Organic light emitting diode display device and method of fabricating the same
An organic light emitting diode display device according to an embodiment includes: a first substrate having a pixel region; a first electrode in the pixel region on the first substrate; an emitting layer on the first electrode; and a second electrode on the emitting layer, the second electrode including a metal layer having a thickness smaller than about 300 Å.
1. An organic light emitting diode display device, comprising:
a first substrate having a pixel region;
a first electrode in the pixel region on the first substrate;
an emitting layer disposed on the first electrode, the emitting layer including an emitting material layer;
a second electrode disposed on the emitting layer, the second electrode including a first metal layer having a thickness smaller than about 300 Å; and
a second metal layer disposed between the emitting material layer and the first metal layer of the second electrode, the second metal layer including at least one of cesium (Cs), sodium (Na), lithium (Li) or silver (Ag).
2. The display device according to claim 1 , further comprising a capping layer on the second electrode, the capping layer having a refractive index greater than about 1.5.
3. The display device according to claim 1 , wherein the first metal layer includes silver having a thickness of about 150 Å to about 250 Å, and the first metal layer has a plate structure.
4. The display device according to claim 1 , wherein the second metal layer is an alloy layer of the second electrode, and the alloy layer includes one of magnesium silver (MgAg) alloy and cesium silver (CsAg) alloy.
5. The display device according to claim 1 , wherein the first metal layer includes one of silver and silver alloy, and wherein the second electrode further includes an oxide layer on the first metal layer, and the oxide layer includes silver oxide.
6. The display device according to claim 2 , wherein the capping layer includes at least one of an inorganic material, an organic material or a metal oxide.
7. The display device according to claim 3 , wherein the second metal layer is an electron injecting layer of the emitting layer, and the electron injecting layer includes at least one of cesium (Cs), sodium (Na), lithium (Li), tungsten (W) or magnesium (Mg).
8. The display device according to claim 4 , wherein the first metal layer has a thickness of about 50 Å to about 300 Å, and the alloy layer has a thickness of about 2 Å to about 200 Å.
9. The display device according to claim 5 , wherein the first metal layer has a thickness of about 100 Å to about 200 Å, and the oxide layer has a thickness of about 200 Å to about 1000 Å.
10. The display device according to claim 5 , wherein the silver alloy includes one of magnesium silver (MgAg) alloy, aluminum silver (AlAg) alloy, copper silver (CuAg) alloy, magnesium aluminum silver (MgAlAg) alloy, magnesium copper silver (MgCuAg) alloy, aluminum copper silver (AlCuAg) alloy and magnesium aluminum copper silver (MgAlCuAg) alloy.
11. An organic light emitting diode display device, comprising:
a first substrate including a pixel region;
a first electrode disposed in the pixel region;
an emitting layer including an emitting material layer disposed on the first electrode; and
a second electrode disposed on the emitting layer, the second electrode including a first metal layer having a thickness smaller than about 300 Å and a second metal layer disposed between the emitting material layer and the first metal layer, the second metal layer including at least one of cesium (Cs), sodium (Na), lithium (Li), tungsten (W), magnesium (Mg) or silver (Ag),
wherein the emitting layer exposes the first electrode, and an oxide pattern is disposed between the first electrode exposed through the emitting layer and the second electrode.
12. A method of fabricating an organic light emitting diode display device, the method comprising:
forming a first electrode in a pixel region on a first substrate;
forming an emitting layer on the first electrode;
forming a second electrode on the emitting layer, the second electrode including a metal layer having a thickness smaller than about 300 Å; and
applying a low level voltage and a high level voltage to the first and second electrodes, respectively, under one of an oxygen ambience and an ozone ambience,
wherein an oxide pattern is formed between the first electrode exposed through the emitting layer and the second electrode by the low level voltage and the high level voltage.
13. The method according to claim 12 , further comprising forming a capping layer on the second electrode, the capping layer having a refractive index greater than about 1.5.
14. The method according to claim 12 , wherein a difference between the low level voltage and the high level voltage is about 5V to about 20V, and the low level voltage and the high level voltage are applied for about 30 seconds to about 60 seconds.
15. The method according to claim 12 , wherein the metal layer includes silver, and the silver is deposited with a deposition rate of about 1.0 Å/s to about 2.0 Å/s.
16. The method according to claim 12 , wherein the forming the second electrode comprises:
forming an alloy layer on the emitting layer, the alloy layer including one of magnesium silver (MgAg) alloy and cesium silver (CsAg) alloy; and
forming the metal layer on the alloy layer.
17. The method according to claim 12 , wherein the forming the second electrode comprises:
forming a metallic material layer on the emitting layer; and
forming the metal layer and an oxide layer on the metal layer by oxidizing the metallic material layer using an ozone gas.
18. The method according to claim 17 , wherein the ozone gas has a concentration of about 0.1 ppm to about 50 ppm, and the metallic material layer is exposed to the ozone gas for about 10 seconds to about 120 seconds.