Light-emitting device and fabrication method thereof
A light-emitting device of little aging electric leakage and high luminous efficiency and fabrication thereof, in which, the light-emitting device includes: a semiconductor epitaxial laminated layer that comprises an N-type semiconductor layer, a P-type semiconductor layer and a light-emitting layer between the N-type semiconductor layer and the P-type semiconductor layer, the surface of which has deflected dislocation; electromigration resistant metal that fills into the deflected dislocation over the N-type or/and P-type semiconductor layer surface through pretreatment to block the electromigration channel formed over the semiconductor epitaxial laminated layer due to deflected dislocation to eliminate electric leakage.
1. A light-emitting device, comprising:
a semiconductor epitaxial laminated layer that comprises an N-type semiconductor layer, a P-type semiconductor layer, and a light-emitting layer between the N-type semiconductor layer and the P-type semiconductor layer, wherein the semiconductor epitaxial laminated layer has a surface with deflected dislocations; and
an electromigration resistant metal filled into deflected dislocations at the N-type or/and P-type semiconductor layer surface through pretreatment to block an electromigration channel formed over the semiconductor epitaxial laminated layer due to the deflected dislocations to thereby reduce leakage current,
wherein the electromigration resistant metal is only located in the deflected dislocations at the semiconductor epitaxial laminated layer surface to optimally reduce light absorption.
2. The light-emitting device of claim 1 , wherein the electromigration resistant metal is filled into the deflected dislocations at the semiconductor epitaxial laminated layer surface to increase adhesiveness of the semiconductor epitaxial laminated layer to the metal material layer.
3. The light-emitting device of claim 1 , wherein the electromigration resistant metal is filled into at least one surface of the N-type or the P-type semiconductor layer, but does not penetrate the semiconductor epitaxial laminated layer entirely.
4. The light-emitting device of claim 1 , wherein the electromigration resistant metal is filled into the deflected dislocations at the N-type or/and the P-type semiconductor layer surface by applying voltage or heating.
5. The light-emitting device of claim 1 , wherein the electromigration resistant metal comprises at least one of Cu, Au, Pt, Pd, W, Mo, Ta, Nb, or V, or an alloy from a combination thereof.
6. The light-emitting device of claim 1 , wherein a reflective mirror layer is formed over the semiconductor epitaxial laminated layer through a bonding layer, and the deflected dislocations at the surface of the semiconductor epitaxial laminated layer at a side that is adjacent to the reflective mirror layer is filled with the electromigration resistant metal.
7. The light-emitting device of claim 6 , wherein the reflective mirror layer comprises at least one of Ag, Al, or an alloy thereof.
8. The light-emitting device of claim 1 , further comprising a solder layer configured to bond the semiconductor epitaxial laminated layer to a base, wherein the deflected dislocations at the surface of the semiconductor epitaxial laminated layer at a side that is adjacent to the solder layer is filled with the electromigration resistant metal.
9. The light-emitting device of claim 8 , wherein the solder layer is made of Ti, Al, Ni, Cr, or Sn, or an alloy from a combination thereof.
10. The light-emitting device of claim 1 , wherein the light-emitting device has a vertical structure or a flip-chip structure.
11. A method of fabricating a light-emitting device, the method comprising:
Step 1, a semiconductor epitaxial laminated layer is provided, comprising an N-type semiconductor layer, a P-type semiconductor layer, and a light-emitting layer between the N-type semiconductor layer and the P-type semiconductor layer, wherein the semiconductor epitaxial laminated layer has a surface with deflected dislocations;
Step 2, an electromigration resistant metal is filled into the deflected dislocations at the N-type or/and P-type semiconductor layer surface through pretreatment to block an electromigration channel formed over the semiconductor epitaxial laminated layer due to deflected dislocations to reduce leakage current,
wherein in the Step 2, the electromigration resistant metal is diffused to the deflected dislocations at the semiconductor epitaxial laminated layer surface by applying a voltage to both ends of the semiconductor epitaxial laminated layer.
12. The method of claim 11 , wherein in Step 2, the electromigration resistant metal is filled into the deflected dislocations at the semiconductor epitaxial laminated layer surface through heating and fusing.
13. The method of claim 12 , wherein the heating and fusing is at a temperature higher than 400° C.
14. The method of claim 11 , wherein the voltage is higher than 100 V.
15. A method of fabricating a light-emitting device, the method comprising:
Step 1, a semiconductor epitaxial laminated layer is provided, comprising an N-type semiconductor layer, a P-type semiconductor layer, and a light-emitting layer between the N-type semiconductor layer and the P-type semiconductor layer, wherein the semiconductor epitaxial laminated layer has a surface with deflected dislocations;
Step 2, an electromigration resistant metal is filled into the deflected dislocations at the N-type or/and P-type semiconductor layer surface through pretreatment to block an electromigration channel formed over the semiconductor epitaxial laminated layer due to deflected dislocations to reduce leakage current,
wherein the Step 2 comprises:
exposing at least one surface of the N-type or the P-type semiconductor layer of the semiconductor epitaxial laminated layer, and forming an electromigration resistant metal blocking layer over the exposed surface;
applying an action over the metal blocking layer to fill the electromigration resistant metal of the metal blocking layer into the deflected dislocations of the semiconductor epitaxial laminated layer surface; and
removing the metal blocking layer and retaining the electromigration resistant metal in the deflected dislocations and exposing the semiconductor epitaxial laminated layer surface.
16. The method of claim 15 , wherein the metal blocking layer is formed through evaporating, sputtering, vapor deposition, or a combination thereof.
17. The method of claim 15 , wherein the metal blocking layer is removed through dry or wet etching.
18. The method of claim 17 , wherein a metal etching fluid is applied in a wet etching till the semiconductor epitaxial laminated layer surface is just exposed yet the electromigration resistant metal in the deflected dislocations is retained.