Semiconductor device and method of manufacturing the same

1. A method of manufacturing a semiconductor device having a MISFET of a first conductivity type, comprising the steps of:

(a) preparing a semiconductor substrate;

(b) forming a gate electrode over the semiconductor substrate via a gate insulating film;

(c) after step (b), forming a stacked film having a first insulating film and a second insulating film lying over the first insulating film, over the semiconductor substrate so as to cover the gate electrode;

(d) after step (c), etching back the stacked film to form a first sidewall spacer having the stacked film over a side wall of the gate electrode;

(e) after step (d), removing the second insulating film configuring the first sidewall spacer;

(f) after step (e), epitaxially growing a first semiconductor layer on the semiconductor substrate exposed from the first insulating film;

(g) after step (f), forming a reacted layer of a metal and the first semiconductor layer over the first semiconductor layer,

wherein, in step (f), a part of the first semiconductor layer epitaxially grown runs over the first insulating film and after step (f) and before step (g), (f1) forming a second sidewall spacer over the side wall of the gate electrode via the first insulating film.

2. The method of manufacturing a semiconductor device according to claim 1 ,

wherein

in step (e), the first insulating film which configured the first sidewall spacer remains so as to extend from over a side wall of the gate electrode to over the semiconductor substrate, and

in step (f), the part of the first semiconductor layer epitaxially grown runs over the first insulating film in a part extending over the semiconductor substrate.

3. The method of manufacturing a semiconductor device according to claim 2 ,

wherein the first semiconductor layer is a semiconductor layer for source/drain.

4. The method of manufacturing a semiconductor device according to claim 3 ,

wherein, in step (e), etching is performed under a condition in which the first insulating film is harder to etch than the second insulating film to remove the second insulating film configuring the first sidewall spacer.

5. The method of manufacturing a semiconductor device according to claim 3 ,

wherein, in step (g), a second epitaxial semiconductor layer is formed on the gate electrode.

6. The method of manufacturing a semiconductor device according to claim 3 ,

wherein

the gate electrode formed in step (b) includes a silicon layer having an ion-implanted layer in an upper layer part, and

in step (g), an epitaxial layer is not formed over the gate electrode.

7. The method of manufacturing a semiconductor device according to claim 3 ,

wherein

the gate electrode formed in step (b) has a stacked structure in which an insulating film is stacked in an upper part, and

in step (g), an epitaxial layer is not formed over the gate electrode.

8. The method of manufacturing a semiconductor device according to claim 3 ,

wherein

the gate electrode formed in step (b) contains a metal, and

in step (g), an epitaxial layer is not formed over the gate electrode.

9. The method of manufacturing a semiconductor device according to claim 3 , comprising the step of:

after step (b) and before step (c),

(b1) performing ion implantation into the semiconductor substrate using the gate electrode as a mask to form a first semiconductor region of the first conductivity type, the region being adjacent to a channel region of the MISFET.

10. The method of manufacturing a semiconductor device according to claim 9 , comprising the step of:

after step (d) and before step (e),

(d1) performing ion implantation into the semiconductor substrate using the gate electrode and the first sidewall spacer as a mask to form a second semiconductor region having the first conductivity type and a higher impurity concentration than the first semiconductor region,

wherein, in step (f), a first semiconductor layer grows epitaxially on a second semiconductor region exposed from the first insulating film.

11. The method of manufacturing a semiconductor device according to claim 9 ,

wherein

in step (f), a first semiconductor layer grows epitaxially on a first semiconductor region exposed from the first insulating film, and

the first semiconductor layer formed in step (f) has the first conductivity type and a higher impurity concentration than the first semiconductor region.

12. The method of manufacturing a semiconductor device according to claim 9 ,

wherein

in step (f), a first semiconductor layer grows epitaxially on a first semiconductor region exposed from the first insulating film,

wherein

after step (f) and before step (g),

the method has step of (f2) introducing an impurity of the first conductivity type into the first semiconductor layer by ion implantation, and

wherein

the first semiconductor layer after step (f2) has the first conductivity type and a higher impurity concentration than the first semiconductor region.

13. The method of manufacturing a semiconductor device according to claim 3 ,

wherein the first insulating film contains a silicon nitride film and the second insulating film contains a silicon oxide film.

14. The method of manufacturing a semiconductor device according to claim 13 ,

wherein, in a step performing step (f), thickness of the first insulating film in a part extending over the semiconductor substrate is not more than 10 nm.