IP Library Granted Patent US 9,534,291
Granted Patent B2
US 9,534,291 · App. 14/769,452 · Granted Jan 3, 2017

DLC coating with run-in layer

Inventors: Sebastien Guimond (St. Gallen, CH); Manfred Wurzer (Wittenbach, CH); Franz Widowitz (Feldkirch, AT)
Assignee: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
C23C16/26C09D1/00C23C16/006C23C16/0272C23C16/45523C23C16/50
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Quick Facts
Patent No.
US 9,534,291
App. No.
14/769,452
Granted
Jan 3, 2017
Kind
B2
Abstract

A coating that resists wear; first, at least one DLC layer with a high degree of hardness is applied to a component and then a gradient layer, whose density decreases in the direction toward the surface, is applied to this DLC layer. By means of the hardness progression that this produces in the gradient layer, the gradient layer functions as a run-in layer in applications with sliding surfaces.

Claims (11)

1. A hard material layer on a component, the hard material layer comprising:

a diamond-like carbon (DLC) layer with a hardness of at least 10 GPa; and

a DLC gradient layer on top of the DLC layer, wherein the DLC gradient layer is at least 300 nm thick and the DLC gradient layer has a hydrogen concentration that increases toward a gradient surface.

2. The hard material layer according to claim 1 , wherein a chemical composition of the gradient layer differs from a chemical composition of the DLC layer essentially only with regard to hydrogen content.

3. A method for manufacturing a wear-resistant surface, the method comprising:

loading a coating chamber with substrates that are to be coated;

pumping-out the coating chamber and introducing a process gas including acetylene and argon;

producing a plasma using low-voltage arc discharge; and

applying a substrate bias to the substrates that are to be coated,

wherein in order to deposit a DLC layer, first a high substrate bias is applied and for the subsequent coating of a gradient layer, the substrate bias is reduced continuously and/or with a plurality of small reduction steps.

4. The method according to claim 3 , comprising continuously increasing a low-voltage discharge current, while reducing the substrate bias, in order to counteract a decrease in plasma density that accompanies the reduction of the substrate bias.

Assignments (2)
CHANGE OF NAME Recorded Nov 2, 2016
From: OERLIKON SURFACE SOLUTIONS AG, TRÜBBACH
To: OERLIKON SURFACE SOLUTIONS AG, PFÄFFIKON
Reel/Frame 040544/0008 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded May 19, 2016
From: GUIMOND, SEBASTIEN; WURZER, MANFRED; WIDOWITZ, FRANZ
To: OERLIKON SURFACE SOLUTIONS AG, PFAFFIKON
Reel/Frame 038652/0896 →
Priority Claims (2)
DE 10 2013 002 911 · Feb 21, 2013 · national
DE 10 2013 007 146 · Apr 25, 2013 · national
Continuity (1)
Related Publication 20160017483A1 · Jan 21, 2016