IP Library Granted Patent US 9,455,237
Granted Patent B2
US 9,455,237 · App. 14/754,293 · Granted Sep 27, 2016

Bowl-shaped solder structure

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Quick Facts
Patent No.
US 9,455,237
App. No.
14/754,293
Granted
Sep 27, 2016
Kind
B2
Abstract

An apparatus relating generally to a substrate is disclosed. In this apparatus, a first metal layer is on the substrate. The first metal layer has an opening. The opening of the first metal layer has a bottom and one or more sides extending from the bottom. A second metal layer is on the first metal layer. The first metal layer and the second metal layer provide a bowl-shaped structure. An inner surface of the bowl-shaped structure is defined responsive to the opening of the first metal layer and the second metal layer thereon. The opening of the bowl-shaped structure is configured to receive and at least partially retain a bonding material during a reflow process.

Claims (53)

1. A method, comprising:

obtaining a substrate having a first metal layer and a second metal layer;

wherein the second metal layer is disposed on the first metal layer;

forming a first mask on an upper surface of the second metal layer;

etching an opening in the second metal layer responsive to an opening in the first mask;

first plating of a lower surface and a sidewall surface in the opening in the second metal layer with a first metal;

second plating a second metal on the first metal;

removing the first mask;

forming a second mask in the opening and on a portion of the upper surface of the second metal layer surrounding the opening; and

etching the second metal layer responsive to an opening in the second mask down to an etch stop layer to provide a bowl-shaped structure.

2. The method according to claim 1 , further comprising etching the stop layer down to the first metal layer.

3. The method according to claim 1 , wherein the first metal layer is a redistribution metal layer.

4. The method according to claim 1 , wherein:

the first plating includes electroplating; and

the second plating includes immersion plating.

5. The method according to claim 1 , further comprising exposing the bowl-shaped structure to benzotriazole to form a passivation layer to provide a solder non-wetting exterior sidewall surface of the bowl-shaped structure.

6. A method, comprising:

obtaining a substrate;

forming a first metal layer on the substrate, the first metal layer having an opening, the opening of the first metal layer having a bottom and one or more sides extending from the bottom;

forming a second metal layer on the first metal layer;

the first metal layer and the second metal layer providing a bowl-shaped structure, an inner surface of the bowl-shaped structure defined responsive to the opening of the first metal layer and the second metal layer thereon;

the opening of the bowl-shaped structure being configured to receive and at least partially retain bonding material during reflow processing; and

the bottom of the bowl-shaped structure having a contour including a recess and a post, the post being a portion of the first metal layer defined by the recess around the post.

7. The method according to claim 6 , wherein an exterior sidewall surface of the bowl-shaped structure is a non-wetting surface.

8. The method according to claim 7 , further comprising forming a passivation layer on the exterior sidewall surface of the bowl-shaped structure to provide the non-wetting surface.

9. The method according to claim 8 , wherein:

the exterior sidewall surface includes a portion opposite the inner surface of the bowl-shaped structure defined responsive to the opening; and

the exterior side wall surface is included in the one or more sides of the first metal layer on the substrate extending from the bottom.

10. The method according to claim 7 , wherein:

the bonding material is solder; and

the non-wetting surface is a solder non-wetting surface.

11. The method according to claim 6 , wherein the forming of the first metal layer and the second metal layer provide a plurality of bowl-shaped structures including the bowl-shaped structure to provide an area array package.

12. The method according to claim 6 , wherein:

the substrate includes a redistribution metal layer; and

the first metal layer is in contact with the redistribution metal layer.

13. The method according to claim 6 , wherein the first metal layer is a redistribution metal layer.

14. A method, comprising:

obtaining a substrate;

forming a first metal layer and a polymer layer on the substrate;

forming a second metal layer on the first metal layer and extending along a portion of the polymer layer disposed above the first metal layer;

the first metal layer, the second metal layer and the polymer layer in combination providing a bowl-shaped structure, the second metal layer providing an inner surface of the bowl-shaped structure, the polymer layer providing one or more sides of the bowl-shaped structure with the one or more sides extending from the substrate, the first metal layer disposed between the substrate and the polymer layer providing a bottom of the bowl-shaped structure on which the second metal layer is plated, the portion of the polymer layer having the second metal layer extending along thereof being included in the one or more sides of the bowl-shaped structure;

the bowl-shaped structure defining an opening; and

the opening of the bowl-shaped structure being configured to receive and at least partially retain bonding material during reflow processing;

wherein a lower portion of the inner surface of the bowl-shaped structure has a contour including a recess and a post.

15. The method according to claim 14 , wherein an exterior sidewall surface of the bowl-shaped structure is a non-wetting surface.

16. The method according to claim 15 , wherein the forming of the first metal layer, the second metal layer and the polymer layer in combination provide a plurality of bowl-shaped structures including the bowl-shaped structure to provide an area array package.

17. The method according to claim 16 , wherein:

the bonding material is solder; and

the non-wetting surface is a solder non-wetting surface.

18. The method according to claim 14 , wherein the recess is disposed around the post.

19. The method according to claim 14 , wherein:

the substrate includes a redistribution metal layer; and

the first metal layer is in contact with the redistribution metal layer.

Assignments (6)
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS LLC
To: ADEIA SEMICONDUCTOR TECHNOLOGIES LLC
Reel/Frame 073508/0661 →
CHANGE OF NAME Recorded Nov 24, 2025
From: INVENSAS CORPORATION
To: INVENSAS LLC
Reel/Frame 073689/0793 →
RELEASE OF SECURITY INTEREST Recorded Jun 11, 2020
From: ROYAL BANK OF CANADA
To: TESSERA, INC.; INVENSAS BONDING TECHNOLOGIES, INC. (F/K/A ZIPTRONIX, INC.); FOTONATION CORPORATION (F/K/A DIGITALOPTICS CORPORATION AND F/K/A DIGITALOPTICS CORPORATION MEMS); INVENSAS CORPORATION; TESSERA ADVANCED TECHNOLOGIES, INC; DTS, INC.; DTS LLC; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
Reel/Frame 052920/0001 →
SECURITY INTEREST Recorded Jun 1, 2020
From: ROVI SOLUTIONS CORPORATION; ROVI TECHNOLOGIES CORPORATION; ROVI GUIDES, INC.; TIVO SOLUTIONS INC.; VEVEO, INC.; INVENSAS CORPORATION; INVENSAS BONDING TECHNOLOGIES, INC.; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: BANK OF AMERICA, N.A.
Reel/Frame 053468/0001 →
SECURITY INTEREST Recorded Dec 2, 2016
From: INVENSAS CORPORATION; TESSERA, INC.; TESSERA ADVANCED TECHNOLOGIES, INC.; ZIPTRONIX, INC.; DIGITALOPTICS CORPORATION; DIGITALOPTICS CORPORATION MEMS; DTS, LLC; DTS, INC.; PHORUS, INC.; IBIQUITY DIGITAL CORPORATION
To: ROYAL BANK OF CANADA, AS COLLATERAL AGENT
Reel/Frame 040797/0001 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jun 29, 2015
From: UZOH, CYPRIAN EMEKA; KATKAR, RAJESH
To: INVENSAS CORPORATION
Reel/Frame 035930/0857 →