Multiple electrode substrate support assembly and phase control system
Implementations described herein provide a substrate support assembly which enables tuning of a plasma within a plasma chamber. In one embodiment, a method for tuning a plasma in a chamber is provided. The method includes providing a first radio frequency power and a direct current power to a first electrode in a substrate support assembly, providing a second radio frequency power to a second electrode in the substrate support assembly at a different location than the first electrode, monitoring parameters of the first and second radio frequency power, and adjusting one or both of the first and second radio frequency power based on the monitored parameters.
1. A method for tuning a plasma in a chamber, the method comprising: providing a first radio frequency power and a direct current power to a first electrode embedded in a dielectric body of a substrate support assembly to form a plasma in the chamber, the first electrode having a diameter that is substantially equal to a diameter of a substrate and is positioned adjacent to a substrate support surface of the substrate support assembly; providing a second radio frequency power to a second electrode in the substrate support assembly to tune the plasma through the first electrode, the second electrode having a diameter greater than the diameter of the first electrode; monitoring a phase angle of the first and second radio frequency power using a sensor; and adjusting one or both of the first and second radio frequency power based on feedback from the sensor.
2. The method of claim 1 , wherein the adjusting comprises phase shifting one or both of the first and second radio frequency power.
3. The method of claim 1 , wherein the first and second radio frequency power are provided by a single power source.
4. The method of claim 3 , wherein the first and second radio frequency power is split by a single matching network.
5. The method of claim 3 , wherein the adjusting comprises phase shifting one or both of the first and second radio frequency power.
6. The method of claim 1 , wherein the first radio frequency power is provided by a first power source and the second radio frequency power is provided by a second power source.
7. The method of claim 1 , wherein the plasma is utilized for an etch process, a deposition process, or a stripping process.
8. The method of claim 1 , wherein the second electrode includes a surface area that is greater than a surface area of the first electrode.
9. A method for tuning a plasma in a chamber, the method comprising: providing a first radio frequency power and a direct current power to a first electrode embedded in a dielectric body of a substrate support assembly to form a plasma in the chamber, the first electrode having a diameter that is substantially equal to a diameter of a substrate and is positioned adjacent to a substrate support surface of the substrate support assembly; providing a second radio frequency power to a second electrode in the substrate support assembly to tune the plasma through the first electrode, the second electrode having a diameter greater than the diameter of the first electrode and being positioned at a location further from the support surface; monitoring a phase angle of the first and second radio frequency power using a sensor; and changing the phase angle of one or both of the first and second radio frequency power based on feedback from the sensor.
10. The method of claim 9 , wherein the first and second radio frequency power are provided by a single power source.
11. The method of claim 10 , wherein the first and second radio frequency power is split by a single matching network.
12. The method of claim 9 , wherein the first radio frequency power is provided by a first power source and the second radio frequency power is provided by a second power source.
13. The method of claim 9 , wherein the plasma is utilized for an etch process, a deposition process, or a stripping process.
14. A method for tuning a plasma in a chamber, the method comprising: providing a first radio frequency power and a direct current power to a first electrode embedded in a dielectric body of a substrate support assembly to form a plasma in the chamber, the first electrode having a diameter that is substantially equal to a diameter of a substrate and is positioned adjacent to a substrate support surface of the substrate support assembly; providing a second radio frequency power to a second electrode in the substrate support assembly to tune the plasma through the first electrode, the second electrode having a diameter greater than the diameter of the first electrode and being positioned at a location further from the support surface; monitoring a phase angle of the first and second radio frequency power using a sensor; and shifting the phase angle of one or both of the first and second radio frequency power based on feedback from the sensor, wherein the second electrode includes a surface area that is greater than a surface area of the first electrode.
15. The method of claim 14 , wherein the first and second radio frequency power are provided by a single power source.
16. The method of claim 15 , wherein the first and second radio frequency power is split by a single matching network.
17. The method of claim 15 , wherein the adjusting comprises phase shifting one or both of the first and second radio frequency power.
18. The method of claim 14 , wherein the first radio frequency power is provided by a first power source and the second radio frequency power is provided by a second power source.
19. The method of claim 14 , wherein the plasma is utilized for an etch process, a deposition process, or a stripping process.