IP Library Granted Patent US 9,835,539
Granted Patent B2
US 9,835,539 · App. 14/749,202 · Granted Dec 5, 2017

Biopolymer separation using nanostructured arrays

Inventors: Yann A. Astier (White Plains, NY); Joshua T. Smith (Croton-on-Hudson, NY); Gustavo A. Stolovitzky (Riverdale, NY); Chao Wang (Yorktown Heights, NY); Benjamin H. Wunsch (Yorktown Heights, NY)
Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATION
G01N15/1031B01L3/502761G01N27/3278G01N33/48721B01L3/502707B01L2200/0652B01L2300/0864B01L2300/161G01N15/02G01N2015/0038G01N2015/0288
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Quick Facts
Patent No.
US 9,835,539
App. No.
14/749,202
Granted
Dec 5, 2017
Kind
B2
Abstract

A technique relates sorting biopolymers. The biopolymers are introduced into a nanopillar array, and the biopolymers include a first population and a second population. The nanopillar array includes nanopillars arranged to have a gap separating one from another. The biopolymers are sorted through the nanopillar array by transporting the first population of the biopolymers less than a predetermined bumping size according to a fluid flow direction and by transporting the second population of the biopolymers at least the predetermined bumping size according to a bumped direction different from the fluid flow direction. The nanopillar array is configured to employ the gap with a gap size less than 300 nanometers in order to sort the biopolymers.

Claims (10)

1. An apparatus for sorting entities, the apparatus comprising:

a first stage including a first nanopillar array corresponding to a first critical bumping dimension;

a second stage including a second nanopillar array and a third nanopillar array, the second nanopillar array having a second critical bumping dimension and the third nanopillar array having a third critical bumping dimension;

wherein the first nanopillar array is coupled to the second nanopillar array and configured to output the entities less than the first critical bumping dimension to the second nanopillar array; and

wherein the first nanopillar array is coupled to the third nanopillar array and is configured to output the entities meeting the first critical bumping dimension to the third nanopillar array;

wherein one or more of the first, second, and third nanopillar arrays have a substrate material that has a non-uniform gap size between nanopillars, the nanopillars have a coating of a different material from the substrate material that provides a uniform gap size between the nanopillars;

wherein the uniform gap size is about or below 100 nanometers.

2. The apparatus of claim 1 , further comprising a third stage including a fourth nanopillar array having a fourth critical bumping dimension, a fifth nanopillar array having a fifth critical bumping dimension, a sixth nanopillar array having a sixth critical bumping dimension, and a seventh nanopillar array having a seventh critical bumping dimension;

wherein the second nanopillar array is configured to output the entities less than the second critical bumping dimension to the fourth nanopillar array and is configured to output the entities meeting the second critical bumping dimension to the fifth nanopillar array; and

wherein the third nanopillar array is configured to output the entities less that the third critical bumping dimension to the sixth nanopillar array and is configured to output the entities meeting the third critical bumping dimension to the seventh nanopillar array.

Assignments (1)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 24, 2015
From: ASTIER, YANN A.; SMITH, JOSHUA T.; STOLOVITZKY, GUSTAVO A.; WANG, CHAO; WUNSCH, BENJAMIN H.
To: INTERNATIONAL BUSINESS MACHINES CORPORATION
Reel/Frame 035964/0277 →
Continuity (3)
Continuation 14697269 · Apr 27, 2015
Provisional Application 62084653 · Nov 26, 2014
Related Publication 20160146718A1 · May 26, 2016