Unidirectional spacer in trench silicide

1. A method for forming a semiconductor device, comprising:

forming first and second gate stacks on an upper surface of a substrate, whereby the first and second gate stacks are formed in parallel and are separated by an intermediate region;

depositing a dielectric layer on an upper surface of the first and second gate stacks, whereby the dielectric layer comprises a trench region above at least a portion of the intermediate region, wherein the trench region includes first and second parallel sidewalls, parallel to the first and second gate stacks, and third and fourth parallel sidewalls, perpendicular to the first and second gate stacks;

depositing a silicide layer within a bottom portion of the trench region; and

depositing, by an angular gas cluster ion beam device, a spacer layer within at least the first and second portions of the trench region above and in direct contact with portions of the silicide layer,

wherein sidewalls of the first portion of the trench region comprise portions of the first, second, and third sidewalls of the trench region, and

wherein sidewalls of the second portion of the trench region comprise portions of the first, second and fourth sidewalls of the trench region.

2. The method of claim 1 , wherein depositing the spacer layer further comprises:

positioning the semiconductor device at a non-perpendicular angle relative to an emission point of the GCIB device;

depositing the spacer layer, by the GCIB device, onto at least the first portion of the trench region;

rotating the semiconductor device by 180 degrees;

depositing the spacer layer, by the GCIB device, onto at least the second portion of the trench region; and

removing the spacer layer from a central portion of the trench region, whereby the spacer layer remains on the first and second portions of the trench region.

3. The method of claim 2 , wherein removing the spacer layer from a central portion of the trench region is performed using reactive ion etching (RIE).

4. The method of claim 1 , further comprising:

forming at least two fins onto the upper surface of the semiconductor device prior to depositing the dielectric layer, wherein the first portion of the trench region includes a sidewall corresponding to a sidewall of the at least two fins, and wherein the second portion of the trench region includes a sidewall corresponding to another sidewall of the at least two fins, and

wherein the silicide layer is formed above at least an upper surfaces of the at least two fins.

5. The method of claim 1 , wherein the spacer layer has a thickness of approximately 10 nm.

6. The method of claim 1 , wherein a critical dimension of the first and second gate stacks is approximately 20 nm.

7. The method of claim 1 , wherein the trench region has a height of approximately 15 nm to approximately 25 nm.

8. The method of claim 2 , wherein the non-perpendicular angle is between 30 and 60 degrees.

9. A method for forming a semiconductor device, comprising:

forming first and second gate stacks on an upper surface of a substrate, whereby the first and second gate stacks are formed in parallel and are separated by an intermediate region;

depositing a dielectric layer on an upper surface of the first and second gate stacks, whereby the dielectric layer comprises a trench region above at least a portion of the intermediate region, wherein the trench region includes first and second parallel sidewalls, parallel to the first and second gate stacks, and third and fourth parallel sidewalls, perpendicular to the first and second gate stacks;

depositing a silicide layer within a bottom portion of the trench region; and

depositing a conformal spacer layer on an upper surface of the semiconductor device including upper surfaces of the dielectric layer and the trench region;

doping the spacer layer in the first and second portions of the trench region with retardant gas ions using an angular gas cluster ion beam (GCIB) device,

wherein sidewalls of the first portion of the trench region comprise portions of the first, second, and third sidewalls of the trench region, and

wherein sidewalls of the second portion of the trench region comprise portions of the first, second and fourth sidewalls of the trench region.

10. The method of claim 9 , further comprising:

removing the spacer layer from a central portion of the trench region, whereby the spacer layer remains in the first and second portions of the trench region.

11. The method of claim 9 , wherein the retardant gas includes ion clusters of one or more of carbon and fluorine gas.

12. The method of claim 10 , wherein removing the spacer layer from a central portion of the trench region comprises using a reactive ion etching (RIE) process.

13. The method of claim 9 , further comprising:

forming at least two fins onto the upper surface of the semiconductor device prior to depositing the dielectric layer, wherein the first portion of the trench region includes a sidewall corresponding to a sidewall of the at least two fins, and wherein the second portion of the trench region includes a sidewall corresponding to another sidewall of the at least two fins, and

wherein the silicide layer is formed above at least an upper surface of the at least two fins.

14. The method of claim 9 , wherein a critical dimension of the first and second gate stacks is approximately 20 nm.

15. The method of claim 9 , wherein the trench region has a height of approximately 15 nm to approximately 25 nm.

16. The method of claim 9 , wherein doping the spacer layer further comprises:

positioning the semiconductor device at a non-perpendicular angle relative to an emission point of the GCIB device;

doping the spacer layer, by the GCIB device, on at least the first portion of the trench region;

rotating the semiconductor device by 180 degrees; and

doping the spacer layer, by the GCIB device, on at least the second portion of the trench region.