Apparatus and method for processing sample, and charged particle radiation apparatus
View Patent ↗In order to prevent a sample from thermally expanding and contracting when the sample is placed on a sample stage inside a vacuum chamber, the related art has proposed a coping method of awaiting observation by setting a standby time from when the wafer is conveyed into the vacuum chamber until the wafer and the sample table are brought into thermal equilibrium. In addition, the coping method is configured so as to await the observation until the wafer is cooled down to room temperature when the wafer is heated in the previous step. Consequently, throughput of an apparatus decreases. A temperature control mechanism which can control temperature of the sample is installed inside a mini-environment device. The sample temperature control mechanism controls the temperature of the sample inside the mini-environment device so as to become a setting temperature which is set in view of a lowered temperature of the sample inside a load lock chamber.
1. A scanning electron microscope comprising:
a mini-environment device that includes a conveyance robot for carrying out a sample from a sample container in which the sample is stored, and that pressurizes space which includes the conveyance robot;
a load lock chamber that the sample is carried in to by the conveyance robot and that evacuates atmosphere around the sample;
a vacuum chamber that the sample is carried in to from the load lock chamber;
an electron beam column that irradiates an electron beam to the sample carried in to the vacuum chamber;
a sample stage that moves the sample to irradiate the electron beam at desired position of the sample;
a temperature control device that controls temperature of the pressurized space in the mini-environment device; and
a control unit that controls the temperature control device so that a temperature of the sample inside the mini-environment device rapidly becomes a setting temperature set in view of a lowered temperature of the sample inside the load lock chamber based on a predetermined temperature difference obtained in advance so as to omit standby time.
2. The charged particle radiation apparatus for processing a sample according to claim 1 , further comprising:
a first temperature sensor that measures a temperature of a sample table on the sample stage; and
a second temperature sensor positioned relative to a conveyance arm of the conveyance robot that measures a temperature of the pressurized space in the mini-environment device,
wherein based on the temperature measured by the first temperature sensor and the temperature measured by the second temperature sensor, the temperature control device controls the temperature of the pressurized space in the mini-environment so as to become the setting temperature which is set in view of the lowered temperature of the sample inside the load lock chamber.
3. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the second temperature sensor is installed so as to come into contact with the conveyance arm of the conveyance robot which is arranged inside the mini-environment device.
4. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the second temperature sensor is installed so as to measure the conveyance arm of the conveyance robot which is arranged inside the mini-environment device.
5. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the second temperature sensor employs a temperature sensor using a non-contact measuring system.
6. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the mini-environment device further has a fan filter unit (FFU), and
wherein the temperature control device is configured so that a heat exchanger is installed inside the FFU.
7. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the temperature control device is configured so that a separate temperature control chamber is installed inside the mini-environment device.
8. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the setting temperature is calculated from a temperature difference which minimizes an amount of thermal expansion and contraction, by using an observation target image obtained by the sample whose temperature is controlled to several patterns by the temperature control device being conveyed to the sample table.
9. The charged particle radiation apparatus for processing a sample according to claim 2 ,
wherein the setting temperature is calculated from a temperature difference which minimizes a temperature change obtained by the sample whose temperature is controlled to several patterns by the temperature control device being conveyed to the sample table.
10. A method for processing a sample, comprising:
(a) a step of measuring a temperature of a pressurized space in a mini-environment device;
(b) a step of measuring a temperature of a sample table on a sample stage that moves the sample to irradiate the charged particle beam at desired position of the sample inside a vacuum chamber;
(c) a step of acquiring a temperature difference between the temperature of the pressurized space and the temperature of the sample table;
(d) a step of setting the temperature of the pressurized space in the mini-environment device so that the temperature difference rapidly becomes a predetermined temperature difference obtained in advance so as to omit standby time;
(e) a step of conveying the sample whose temperature is controlled to the sample table; and
(f) a step of processing the sample.
11. The method for processing a sample according to claim 10 , further comprising:
(g) a step of conveying the sample to a load lock chamber; and
(h) a step of carrying out vacuum evacuation for the load lock chamber, between the steps (d) and (e).
12. A charged particle radiation apparatus comprising:
a mini-environment device that includes a conveyance robot for carrying out a sample from a sample container in which the sample is stored, and that pressurizes space which includes the conveyance robot;
a load lock chamber that the sample is carried in to by the conveyance robot and that evacuates atmosphere around the sample;
a vacuum chamber that includes a sample stage for moving the sample to any desired observation position;
a column that radiates an electron beam to the sample;
a temperature control device that controls temperature of pressurized space in the mini-environment device;
a temperature sensor that measures a temperature of a sample table on the sample stage, and a temperature of the sample inside the mini-environment device; and
a control unit that controls the temperature control device so that a temperature of the sample inside the mini-environment device rapidly becomes a setting temperature set in view of a lowered temperature of the sample inside the load lock chamber based on a predetermined temperature difference obtained in advance so as to omit standby time; and
wherein the temperature control device controls the temperature of the pressurized space in the mini-environment device so as to become the setting temperature which is set in view of the lowered temperature of the sample inside the load lock chamber.
13. The charged particle radiation apparatus according to claim 12 ,
wherein the setting temperature is calculated from a temperature difference which minimizes an amount of thermal expansion and contraction, by using an observation target image obtained by the sample whose temperature is controlled to several patterns by the temperature control device being conveyed to the sample table.
14. The charged particle radiation apparatus according to claim 12 ,
wherein the setting temperature is calculated from a temperature difference which minimizes a temperature change obtained by the sample whose temperature is controlled to several patterns by the temperature control device being conveyed to the sample table.