Xerogel production method

1. A xerogel production method comprising:

adding, to water glass, a basic silicic acid solution having a sol with a particle size between a particle size of the water glass and 30 nm, to acidify and solate the water glass, and polycondensing the solated water glass at 20° C. to 90° C., to obtain a hydrogel;

growing the hydrogel by leaving the hydrogel for a certain time period at a constant temperature;

hydrophobizing the hydrogel; and

drying the hydrophobized hydrogel.

2. The xerogel production method according to claim 1 ,

wherein the water glass is acidified to a pH ranging from 5.0 to 8.0.

3. The xerogel production method according to claim 1 ,

wherein the particle size of the sol ranges from 1 nm to 30 nm.

4. The xerogel production method according to claim 1 ,

wherein the basic silicic acid solution has a concentration of silicic acid ranging from 13 wt % to 20 wt %.

5. The xerogel production method according to claim 1 ,

wherein the basic silicic acid solution has a pH ranging from 8.0 to 11.0.

6. The xerogel production method according to claim 1 ,

wherein when the hydrogel is hydrophobized, at least one of hexamethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, trimethylchlorosilane, hexamethyldisilazane, or methyltrimethoxysilane is used.

7. The xerogel production method according to claim 1 ,

wherein when the hydrogel is hydrophobized, at least one of methanol, ethanol, 2-propanol, tert-butanol, or ethylene glycol is used.

8. The xerogel production method according to claim 1 ,

wherein when the hydrophobized hydrogel is dried, the hydrophobized hydrogel is dried at 100° C. to 200° C.