Ion beam modification of noble metals for electrical contacts
Ion beam modification of noble metal electrical contact coatings can achieve suitable friction and wear behavior with inherently stable low ECR. For example, this method of producing Au electrical contact coatings can produce wear properties similar to electroplated hard Au, but without the environmental concerns due to stringent OSHA regulations on the use and disposal of toxic chemicals associated with Au electroplating baths. Integration of physical vapor deposition techniques with ion implantation can produce noble metal coatings with surfaces modified to achieve the desired balance between adhesion/friction/wear and electrical contact resistance on a commercial scale.
1. A sliding electrical contact, comprising a pair of contacts having contact surfaces that slide relative to each other, wherein at least one of the pair comprises a noble metal thin film that has been ion implanted with a noble gas and wherein the ion implanted noble metal thin film has a friction coefficient of less than 1.5.
2. The sliding electrical contact of claim 1 , wherein the noble metal comprises Au.
3. The sliding electrical contact of claim 1 , wherein the noble metal comprises Pd, Ag, or Pt.
4. The sliding electrical contact of claim 1 , wherein the noble gas comprises He, Ne, Ar, Kr, or Xe.
5. The sliding electrical contact of claim 1 , wherein the noble gas is ion implanted to a dose of greater than 1×10 6 ions-cm −2 and less than 1×10 20 ions-cm −2 .
6. The sliding electrical contact of claim 1 , wherein the thickness of the noble metal thin film is less than 10 microns.
7. A method for fabricating a sliding electrical contact, comprising:
depositing a noble metal film on a substrate, and
ion implanting a noble gas into the noble metal film to provide a first contact having a friction coefficient of less than 1.5; and
providing a second contact, wherein the surface of the second contact slides relative to the surface of the first contact.
8. The method of claim 7 , wherein the noble metal comprises Au.
9. The method of claim 7 , wherein the noble metal comprises Pd, Ag, or Pt.
10. The method of claim 7 , wherein the noble gas comprises He, N Ar, Kr, or Xe.
11. The method of claim 7 , wherein the depositing comprises physical vapor deposition.
12. The method of claim 11 , wherein the physical vapor deposition comprises e-beam evaporation.
13. The method of claim 7 , wherein the noble gas is ion implanted to a dose of greater than 1×10 6 ions-cm −2 and less than 1×10 20 ions-cm −2 .
14. The method of claim 7 , wherein the noble gas ions are implanted at an energy greater than 1 keV and less than 10 MeV.