IP Library Granted Patent US 10,081,705
Granted Patent B2
US 10,081,705 · App. 14/698,520 · Granted Sep 25, 2018

Periodic nanostructures from self assembled wedge-type block-copolymers

Inventors: Yan Xia (Mountain View, CA); Benjamin R. Sveinbjornsson (Pasadena, CA); Robert H. Grubbs (South Pasadena, CA); Raymond Weitekamp (Glendale, CA); Garret M. Miyake (Altadena, CA); Victoria Piunova (Altadena, CA); Christopher Scot Daeffler (Pasadena, CA)
Assignee: California Institute of Technology
C08G61/124C08F222/04C08F222/40C08F232/08C08F293/00C08F299/00C08G81/00B81C2201/0149B82Y40/00C08G61/08C08G2261/126C08G2261/128C08G2261/146C08G2261/148C08G2261/149C08G2261/1426C08G2261/3241C08G2261/3324C08G2261/418C08G2261/74
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Quick Facts
Patent No.
US 10,081,705
App. No.
14/698,520
Granted
Sep 25, 2018
Kind
B2
Abstract

The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.

Claims (46)

1. A photonic crystal, comprising a supramolecular assembly of a plurality of wedge-type block copolymers, wherein each of said wedge-type block copolymers independently comprises:

a first polymer block comprising at least 10 first repeating units; wherein each of said first repeating units of said first polymer block comprises a first polymer backbone group covalently linked to a first wedge group characterized by at least three branch points each terminating in an independent branch moiety comprising at least 10 atoms; said first wedge group having a molecular weight greater than or equal to 50 Da; and

a second polymer block comprising between at least 10 second repeating units; said second polymer block directly or indirectly covalently linked to said first polymer block along a backbone of said wedge-type block copolymer; wherein each of said second repeating units of said second polymer block comprises a second polymer backbone group covalently linked to a first polymer side chain group or a second wedge group different from said first wedge group;

wherein each of said wedge-type block copolymers has a molecular weight selected from the range of 1,000,000 Da to 30,000,000 Da;

wherein each of said wedge-type block copolymers independently has the formula (FX2a), (FX2b), (FX2c) or (FX2d):

 wherein:

Q 1 is a first backbone terminating group and Q 2 is a second backbone terminating group;

L 1 is a first linking group, L 2 is a second linking group, L 3 is a third linking group and L 4 is a fourth linking group;

A is said first wedge group;

B is said first polymer side chain group or said second wedge group;

D is a wedge group;

E is a polymer side chain group or a wedge group; and

each of n and m is independently an integer selected from the range of 20 to 2000;

wherein said wedge-type block copolymers of said photonic crystal are characterized by a polydispersity index selected over the range of 1 to 2.

2. The photonic crystal of claim 1 , comprising a one dimensional, two dimensional or three dimensional photonic crystal.

3. The photonic crystal of claim 1 , wherein said photonic crystal is a stacked lamellar structure.

4. The photonic crystal of claim 1 , wherein said photonic crystal is characterized by a periodically varying refractive index.

5. The photonic crystal of claim 1 , wherein said photonic crystal further comprises an additive selected from the group consisting of ceramic, metal, metal oxide, liquid, silicon, semiconductor and any mixture or combination of these.

6. The photonic crystal of claim 5 , wherein said additive is associated with only one of the blocks of the wedge-type block copolymer.

7. The photonic crystal of claim 1 , wherein said photonic crystal is formed via molecular self-assembly of said plurality of wedge-type block copolymers to generate said supramolecular assembly.

8. The photonic crystal of claim 1 , wherein said photonic crystal is formed via thermal annealing, solvent annealing or by the application of an external pressure.

9. The photonic crystal of claim 1 , comprising a periodic structure.

10. The photonic crystal of claim 1 , comprising a nanostructure or a microstructure.

11. The photonic crystal of claim 9 , wherein said structure is characterized by at least one domain having a size greater than or equal to 80 nm.

12. The photonic crystal of claim 9 , wherein said structure absorbs, scatters or reflects electromagnetic radiation having wavelengths greater than or equal to 400 nm.

13. The photonic crystal of claim 9 , wherein said structure is characterized by an optical thickness greater than or equal to 100 nm.

14. A method of making a photonic crystal, comprising a supramolecular assembly of a plurality of wedge-type block copolymers, comprising the steps of:

providing said wedge-type block copolymers, wherein each of said wedge-type block copolymers independently comprising comprises:

a first polymer block comprising at least 10 first repeating units; wherein each of said first repeating units of said first polymer block comprises a first polymer backbone group covalently linked to a first wedge group characterized by a at least three branch points each terminating in an independent branch moiety comprising at least 10 atoms; said first wedge group having a molecular weight greater than or equal to 50 Da; and

a second polymer block comprising between at least 10 second repeating units; said second polymer block directly or indirectly covalently linked to said first polymer block along a backbone of said wedge-type block copolymer; wherein each of said second repeating units of said second polymer block comprises a second polymer backbone group covalently linked to a first polymer side chain group or a second wedge group different from said first wedge group;

wherein each of said wedge-type block copolymers has a molecular weight selected from the range of 1,000,000 Da to 30,000,000 Da;

wherein each of said wedge-type block copolymers independently has the formula (FX2a), (FX2b), (FX2c) or (FX2d):

 wherein:

Q 1 is a first backbone terminating group and Q 2 is a second backbone terminating group;

L 1 is a first linking group, L 2 is a second linking group, L 3 is a third linking group and L 4 is a fourth linking group;

A is said first wedge group;

B is said first polymer side chain group or said second wedge group;

D is a wedge group;

E is a polymer side chain group or a wedge group; and

each of n and m is independently an integer selected from the range of 20 to 2000;

wherein said wedge-type block copolymers of said photonic crystal are characterized by a polydispersity index selected over the range of 1 to 2;

forming said photonic crystal via molecular self-assembly of said wedge-type block copolymers.

15. The method of claim 14 , wherein said supramolecular assembly is formed via molecular self-assembly of said plurality of wedge-type block copolymers.

16. The method of claim 14 , wherein said supramolecular assembly is a lamellar structure.

17. The method of claim 14 , wherein said molecular self-assembly is carried out via thermal annealing, solvent annealing or by the application of an external pressure.

18. The method of claim 14 , wherein each of said wedge-type block copolymers independently further comprise a third polymer block comprising at least 10 third repeating units; said third polymer block indirectly or directly covalently linked to said first polymer block and said second polymer block along the backbone of said wedge-type block copolymer; wherein each of said third repeating units of said third polymer block comprises a third polymer backbone group covalently linked to a second polymer side chain group or a third wedge group.

Assignments (3)
CONFIRMATORY LICENSE Recorded Nov 19, 2015
From: CALIFORNIA INSTITUTE OF TECHNOLOGY
To: NATIONAL INSTITUTES OF HEALTH (NIH), U.S. DEPT. OF HEALTH AND HUMAN SERVICES (DHHS), U.S. GOVERNMENT
Reel/Frame 037083/0361 →
CORRECTIVE ASSIGNMENT TO CORRECT THE NAME OF INVENTOR CHARLES SCOT DAEFFLER TO CHRISTOPHER SCOT DAEFFLER PREVIOUSLY RECORDED ON REEL 035540 FRAME 0103. ASSIGNOR(S) HEREBY CONFIRMS THE NAME OF CHRISTOPHER SCOT DAEFFLER. Recorded Jun 1, 2015
From: XIA, YAN; SVEINBJORNSSON, BENJAMIN R.; GRUBBS, ROBERT H.; WEITEKAMP, RAYMOND; MIYAKE, GARRET M.; PIUNOVA, VICTORIA; DAEFFLER, CHRISTOPHER SCOT
To: CALIFORNIA INSTITUTE OF TECHNOLOGY
Reel/Frame 035799/0108 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Apr 30, 2015
From: XIA, YAN; SVEINBJORNSSON, BENJAMIN R.; GRUBBS, ROBERT H.; WEITEKAMP, RAYMOND; MIYAKE, GARRET M.; PIUNOVA, VICTORIA; DAEFFLER, CHARLES SCOT
To: CALIFORNIA INSTITUTE OF TECHNOLOGY
Reel/Frame 035540/0103 →
Continuity (4)
Continuation 13801710 · Mar 13, 2013
Provisional Application 61610379 · Mar 13, 2012
Provisional Application 61736421 · Dec 12, 2012
Related Publication 20160024244A1 · Jan 28, 2016
Cited By (1)
US 12,269,961