IP Library Granted Patent US 9,548,254
Granted Patent B2
US 9,548,254 · App. 14/753,895 · Granted Jan 17, 2017

Packaged semiconductor chips with array

Inventors: Andrey Grinman (Jerusalem, IL); David Ovrutsky (San Jose, CA); Charles Rosenstein (Ramat Beit Shemesh, IL); Vage Oganesian (Sunnyvale, CA)
Assignee: Tessera, Inc.
H01L23/3128H01L23/29H01L23/3114H01L23/3135H01L23/49816H01L23/556H01L24/17H01L25/0657H01L25/105H01L23/4985H01L23/49827H01L2224/16148H01L2224/274H01L2225/06513H01L2225/06517H01L2225/1058H01L2225/1064H01L2924/01019H01L2924/01079H01L2924/01322H01L2924/01327H01L2924/14H01L2924/1436H01L2924/3025
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Quick Facts
Patent No.
US 9,548,254
App. No.
14/753,895
Granted
Jan 17, 2017
Kind
B2
Abstract

A chip-sized, wafer level packaged device including a portion of a semiconductor wafer including a device, at least one packaging layer containing silicon and formed over the device, a first ball grid array formed over a surface of the at least one packaging layer and being electrically connected to the device and a second ball grid array formed over a surface of the portion of the semiconductor wafer and being electrically connected to the device.

Claims (32)

1. Stacked chip-sized, wafer level packaged devices comprising:

at least first and second chip-sized wafer level packaged devices each including:

a portion of a semiconductor wafer including a device;

at least one packaging layer containing silicon and formed over said device;

a first ball grid array at a first package surface and formed over a surface of said at least one packaging layer and being electrically connected to said device, the first package surface facing in a first direction; and

a second ball grid array at a second package surface and formed over a surface of said portion of said semiconductor wafer and being electrically connected to said device, the second package surface facing in a second direction opposite the first direction,

wherein said first ball grid array of said first chip-sized wafer level packaged device is coupled to said second ball grid array of said second chip-sized wafer level packaged device, and the first package surface of the first chip-sized wafer level packaged device faces the second package surface of the second chip-sized wafer level packaged device.

2. Stacked chip-sized, wafer level packaged devices according to claim 1 and wherein said at least one packaging layer comprises a plurality of packaging layers.

3. Stacked chip-sized, wafer level packaged devices according to claim 2 and wherein said plurality of packaging layers are disposed on the same side of said portion of said semiconductor wafer.

4. Stacked chip-sized, wafer level packaged devices according to claim 2 , wherein said plurality of packaging layers comprise a first packaging layer formed over a first surface of said semiconductor wafer and a second packaging layer formed over a second surface of said semiconductor wafer.

5. Stacked chip-sized, wafer level packaged devices according to claim 4 , further comprising:

a first compliant layer formed on said first packaging layer and underlying said first ball grid array;

a second compliant layer formed on said second packaging layer and underlying said second ball grid array.

6. Stacked chip-sized, wafer level packaged devices according to claim 5 , wherein at least one of said compliant layers provides alpha-particle shielding between said first and second ball grid arrays and said device.

7. Stacked chip-sized, wafer level packaged devices according to claim 5 , wherein at least one of said compliant layers comprises a layer of an electrophoretic material.

8. Stacked chip-sized, wafer level packaged device according to claim 1 and wherein said device is a DRAM device.

9. Stacked chip-sized, wafer level packaged devices comprising:

at least first and second chip-sized wafer level packaged devices each including:

a portion of a semiconductor wafer including a device;

at least one packaging layer formed over said device;

a first ball grid array at a first package surface and formed over a surface of said at least one packaging layer and being electrically coupled to said device, the first package surface facing in a first direction;

a second ball grid array at a second package surface and formed over a surface of said portion of said semiconductor wafer and being electrically coupled to said device, the second package surface facing in a second direction opposite the first direction; and

a compliant electrophoretic coating layer underlying at least one of said first and second ball grid arrays,

wherein said first ball grid array of said first chip-sized wafer level packaged device is coupled to said second ball grid array of said second chip-sized wafer level packaged device, and the first package surface of the first chip-sized wafer level packaged device faces the second package surface of the second chip-sized wafer level packaged device.

10. Stacked chip-sized, wafer level packaged devices according to claim 9 and wherein said at least one packaging layer contains silicon.

11. Stacked chip-sized, wafer level packaged devices according to claim 9 and wherein said compliant electrophoretic coating layer provides alpha-particle shielding between said first and second ball grid arrays and said device.

12. Stacked chip-sized, wafer level packaged devices according to claim 9 and wherein said device is a DRAM device.

13. Stacked chip-sized, wafer level packaged devices according to claim 9 , wherein said at least one packaging layer comprises:

a first packaging layer formed on a first surface of said semiconductor wafer and underlying said first ball grid array;

a second packaging layer formed on a second surface of said semiconductor wafer and underlying said second ball grid array.

14. Stacked chip-sized, wafer level packaged devices according to claim 13 , wherein said compliant electrophoretic coating layer provides alpha-particle shielding between at least one of said first and second ball grid arrays and said device.

15. Stacked chip-sized, wafer level packaged devices according to claim 13 , wherein said compliant electrophoretic coating comprises a first compliant electrophoretic coating layer formed on said first packaging layer and a second compliant electrophoretic coating layer formed on said second packaging layer.

Assignments (6)
CHANGE OF NAME Recorded Nov 21, 2025
From: TESSERA, INC.
To: TESSERA LLC
Reel/Frame 073657/0979 →
CHANGE OF NAME Recorded Nov 21, 2025
From: TESSERA LLC
To: ADEIA SEMICONDUCTOR SOLUTIONS LLC
Reel/Frame 073658/0661 →
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 3, 2015
From: GRINMAN, ANDREY; OVRUTSKY, DAVID; ROSENSTEIN, CHARLES; OGANESIAN, VAGE
To: TESSERA, INC.
Reel/Frame 036488/0192 →
Continuity (4)
Continuation 14177527 · Feb 11, 2014
Continuation 13407085 · Feb 28, 2012
Continuation 11603935 · Nov 22, 2006
Related Publication 20150380336A1 · Dec 31, 2015