grow in a layer-by-layer fashion and are amorphous nature. Ultrathin AlW x F y coatings (<10 Å) on LiCoO 2 significantly enhance stability relative to bare LiCoO 2 when cycled to 4.4 V. The coated LiCoO2 exhibited superior rate capability (up to 400 mA/g) and discharge capacities at a current of 400 mA/g were 51% and 92% of the first cycle capacities for the bare and AlW x F y coated materials. These results open new possibilities for designing ultrathin and electrochemically robust coatings of metal fluorides via ALD to enhance the stability of Li-ion electrodes.

Claims (12)

1. A method of preparing a metal fluoride passivation coating on a cathode comprising:

performing a atomic layer deposition cycles of TMA at a first deposition temperature between 50° C. and 300° C.; and

performing b atomic layer deposition cycles of WF 6 at a second deposition temperature between 50° C. and 300° C., and

forming a layer consisting of AlW x F y C z on the cathode such that the layer excludes oxygen, where x>0, y>0, and z≥0.

2. The method of claim 1 , wherein the ratio of a:b is selected from the group consisting of 3:1, 2:1, 1:1, and 4:2.

3. The method of claim 1 , wherein the first deposition temperature and the second deposition temperature are about 200° C.

4. The method of claim 1 , wherein the cathode comprises LiCoO 2 .

5. The method of claim 1 , wherein z>0.

6. The method of claim 1 , wherein the AlW x F y C z layer has a thickness of less than about 1 nm.

7. The method of claim 1 , wherein the a cycles each comprise: a 1 second TMA dose followed by a 5 second gas purge.

8. The method of claim 1 , wherein the b cycle depositions each comprise: a 1 second WF 6 dose followed by a 5 second gas purge.

9. The method of claim 1 , wherein the metal fluoride passivation coating comprises particles of WC z , wherein z≥0, disposed in a matrix of AlF 3 .

Assignments (2)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Nov 13, 2015
From: MANE, ANIL U.; ELAM, JEFFREY W.; PARK, JOONG SUN; CROY, JASON R.
To: UCHICAGO ARGONNE, LLC
Reel/Frame 037039/0570 →
CONFIRMATORY LICENSE Recorded Oct 7, 2015
From: UCHICAGO ARGONNE, LLC
To: UNITED STATES DEPARTMENT OF ENERGY
Reel/Frame 036815/0314 →
Continuity (2)
Provisional Application 62128944 · Mar 5, 2015
Related Publication 20160260962A1 · Sep 8, 2016
Cited By (1)
US 12,489,104